Methods and devices for aesthetic treatment of biological structures by radiofrequency and magnetic energy

ABSTRACT

A treatment device for providing a magnetic treatment and a radiofrequency treatment to a body area of a patient. The device includes an energy storage device for storing electric energy, a magnetic field generating device, and a switching device to discharge the electrical energy from the energy storage device to the magnetic field generating device, such that a time-varying magnetic field is generated and provides muscle contraction to a muscle in the body area of the patient. The time-varying magnetic field may have a magnetic field density in a range of 0.1 Tesla to 7 Tesla and a repetition rate in a range of 0.1 Hz to 700 Hz. The device may also include a radiofrequency electrode to generate radiofrequency waves to heat a tissue in the body of the patient. A body of the radiofrequency electrode may include a plurality of openings in a range of 5 to 1000 openings.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Continuation of U.S. application Ser. No.16/844,822, filed Apr. 9, 2020, which claims the benefit of U.S.Provisional Application No. 62/832,738, filed Apr. 11, 2019; U.S.Provisional Application No. 62/832,688, filed Apr. 11, 2019; and U.S.Provisional Application No. 62/932,259, filed Nov. 7, 2019, all of whichare incorporated herein by reference in their entireties.

BACKGROUND OF THE INVENTION

Aesthetic medicine includes all treatments resulting in enhancing avisual appearance according to a patient's criteria. Patients want tominimize all imperfections including, for example, unwanted body fat inspecific body areas, improve body shape, and remove effects of naturalaging. Patients require quick, non-invasive procedures that providesatisfactory results with minimal health risks.

The most common methods used for non-invasive aesthetic applications arebased on application of mechanical waves, such as ultrasound or shockwave therapy, or electromagnetic waves, such as radiofrequency treatmentor light treatment including laser treatment. The effect of mechanicalwaves on tissue is based on cavitation, vibration, and/or heat-inducingeffects. The effect of applications using electromagnetic waves is basedon heat production in the biological structure.

A mechanical treatment using mechanical waves and/or pressure can beused for treatment of cellulite or adipose cells. However, suchmechanical treatments have several drawbacks, such as a risk ofpanniculitis, destruction of untargeted tissues, and/or non-homogenousresults.

A thermal treatment including heating is applied to a patient forenhancing a visual appearance of the skin and body by, for example,increasing production of collagen and/or elastin, smoothing the skin,reducing cellulite, and/or removing adipose cells. However, thermaltreatment has several drawbacks, such as risk of overheating a patientor even causing thermal damage of unwanted biological structures. A riskof a panniculitis and/or non-homogenous results may be a very commonside effect of existing thermal treatments. Further, insufficient bloodand/or lymph flow during and/or after the treatment may lead topanniculitis and other health complications after the treatment.Further, the treatment may be uncomfortable, and may be painful.

Muscle stimulation by time-varying magnetic field provides severalbenefits over known methods for treating biological structures, andallows for non-invasive stimulation of muscles located beneath othermuscles. Further, time-varying magnetic fields may be used to providemuscle stimulation to cause muscle contraction through thick layer ofadipose tissue. Electrostimulation in order to provide a musclecontraction needs to deliver an electric current from an electrode,through an adipose tissue, to a nerve and/or neuromuscular plate linkedwith the muscle. The adipose tissue has resistivity higher than themuscle tissue and delivery of electric current from the electrodethrough insulating adipose tissue to muscle tissue may be lessefficient. Targeting of the electric current to an exact muscle may notbe precise and stimulating muscle may be very difficult nearlyimpossible. Additionally, with thicker adipose tissue, electric currentdelivered by electrotherapy has to be higher and such high amount ofelectric current propagating and dissipating during long distance may bevery uncomfortable for a patient. On the other hand, time-varyingmagnetic fields induce electric current in the muscle, neuromuscularplate and/or in the nerve, so targeting and muscle stimulation bytime-varying magnetic field is easier, more precise, comfortable andmore effective. Time-varying magnetic field also enable comfortablestimulation or large number of muscles and/or muscle groups andapplicator may not be in direct contact with the patient's body that mayalso improve hygiene and other parameters of a treatment.

Combination of a radiofrequency (RF) treatment that provides heating upof patient's soft tissue and a magnetic treatment that providesstimulation of patient's muscle tissue may have outstanding synergiceffect. Combined treatment may provide improved treatment, may result inshorter treatment periods, increase of patient's comfort during thetreatment, enable to combine different treatment effects with a synergicresult, improve patient safety and others deeply described later in thisdocument.

To reach the best synergic effect it is preferred to target magnetictreatment providing muscle stimulation and RF treatment to one body area(e.g. same body area) wherein at least one RF electrode providing the RFtreatment should be flat and/or correspond with patient's skin to ensurehomogenous heating of the patient's soft tissue. To target the RFtreatment and the magnetic treatment to the same body area requires toposition a magnetic field generating device and an RF electrode nearbyeach other, e.g. with at least partial overlay of the magnetic fieldgenerating device and RF electrode. However, arranging an RF electrodeand the magnetic field generating device in close proximity may beproblematic, because the time-varying magnetic field generated by themagnetic field generating device may induce unwanted physical effects,such as eddy currents, skin effect and/or other physical effects in theRF electrode. Unwanted physical effects may cause significant energyloss, inefficiency of such device arrangement and also heating of the RFelectrode, influencing of the device function, such as incorrect tuningof the device, inaccurate targeting of produced energies, degenerationof produced magnetic, electromagnetic fields and/or other. The RFelectrode may be influenced by the magnetic field generating device andvice versa.

A device and method described in this document presents a solution forproviding the RF and magnetic treatment with maximized synergic effectand also preserve safety and efficiency of the delivered magnetic and RF(electromagnetic) fields.

SUMMARY OF THE INVENTION

The invention provides a treatment device and method for providing oneor more treatment effects to at least one biological structure in atleast one body area. The treatment device provides a unique opportunityhow to shape human or animal bodies, improve visual appearance, restoremuscle functionality, increase muscle strength, change (e.g. increase)muscle volume, change (e.g. increase) muscle tonus, cause muscle fibrehypertrophy, cause muscle fibre hyperplasia, decrease number and volumeof adipose cells and adipose tissue, remove cellulite and/or other. Thetreatment device and the method may use the application of aradiofrequency (RF) treatment and a magnetic treatment to cause heatingof at least one target biological structure within the body area andcause muscle stimulation including muscle contraction, within theproximate or same body area. The treatment device may use an RFelectrode as a treatment energy source to produce RF energy (which maybe referred as RF field) to provide RF treatment, and a magnetic fieldgenerating device as a treatment energy source for generating atime-varying magnetic field to provide magnetic treatment.

In order to enhance efficiency and safety of the treatment, to minimizeenergy loss and unwanted physical effect induced in at least one RFelectrode and/or magnetic field generating device, the device may usethe one or more segmented RF electrodes, wherein the segmented RFelectrode means RF electrode with e.g. one or more apertures, cutoutsand/or protrusions to minimize the effects of a nearby time-varyingmagnetic field produced by the magnetic field generating device.Aperture may be an opening in the body of the RF electrode. The cutoutmay be an opening in the body of the RF electrode along the border ofthe RF electrode. Openings in the body of the RF electrode may bedefined by view from floor projection, which shows a view of the RFelectrode from above. The apertures, cutouts and/or areas outside ofprotrusions may be filed by air, dielectric and/or other electricallyinsulating material. The apertures, cutouts and/or protrusions of the RFelectrode may minimize induction of eddy currents in the RF electrode,minimize energy loss, and inhibit overheating of the treatment device.Further, the apertures, cutouts and/or protrusions may minimize theinfluence of the magnetic treatment on the produced RF treatment. Theproposed design of the RF electrode enables the same applicator toinclude a magnetic field generating device and the RF electrode with atleast partial overlay, according to the applicator's floor projection,while enabling targeting of RF treatment and magnetic treatment to thesame area of the patient's body with the parameters described herein.Incorporation of an RF electrode and a magnetic field generating devicein one applicator enables enhanced treatment targeting and positivetreatment results with minimal negative effects mentioned above.

Also mutual insulation of at least one RF circuit and at least onemagnet circuit prevent interaction between electric and/orelectromagnetic signals.

The magnetic field generating device in combination with an energystorage device enables production of a magnetic field with an intensity(which may be magnetic flux density) which evokes a muscle contraction.Energy storage device may be used to store electrical energy enablingaccumulation of an electric field having a voltage in a range from 500 Vto 15 kV. The energy storage device may supply the magnetic fieldgenerating device with the stored electrical energy in an impulse ofseveral microseconds to several milliseconds.

The method of treatment enables heating of at least one body area whereis also evoked a muscle contraction that minimizes muscle and/orligament injury, such as tearing or inflammation. Heating of a skin, acontracted muscle, a contracting muscle, a relaxed muscle, adiposetissue, adipose tissue, and/or adjacent biological structure of thetreated body area may shift the threshold when a patient may considertreatment to be uncomfortable.

Therefore, heating may allow a higher amount of electromagnetic energy,(e.g. RF and/or magnetic field) to be delivered to the patient's body inorder to provide more muscle work through muscle contractions andsubsequent relaxation. Another benefit of application of the RFtreatment and the magnetic treatment in the same body area is that themuscle work (provided e.g. by repetitive muscle contractions andrelaxations) accelerates blood and lymph flow in the targeted area andso improves dissipation of thermal energy created by the RF treatment.Application of the RF treatment and the magnetic treatment also improveshomogeneity of biological structure heating that prevents creation ofhot spots, edge effects and/or other undesirable effects. The method oftreatment causing muscle stimulation and heating to the same body areamay result in hyperacidity of extracellular matrix that leads toapoptosis or necrosis of the adipose tissue. The RF treatment mayprovide selective heating of adipose tissue that leads to at least oneof apoptosis, necrosis, decrease of volume of adipose cells, andcellulite removal.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated herein and form a partof the specification, illustrate the present disclosure and, togetherwith the description, further serve to explain the principles thereofand to enable a person skilled in the pertinent art to make and use thesame.

FIGS. 1a-1e illustrate exemplary diagrams of a treatment device.

FIG. 1f illustrates exemplary individual parts of a treatment device.

FIG. 2 illustrates an exemplary communication diagram between parts ofthe treatment device such as an applicator, a remote control, anadditional treatment device and a communication device.

FIG. 3 illustrates an exemplary communication diagram between a serverand part of the treatment device such as applicators, remote control andadditional treatment devices.

FIG. 4 illustrates an exemplary communication diagram between acommunication medium, a therapy generator and a master unit of thetreatment device.

FIG. 5 illustrates a communication between a communication medium and atherapy generator of the treatment device.

FIG. 6 illustrates different views of an exemplary main unit of thetreatment device.

FIG. 7 illustrates an exemplary human machine interface (HMI).

FIGS. 8a-8d illustrate parts of an exemplary applicator from the outerview.

FIG. 9a illustrates an exemplary magnetic field generating device fromthe applicator's floor projection.

FIG. 9b illustrates a thickness of exemplary magnetic field generatingdevice.

FIGS. 10a-10g illustrate possible locations of an exemplary RF electrodewith regard to an exemplary magnetic field generating device.

FIG. 11 illustrates a floor projection of a location of an exemplary RFelectrode locating with regard to an exemplary magnetic field generatingdevice.

FIG. 12 illustrates a floor projection of an applicator including RFelectrodes and a magnetic field generating device with partial overlayaccording to applicator's floor projection.

FIGS. 13a-13b illustrate an exemplary RF electrode with apertures.

FIG. 13c illustrates an exemplary RF electrode with apertures,protrusions and cutouts.

FIG. 13d illustrates another exemplary RF electrode with apertures andcutouts.

FIG. 13e illustrates an exemplary RF electrode with protrusions.

FIGS. 14a-14e illustrate a parallel pair of bipolar RF electrodes withprotrusions.

FIGS. 15a-15c illustrate bipolar RF electrode pairs with protrusions,wherein a first RF electrode at least partially encircle a second RFelectrode of RF electrodes pair.

FIG. 16 illustrates one exemplary protrusion intersecting magnetic fieldlines with a difference higher than 0.1 T.

FIG. 17 illustrates an exemplary schema of a magnet circuit.

FIG. 18a illustrates an exemplary schema of electrical elements oftreatment device.

FIG. 18b illustrates exemplary schema of a RF circuit.

FIG. 19 illustrates an exemplary composition of magnetic field includingimpulses or pulses.

FIG. 20 illustrates a trapezoidal envelope.

FIG. 21 illustrates different types of muscle stimulation.

FIG. 22 illustrates a supporting matrix for attaching of an applicatorand/or an additional treatment device to a patient's body.

FIG. 23 illustrates a section of exemplary curved applicator's firstside portion.

FIG. 24 illustrates an exemplary symmetrisation element SYM.

FIG. 25 illustrates an exploded view of applicator elements.

FIG. 26 illustrates an exemplary spatial arrangement of componentswithin a main unit of a treatment device.

FIGS. 27a-27d illustrate an example of synchronous application ofmagnetic fields.

FIG. 27e illustrates an example of separate application of magneticfields.

FIG. 28 illustrates an exemplary increasing envelope of magnetic field.

FIG. 29 illustrates an exemplary decreasing envelope of magnetic field.

FIG. 30 illustrates an exemplary rectangular envelope of magnetic field.

FIG. 31 illustrates an exemplary combined envelope of magnetic field.

FIG. 32 illustrates another exemplary combined envelope of magneticfield.

FIG. 33 illustrates an exemplary triangular envelope of magnetic field.

FIG. 34 illustrates an exemplary trapezoidal envelope of magnetic field.

FIG. 35 illustrates another exemplary trapezoidal envelope of magneticfield.

FIG. 36 illustrates another exemplary trapezoidal envelope of magneticfield.

FIG. 37 illustrates an exemplary step envelope of magnetic field.

FIG. 38 illustrates another exemplary step envelope of magnetic field.

FIG. 39 illustrates another exemplary trapezoidal envelope of magneticfield.

FIG. 40 illustrates an example of envelope of magnetic field includingmodulation in domain of repetition rate.

FIG. 41 illustrates an exemplary trapezoidal envelope formed from trainsof magnetic field.

FIG. 42 illustrates another exemplary combined envelope of magneticfield.

FIG. 43 illustrates another exemplary combined envelope of magneticfield.

FIG. 44 illustrates two exemplary envelopes of magnetic field with anexample of inter-envelope period.

DETAILED DESCRIPTION

The present treatment device and method of use provide new physiotherapyand/or aesthetic treatment by combination of RF treatment and treatmentproviding muscle stimulation targeted to various treatment effects, suchas rejuvenate, heal and/or provide remodeling at least part of at leastone biological structure of patient's tissue in at least one body area.

The biological structure may be any tissue in a human and/or animal bodywhich may have of identical function, structure and/or composition. Thebiological structure may include or be at least part of any type oftissue like: connective tissue (e.g. tendons, ligaments, collagen,elastin fibres), adipose tissue (e.g. adipose cells of subcutaneousadipose tissue and/or visceral adipose tissue), bones, dermis and/orother tissue, such as at least one neuron, neuromuscular plate(neuromuscular junction), muscle cell, one or more individual muscles,muscle group, at least part of a muscle fibre, volume of extracellularmatrix, endocrine gland, neural tissue (e.g. peripheral neural tissue,neuron, neuroglia, neuromuscular plate) and/or joint or part of joint.For the purpose of this application, the biological structure may becalled target biological structure.

A treatment effect provided to at least part of at least one targetbiological structure may include muscle contraction (includingsupramaximal contractions and/or tetanic contractions), muscle twitch,muscle relaxation and heating of biological structure. Also, thetreatment effect may include e.g. remodelling of the biologicalstructure, reducing a number and/or a volume of adipose cells byapoptosis and/or necrosis, muscle strengthening, muscle volume increase,causing of a muscle fibre hypertrophy, muscle fibre hyperplasia,restoration of muscle functionality, myosatellite cells proliferationand/or differentiation into muscle cells, improvement of muscle shape,improving of muscle endurance, muscle definition, muscle relaxation,muscle volume decrease, restructuring of collagen fibre,neocollagenesis, elastogenesis, collagen treatment, improving of bloodand lymph flow, accelerate of at least part of at least one targetbiological structure and/or other functions or benefits. Duringtreatment of body area by the treatment device, more than one treatmenteffect may be provided and variable treatment effects may be combined.

The treatment effect provided to target biological structure may resultsin body shaping, improving contour of the body, body toning, muscletoning, muscle shaping, body shaping, breast lifting, buttock lifting,buttock rounding and/or buttock firming. Further, providing a treatmenteffect may result in body rejuvenation, such as wrinkle reduction, skinrejuvenation, skin tightening, unification of skin colour, reduction ofsagging flesh, lip enhancement, cellulite removing, reduction of stretchmarks and/or removing of scars. The treatment effect may also lead toaccelerating of healing process, anti-edematic effect and/or otherphysiotherapeutic and treatment result.

The treatment device may provide one or more types of treatment energywherein treatment energy may include magnetic field (also referred asmagnetic energy) and RF field (also referred as RF energy) and/ormagnetic field (also referred as magnetic energy). The magnetic field isprovided during magnetic treatment. The RF field provided during RFtreatment may include electrical component of RF field and magneticcomponent of RF field. The electrical component of RF field may bereferred as RF wave or RF waves. The RF electrode may generate RF field,RF waves and/or other components of RF field.

The magnetic field and/or RF field may be characterized by intensity. Incase of magnetic field, the intensity may include magnetic flux densityor amplitude of magnetic flux density. In case of RF field, theintensity may include energy flux density of the RF field or RF waves.

A body area may include at least part of patient's body including atleast a muscle or a muscle group covered by other soft tissue structurelike adipose tissue, skin and/or other. The body area may be treated bythe treatment device. The body area may be body part, such as a buttock,saddlebag, love handle, abdominal area, hip, leg, calf, thigh, arm,torso, shoulder, knee, neck, limb, bra fat, face or chin and/or anyother tissue. For the purpose of the description the term “body area”may be interchangeable with the term “body region”.

Skin tissue is composed of three basic elements: epidermis, dermis andhypodermis so called subcutis. The outer and also the thinnest layer ofskin is the epidermis. The dermis consists of collagen, elastic tissueand reticular fibres. The hypodermis is the lowest layer of the skin andcontains hair follicle roots, lymphatic vessels, collagen tissue, nervesand also fat forming a subcutaneous white adipose tissue (SWAT). Adiposetissue may refer to at least one lipid rich cell, e.g. adipose cell likeadipocyte. The adipose cells create lobules which are bounded byconnective tissue or fibrous septa (retinaculum cutis).

Another part of adipose tissue, so called visceral adipose tissue, islocated in the peritoneal cavity and forms visceral white adipose tissue(VWAT) located between parietal peritoneum and visceral peritoneum,closely below muscle fibres adjoining the hypodermis layer.

A muscle may include at least part of a muscle fibre, whole muscle,muscle group, neuromuscular plate, peripheral nerve and/or nerveinnervating of at least one muscle.

Deep muscle may refer to a muscle that is at least partially covered bysuperficial muscles and/or to a muscle covered by a thick layer of othertissue, such as adipose tissue wherein the thickness of the coveringlayer may be at least 4, 5, 7, 10 or more centimetres up to 15 cm thick.

Individual muscles may be abdominal muscles including rectusabdominalis, obliquus abdominalis, transversus abdominis, and/orquadratus lumborum. Individual muscles may be muscle of the buttocksincluding gluteus maximus, gluteus medius and/or gluteus minimus.Individual muscles may be muscles of lower limb including quadricepsfemoris, Sartorius, gracilis, biceps femori, adductor magnuslongus/brevis, tibialis anterior, extensor digitorum longus, extensorhallucis longus, triceps surae, gastroenemiis lateralis/medialis,soleus, flexor hallucis longus, flexor digitorum longus, extensordigitorum brevis, extensor hallucis brevis, adductor hallucis, abductorhalluces, ab/adductor digiti minimi, abductor digiti minimi and/orinterossei plantares). Ligament may be Cooper's ligament of breast.

One example may be application of the treatment device and method topatient's abdomen that may provide (or where the treatment mayeventually result in) treatment effect such as reducing a number andvolume of adipose cells, muscle strengthening, fat removal,restructuring of collagen fibres, accelerate of neocollagenesis andelastogenesis, muscle strengthening, improving of muscle functionality,muscle endurance and muscle shape. These treatment effects may causecircumferential reduction of the abdominal area, removing of saggy bellyand/or firming of abdominal area, cellulite reduction, scar reductionand also improving of the body posture by strengthening of the abdominalmuscles that may also improve contour of the body, body look andpatient's health.

One other example may be application of the treatment device and methodto body area comprising buttock that may provide (or where the treatmentmay eventually result in) treatment effect such as reducing a number andvolume of adipose cells, restructuring of collagen fibres, accelerate ofneocollagenesis and elastogenesis, muscle strengthening, muscle toningand muscle shaping. These treatment effects may cause waist or buttockcircumferential reduction, buttock lifting, buttock rounding, buttockfirming and/or cellulite reduction.

Another example may be application of the treatment device and method tobody area comprising thighs that may provide (or where the treatment mayeventually result in) reduction of a number and volume of adipose cells,muscle strengthening, muscle shaping and muscle toning. The applicationof the treatment device and method to body area comprising thigh maycause circumferential reduction of the thigh, removing of saggy bellyand cellulite reduction.

Still another example may be application of the treatment device andmethod to body area comprising arm that may provide (or where thetreatment may eventually result in) reduction of a number and volume ofadipose cells, muscle strengthening, muscle shaping and muscle toning.The application of the treatment device and method to body areacomprising arm may cause circumferential reduction of the abdomen,removing of saggy belly and cellulite reduction.

The one or more treatment effects provided to one or more targetbiological structures may be based on selective targeting of a RF fieldinto one or more biological structures and providing heating togetherwith application of magnetic field causing muscle stimulation (includingmuscle contraction). The RF treatment may cause selective heating of oneor more biological structures, polarizing of extracellular matrix and/orchange of cell membrane potential in a patient's body. The magneticfield may be time-varying magnetic field or static magnetic field. Whenthe time-varying magnetic field is used, the magnetic treatment may bereferred as time-varying magnetic treatment. The magnetic treatment maycause muscle contraction, muscle relaxation, cell membrane polarization,eddy currents induction and/or other treatment effects caused bygenerating time-varying magnetic field in at least part of one or moretarget biological structures. The time-varying magnetic field may induceelectric current in biological structure, The induced electric currentmay lead to muscle contraction. The muscle contractions may berepetitive. Muscle contraction provided by magnetic field may includesupramaximal contraction, tetanic contraction and/or incomplete tetaniccontraction. In addition, magnetic field may provide muscle twitches.

The treatment effect provided by using of the treatment device and byapplication of magnetic treatment and RF treatment may be combined. Forexample, reduction of a number and volume of adipose cells may beachieved together with muscle strengthening, muscle shaping and/ormuscle toning during actual treatment or during a time (e.g. three orsix months) after treatment. Furthermore, the effect provided by usingof the treatment device by application of magnetic treatment and RFtreatment may be cumulative. For example, the muscle toning may beachieved by combined reduction of a number and volume of adipose cellsmay be achieved together with muscle strengthening.

The method of treatment may provide the treatment effect to at least oneof target biological structure by thermal treatment provided by RF fieldin combination with applied magnetic treatment. The treatment effect toa target biological structure may be provided by heating at least onebiological structure and evoking at least a partial muscle contractionor muscle contraction of a muscle by magnetic treatment.

The method of treatment may enable heating of the body area where themuscle contraction by the magnetic field is evoked. The heating mayminimize muscle injury and/or ligament injury including tearing orinflammation. Heating of a contracting muscle and/or adjacent biologicalstructure may also shift the threshold of uncomfortable treatment.Therefore, heating caused by the RF field may allow a higher amount ofmagnetic energy to be delivered into patient's biological structure todo more muscle work. Heating of the muscle and/or adjacent biologicalstructure may also improve the quality of and/or level of musclecontraction. Because of heating provided by RF field, more muscle fibresand/or longer part of the muscle fibre may be able to contract duringthe magnetic treatment. Heating may also improves penetration of musclestimuli generated by the magnetic treatment. Additionally, when at leastpartial muscle contraction or muscle contraction is repeatedly evoked,the patient's threshold of uncomfortable heating may also be shiftedhigher. Such shifting of the threshold may allow more RF energy to bedelivered to the patient's body.

Repeated muscle contraction followed by muscle relaxation in combinationwith heating may suppress the uncomfortable feeling caused by musclestimulation (e.g. muscle contraction). Muscle stimulation in combinationwith heating may provide better regeneration after treatment and/orbetter prevention of panniculitis and other tissue injury.

Repeated muscle contraction followed by muscle relaxation in combinationwith RF heating (according to preliminary testing) may have positiveresults in treatment and/or suppressing symptoms of diabetes. Therepetitive muscle contraction induced by provided magnetic fieldtogether with heating of the biological structure by RF field may alsoimprove the outcome of diabetes symptoms or positively influence resultsof diabetes symptoms drug treatment. Success of treatment of diabetessymptoms may be caused by penetration of high amount of radiofrequencyenergy deep to patient's abdomen area. Such penetration may be caused bysimultaneous application of magnet treatment that may cause suppressingof patient's uncomfortable feelings related to high amount of RF energyflux density and increased temperature in the tissue. Also, magnettreatment may cause polarization and depolarization of patient's tissuethat may also increase RF energy penetration to patient's body. The RFtreatment and/or magnetic treatment may influence glucose metabolism orhelp with weight loss that may suppress diabetes symptoms. It is abelieve that weight loss and exercise of patients with diabetes symptomsmay help suppress diabetes symptoms.

Application of RF treatment by RF field combined with magnetic treatmentby magnetic field may also positively influence proliferation anddifferentiation of myosatellite cells into muscle cells. Tests suggestthat magnet treatment including time periods with different duration,repetition rate and magnetic flux density (e.g. pulses or trains asdefined below) may provide a stimulation needed to start proliferationand differentiation of myosatellite cells.

Testing also suggest that method of treatment providing magnetic fieldincluding at least two or at least three successive time periods withdifferent duration, repetition rate and magnetic flux density (e.g.pulses, bursts or trains as defined below) may provide a shock to themuscle. As a consequence, the regeneration process resulting inproliferation and differentiation of myosatellite cells may be startedand further accelerated by delivered RF field. Proliferation anddifferentiation of myosatellite cells may result in musclestrengthening, restoration of muscle functionality, increasing musclevolume and improvement of muscle shape, body tone or muscle tone.

The method of application of at least partial muscle stimulation ormuscle contraction together with heating to the same body area mayresult in hyperacidity of the extracellular matrix. Hyperacidity maylead to apoptosis of adipose tissue and acceleration of weight loss andbody volume loss. Hyperacidity may be caused by release of fatty acidsinto the extracellular matrix, wherein the release of fatty acids may becaused by concentrated high intensity muscle work. Concentrated highintensity muscle work may be provided by high number of repetitivemuscle contractions causes by application of time-varying magnetic fieldgenerated by described magnetic field generating device and treatmentdevice.

The treatment effect of the RF treatment may be enhanced by magnetictreatment, such as by reducing or eliminating the risk of panniculitisor local skin inflammation since any clustering of the treatedadipocytes may be prevented by the improved metabolism. The improvedblood and/or lymph flow may contribute to removing adipocytes. Theremoval of adipocytes may be promoted by a higher number of cellsphagocytosing the adipocytes as well. Synergic effects of magnetictreatment and radiofrequency (RF) treatment significantly improvesmetabolism. Therefore, the possibility of adverse event occurrence islimited and treatment results induced by the present invention arereached in shorter time period.

The treatment device and the method of a treatment may provide treatmentof the same patient's body area, wherein the magnetic treatment and theRF treatment may be targeted into at least part of one or morebiological structures. One or more volumes of patient's body tissueaffected by targeted RF and/or magnetic treatment may be in proximity.The volume of at least part of at least one or more affected biologicalstructures of patient's body tissue may be defined as an affected tissuevolume wherein the treatment effect provided by treatment device and/ormethod of treatment described above takes place. The treatment effectmay be caused by repeated muscle contraction (provided e.g. magnetictreatment) changing of a tissue temperature (provided e.g. RFtreatment), and/or by at least partial polarization and acceleration ofmolecules in the patient's tissue (preferably provided by RF treatmentand magnetic treatment). Changing of a tissue temperature may includee.g. an increasing tissue temperature of at least 3° C. or 4° C. or 5°C. or 6° C. or 7° C. or 10° C. with reference to normal tissuetemperature. Further, changing of a tissue temperature may include anincrease or decrease of tissue temperature in the range of 1° C. to 50°C. or 2° C. to 30° C. or 2° C. to 25° C. as compared to the untreatedtissue located in the same or different body area. Changed tissuetemperature may be interpreted as change of temperature in any volume orany area of the biological tissue.

Proximity of affected tissue volumes by at least one RF treatment and/orby at least one magnetic treatment has meaning of a distance between twoaffected tissue volumes. At least two proximate affected tissue volumesmay have at least partial overlay wherein 2% to 15% or 5% to 30% or 2%to 100% or 30% to 60% or 80% to 100% or 40% to 85% of smaller affectedtissue volume may be overlaid by larger affected tissue volume. Also thedistance between volumes of affected tissue may be in a range of 0.01 cmto 10 cm or in the range of 0.01 cm to 5 cm, 0.01 cm to 3 cm, or 0.01 cmto 1 cm. Alternatively, the overlay in the ranges mentioned above mayapply for two or more affected tissue volumes having an identical volumewithout any differentiation between smaller or larger tissue volumes.

FIGS. 1a-1e show exemplary schematic diagrams of the treatment device.The diagrams may apply only to main unit and applicator. The treatmentdevice may include input interface 103, control system 104, power source105, power network 106, one or more treatment clusters 107 and one ormore treatment energy sources 108.

Plurality of treatment energy sources 108 may be coupled to orcommunicate with at least one treatment cluster 107. Control system 104may be coupled to and communicate with each treatment cluster.

Shown parts of treatment device in FIGS. 1a-1e may be electricalelements of circuitry. Also, one or more shown parts of diagrams inFIGS. 1a-1e may include plurality of individual electrical elements.Electrical elements may generate, transfer, modify, receive or transmitelectromagnetic signal (e.g. electrical) signal between individualelectrical elements. The electromagnetic signal may be characterized bycurrent, voltage, phase, frequency, envelope, value of the current,amplitude of the signal and/or their combination. When theelectromagnetic signal reaches the treatment energy source, therespective treatment energy source may generate treatment energy and/orfield.

Input interface 103 may receive input from a user. Input interface mayinclude human machine interface (HMI). The HMI may include one or moredisplays, such as a liquid crystal display (LCD), a light emitting diode(LED) display, an organic LED (OLED) display, which may also include atouch-screen display. HMI may include one or more controlling elementsfor adjustment or controlling treatment device. Controlling element maybe at least one button, lever, dial, switch, knob, slide control,pointer, touchpad and/or keyboard. The input interface may communicateor be coupled to control system or power network.

The user may be an operator (e.g. medical doctor, technician, nurse) orpatient himself, however the treatment device may be operated by patientonly. In most cases, the treatment device may be operated by the userhaving an appropriate training. The user may be any person influencingtreatment parameters before or during the treatment in most cases withexception of the patient.

Control system 104 may include a master unit or one or more controlunits. Control system may be an integral part of the input interface103. Control system 104 may be controlled through the input interface103. Control system may include one or more controlling elements foradjustment or controlling any part or electrical elements of treatmentdevice. Master unit is a part of treatment device (e.g. applicatorand/or main unit) or electrical element of circuitry that may beselected by the user and/or treatment device in order to providemaster-slave communication including high priority instructions to otherparts of the treatment device. For example, master unit may be a controlunit or part of input interface providing high priority instructions toother parts of the treatment device. The treatment device may include achain of master-slave communications. For example, treatment cluster 107may include one control unit providing instructions for electricalelements of the treatment cluster 107, while the control unit oftreatment cluster 107 is slave to master unit. Control system 104 may becoupled or communicate with input interface 103, one or all power source105, power network 106, and/or with one or all treatment clusterspresent in the treatment device. The control system 104 may include oneor more processors (e.g. a microprocessors) or process control blocks(PCBs).

The power source 105 may provide electrical energy including electricalsignal to one or more treatment clusters. The power source may includemodule converting AC voltage to DC voltage.

The power network 106 may represent a plug. The power network mayrepresent a connection to power grid. However, the power network mayrepresent a battery for operation of the treatment device without needof a power grid. The power network may provide electrical energy neededto operation to whole treatment device and/or its parts. As shown onexemplary diagrams in FIGS. 1a-1e , the power network provideselectrical energy to input interface 103, control system 104 and powersource 105.

The treatment cluster 107 may include one or more electrical elementsrelated to generation of respective treatment energy. For example, thetreatment cluster for magnetic treatment (referred as HIFEM) may includee.g. an energy storage element and switching device. For anotherexample, the treatment cluster for RF treatment (referred as RF cluster)may include e.g. power amplifier and/or filter.

The treatment energy source 108 may include a specific source oftreatment energy. In case of magnetic treatment, the treatment energysource of magnetic field may be a magnetic field generating device e.g.a magnetic coil. In case of RF treatment, the treatment energy source ofRF energy (including RF waves) may be RF electrode.

The treatment device may include one or more treatment circuits. Onetreatment circuit may include a power source, electrical elements of onetreatment cluster and one respective treatment energy source. In case ofmagnetic treatment, the magnetic circuit may include a power source,HIFEM cluster and magnetic field generating device. In case of RFtreatment, the RF circuit may include a power source, RF cluster andmagnetic field generating device. The electromagnetic signal generatedand/or transmitted within a treatment circuit for RF treatment may bereferred as RF signal. The wiring connecting respective electricalelements of the one treatment cluster may also be included in therespective cluster. Each of the treatment clusters in FIGS. 1a-1edescribed in the detail below may be any of HIFEM, RF or combination.

The one or more treatment circuits and/or their parts may beindependently controlled or regulated by any part of control system 104.For example, the speed of operation of HIFEM cluster of one treatmentcircuit may be regulated independently on the operation of HIFEM clusterof another treatment circuit. In another example, the amount of energyflux density of delivered by operation of RF electrode of one treatmentcircuit may be set independently from the operation of RF electrode ofanother treatment circuit.

FIG. 1a shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, power source 105, power network106, two treatment clusters including treatment cluster A 107 a,treatment cluster B 107 b, treatment energy source A 108 a and treatmentenergy source B 108 b. In such case, treatment device may include twotreatment circuits. One treatment circuit may include a power source105, treatment cluster A 107 a and/or treatment energy source A 108 a.Another treatment circuit may include a power source 105, treatmentcluster B 107 b and/or treatment energy source B 108 b. Treatmentclusters 107 a and 107 b may communicate with each other.

FIG. 1b shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, two power sources including apower source A 105 a and a power source B 105 b, power network 106, twotreatment clusters including treatment cluster A 107 a and treatmentcluster B 107 b, treatment energy source A 108 a and treatment energysource B 108 b. In such case, treatment device may include two treatmentcircuits. One treatment circuit may include a power source 105 a,treatment cluster A 107 a and/or treatment energy source A 108 a.Another treatment circuit may include a power source B 105 b, treatmentcluster B 107 b and/or treatment energy source B 108 b. Treatmentclusters 107 a and 107 b may communicate with each other.

FIG. 1c shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, power source 105, power network106, two treatment clusters including treatment cluster A 107 a andtreatment cluster B 107 b and one treatment energy source 108. In suchcase, treatment device may include two treatment circuits. One treatmentcircuit may include a power source 105, treatment cluster A 107 a and/ortreatment energy source 108. Another treatment circuit may include thepower source 105, treatment cluster B 107 b and/or treatment energysource 108. Treatment clusters 107 a and 107 b may communicate with eachother. The shown diagram may include a magnetic field generating deviceproviding both RF treatment and magnetic treatment.

FIG. 1d shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, power source 105, power network106, four treatment clusters including treatment cluster A1 107 a,treatment cluster A2 107 aa, treatment cluster B1 107 b, treatmentcluster B2 107 bb and four treatment energy sources including treatmentenergy source A1 108 a, treatment energy source A2 108 aa, treatmentenergy source B1 108 b and treatment energy source B2 108 bb. In suchcase, treatment device may include four treatment circuits. Firsttreatment circuit may include a power source 105, treatment cluster A1107 a and/or treatment energy source 108 a. Second treatment circuit mayinclude the power source 105, treatment cluster A2 107 aa and/ortreatment energy source A2 108 aa. Third treatment circuit may include apower source 105, treatment cluster B1 107 b and/or treatment energysource B1 108 b. Fourth treatment circuit may include a power source105, treatment cluster B2 107 bb and/or treatment energy source B2 108bb. The treatment energy sources of the first treatment circuit andsecond treatment circuit may be positioned in one applicator, while thetreatment energy sources of the third treatment circuit and fourthtreatment circuit may be positioned in another applicator.

FIG. 1e shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, two power sources includingpower source A 105 a and power source B 105 b, power network 106, fourtreatment clusters including treatment cluster A1 107 a, treatmentcluster A2 107 aa, treatment cluster B1 107 b, treatment cluster B2 107bb and four treatment energy sources including treatment energy sourceA1 108 a, treatment energy source A2 108 aa, treatment energy source B1108 b and treatment energy source B2 108 bb. In such case, treatmentdevice may include four treatment circuits. First treatment circuit mayinclude a power source A 105 a, treatment cluster A1 107 a and/ortreatment energy source 108 a. Second treatment circuit may include apower source A 105 a, treatment cluster A2 107 aa and/or treatmentenergy source A2 108 aa. Third treatment circuit may include a powersource B 105 b, treatment cluster B1 107 b and/or treatment energysource B1 108 b. Fourth treatment circuit may include a power source B105 b, treatment cluster B2 107 bb and/or treatment energy source B2 108bb. The treatment energy sources of the first treatment circuit andsecond treatment circuit may be positioned in one applicator, while thetreatment energy sources of the third treatment circuit and fourthtreatment circuit may be positioned in another applicator.

FIG. 1f illustrates individual parts of the treatment device, includinga main unit 11 connected or coupled to at least one applicator 12, aremote control 13, an additional or additional treatment device 14,and/or a communication device 15. The additional treatment device may beon the same level of independency as the whole treatment device.

The treatment device may include a remote control 13. Remote control 13may include a discomfort button for safety purposes so that when apatient feels any discomfort during the treatment, the user may pressthe discomfort button. When the discomfort button is pressed, remotecontrol 13 may send a signal to a main unit and stop treatment. Also,the remote control 13 may inform the user through a human machineinterface (HMI). In order to stop treatment during discomfort, theoperation of the discomfort button may override the instructions frommaster unit. Alternatively, the discomfort button may be coupled to orbe part of the main unit 11.

The main unit 11 may be coupled or connected to one or more additionaltreatment devices 14 that may be powered by the main unit 11. However,the treatment device including main unit 11 may be paired by softwarewith the one or more additional treatment devices 14. Also, one or moreadditional treatment devices 14 may be also powered by their own sourceor sources of energy. The communication device 15, additional treatmentdevice 14, remote control 13 and at least one applicator 12 may eachcommunicate with the main unit 11. Communication may include sendingand/or receiving information. Communication may be provided by wireand/or wirelessly, such as by internet network, local network, RF waves,acoustic waves, optical waves, 3G, 4G, 5G, GSM, HUB switch, LTE network,GSM network, Bluetooth and/or other communication methods or protocols.

The additional treatment device 14 may be any device that is able toprovide at least one type of treatment energy (e.g.: RF field, magneticfield, ultrasound, light, time-varied mechanical pressure, shock wave,or electric current) to a patient's body to cause treatment effect to atleast one target biological structure. The additional treatment device14 may include at least one electrical element generating treatmentenergy for at least one treatment e.g. magnet, radiofrequency, light,ultrasound, heating, cooling, massage, plasma and/or electrotherapy. Theadditional treatment device 14 may be able to provide at least onetreatment without instructions from the main unit 11. The additionaltreatment device 14 may communicate with the main unit 11, communicationdevice 15 and/or other additional treatment devices 14. The additionaltreatment devices 14 may be any other device of the same or othercompany wherein the device may be able to provide specific one or moretype of treatment energy. The additional treatment device 14 may be anextension of the treatment device, wherein the additional treatmentdevice 14 may provide treatment energy with parameters defined by theHMI of the main unit 11.

The communication device 15 may be connected by wire and/or wirelesslyto the main unit 11. The communication device 15 may be a computer, suchas a laptop or desktop computer, or a mobile electronic device, such asa smartphone, or an electronic tablet. The communication device may sendand/or receive information linked with a treatment, functionality of thetreatment device, and/or other information. The additional treatmentdevice 14 and/or the communication device 15 may communicate directlywith the main unit 11 or indirectly with the main unit 11 through one ormore additional or communication devices. In order to providecommunication the communication device may include receiver, transmitterand a control unit to process sent and/or received information.

Sent and/or received information from or to an individual part of thetreatment device may include data from communication betweencommunication device 15 and the main unit 11, data from communicationbetween applicator 12 and the main unit 11, data from communicationbetween additional treatment device 14 and the main unit 11 and/or datafrom communication between the remote control 13 and the main unit 11.Sent and/or received information may be stored in a black box, cloudstorage space and/or other storage devices. The black box may be part ofthe main unit 11 or any other part of the treatment device. Otherstorage device may be USB, other memory device and/or also communicationdevice with internal memory. At least part of sent and/or receivedinformation may be also displayed by HMI. Sent and/or receivedinformation may be displayed, evaluated and/or changed by the userthrough the HMI and/or automatically by control system. One type of thesent and/or received information may be predetermined or current valueor selection of one or more treatment parameters or patient information.Patient information may include e.g. gender of a patient, age and/orbody type of the patient.

Sent and/or received information may also inform external authorities,like a support centre, e.g. a service and/or a sale department, that arealso subset of communication devices. Sent and/or received informationto external authorities may include information about the condition ofthe treatment device, history of one or more provided treatments,operational history of the treatment device, software updateinformation, wear out information, durability of the RF electrode,durability of the magnetic field generating device, treatment warnings,treatment credit/billing information, such as information of number ofpaid treatments or credits, and/or other operation and usageinformation.

One possible type of sent and/or received information may be recognitionof connection of one or more applicators 12, the remote control 13,additional treatment devices 14, and/or communication devices 15,According to information the treatment device may manually orautomatically recognize type of connected additional treatment device 14and/or applicator 12. Automatic recognition may be provided by controlsystem. Based on information about connection of one or more applicators12, connection of additional treatment devices 14 and/or communicationdevices 15, the treatment device may provide actualization of HMI, shownotification about the connection to applicators and/or possibleoptimization of new treatment options. Possible optimization of newtreatment options may include e.g. adjusting of at least one treatmentparameter, implementing additional treatment energy source, change ofparameters of new treatment energy source and/or other. The treatmentdevice (e.g. control system) may automatically adjust or offeradjustment of treatment parameters based on newly connected applicator12 and/or additional treatment devices 14. Recognition of connectedapplicator 12, additional treatment device 14 and/or communicationdevice 15 may be based on by specific connectors (e.g., a specific pinconnector). Also, the recognition of connection may be provided by aspecific physical characteristic like an impedance of connected part orby a specific signal provided by the applicator or its connected part tothe main unit 11. Connection between individual parts of the treatmentdevice such as the main unit 11, the applicator 12, the remote control13, the additional treatment device 14 and/or the communication device15 may be provided by wire and/or wirelessly (e.g. by RFID tag, RF,Bluetooth, and/or light electromagnetic pulses). The applicator 12 mayby connected to the main unit 11 by a wire to be powered sufficiently.Alternatively, the application may be connected through a wirelessconnection in order to communicate with the main unit 11 and/or withcommunication device 15. Connected applicator 12, additional treatmentdevice 14 and/or communication device 15 may be recognized by softwarerecognition, specific binary ID, manual recognition of the partsselected from the list implemented in the treatment device, and/or by apairing application.

The connector side in the main unit 11 may include a unit able to readand/or recognize information included in the connector side of theapplicator and/or connector side of the additional treatment device.Based on read and/or recognized information, the applicator and/or theadditional treatment device may be recognized by main unit 11. Theconnector side of the main unit 11 may serve as a first side connectorof the connection, wherein the connection of the applicator oradditional treatment device may serve as a second side connector of theconnection. Sending of the information, receiving of the informationand/or recognition of the second side connector by the first sideconnector may be based on binary information received by conductivecontact between these two connector sides, by optical reading and/or byrecognition provided by the first side connector. Optical recognitionmay be based on, for example, reading of specific QR codes, barcodes andthe like for the specific applicators 12.

The first side connector located in the main unit 11 may include a unitable to read/recognize binary information implemented in the second sideconnector of a cable from the applicator 12 and/or additional treatmentdevice 14. Implemented information in the second side connector may bestored in an SD card. Based on such implemented information any part ofthe treatment device may be recognized by the main unit 11.

Communication between individual parts of the treatment device(including e.g. the main unit 11, the remote control, one or moreapplicators, one or more additional treatment devices and/orcommunication devices) may be based on peer-to-peer (referred as P2P)and/or master-slave communication. During P2P communication, theindividual parts of the treatment device have the same priority of itscommands and/or may communicate directly between each other. P2Pcommunication may be used during initial recognition of connectedindividual parts of the treatment device. P2P communication may be usedbetween some parts of the treatment device during a treatment, such asbetween communication devices.

Master-slave communication may be used between individual parts of thetreatment device for at least a short time during, before and/or aftereach treatment of individual patient. During master-slave communication,one part of the treatment device may provide commands with the highestpriority. The individual part of the treatment device, e.g. as the mainunit 11 may provide commands with the highest priority and is referredas master unit. The treatment device may include at least onemaster-slave communication between an individual electrical element,such as a power source and or one or more control units, where the oneor more control units act as master.

The master unit may be selected by a user before, after and/or duringthe treatment. The user may select master unit from available individualparts or electrical elements of the treatment device. Therefore, theuser may select the main unit 11, the applicator 12, the remote control13, the additional treatment device 14 or the communication device 15 asthe master unit. The master unit may be a control unit in selectedpresent in individual part of the treatment device e.g. a control unitin the main unit 11. The user may select the master unit in order tofacilitate adjusting of treatment parameters. The user may also selectthe communication device 15 as a master unit, wherein the communicationdevice selected as master device may provide control of more than onetreatment device. The main unit 11 may include a control unit as amaster unit that monitor and evaluate at least one parameter of thetreatment, such as patient's temperature, voltage on individual elementsof the treatment device and/or other, that enable to provide safetreatment even if the connection between. Also, the master unit may beindependent electrical element outside of human machine interface. Themaster unit may be controlled by user through human machine interface.

Alternatively, the master unit may be selected automatically based on apredetermined priority value of the connected parts of the treatmentdevice. Selected master unit may remain unchanged and already selectedpart of the treatment device may act as the master unit during the wholetreatment. However, the selection of master unit may be changed duringthe treatment based on command priority and/or choice of the user. Themaster unit may be also determined according to manufacturingconfiguration or being dependent on factory reset. For example, theremote control 13 may provide command with the highest priority to stopthe treatment when patient feels discomfort and the treatment will bestopped without relevance of which individual part of the treatmentdevice was set as the master unit and set parameters of the treatment.

FIGS. 2-5 illustrate several possible master-slave communication schemesthat may be used in communication between the main unit 11 and one ormore applicators 12, remote controls 13, additional treatment devices14, and/or communication devices 15. According to FIG. 2, one or moretherapy generators 201 generate a modified electrical signal in order toprovide a signal to a treatment energy source, such as the RF electrodeand/or the magnetic field generating device. The therapy generators 201may include a group of electrical elements or at least two members ofthe group of electrical elements present in the circuitry of thetreatment device and/or main unit. The group of electrical elements mayinclude a control unit, power source, system of coaxial cables, one ormore switches, one or more energy storage devices, one or more pindiodes, one or more LC circuits, one or more LRC circuits, one or morepower amplifiers and/or other part of the treatment device activelymodifying electrical signal in controlled manner. The therapy generatormay provide modifying of electrical signal in controlled manner.

Modifying electrical signal in controlled manner may include e.g.providing and/or controlling impedance adjustment of provided RFtreatment based on impedance matching measured across patient's tissueand/or RF electrodes. Actively modified electrical signal may beinterpreted such that electrical signal may have different parameters,such as frequency, symmetrisation, amplitude, voltage, phase, intensity,etc. The parameters of electrical signal may be based on requirements oftreatment including the type of the patient, treatment parameters. Inaddition, the parameters of electrical signal may be modified onfeedback information, such as measured standing wave ratio of RF energy,temperature of tissue, temperature of RF electrode, temperature of theinside of the applicator, temperature of the surface of the applicator,electric current and voltage of individual elements of the treatmentdevice and/or other.

The diagram of FIG. 2 shows a security 203 that prevent any unauthorizedintrusion to the treatment device communication and protects personaluser data and/or account. The security 203 may protect the treatmentdevice from computer viruses, unauthorized access and/or protect thecommunication between individual parts of the treatment device fromreading or change by unauthorized medium or person. The security 203 mayprovide coding of the information used in communication and/or antivirusservices preventing intrusion of unwanted binary code into the treatmentdevice and/or communication. The security 203 may correct mistakescreated during the communication. The security 203 may block connectionof unauthorized/unwanted external device to the treatment device.

The security 203 in FIG. 2 may be located in the communication diagrambetween the master unit 202 and a communication interface 204. Thesecurity 203 may also be part of an element user 208, a service 207,and/or a sale 206. The security 203 may be located also between thecommunication interface 204 and a communication medium 205, the therapygenerator 201, and/or may be part of them.

The communication interface 204 may include hardware and/or softwarecomponents that enables to translate electric, electromagnetic, infraredand/or other signal into readable form to enable communication betweenat least two parts of the treatment device and/or other communicatingsides or medium. The communication interface 204 may providecommunication and/or coding of the information and/or data. Thecommunication interface 204 may be, for example, a modem or GSM moduleproviding communication between the treatment device and online networkor server. The communication interface 204 may be part of the masterunit 202, the therapy generator 201, and/or other part of the treatmentdevice.

The communication medium 205 may be medium transferring communicationdata. The communication medium 205 may be used in communication betweenthe treatment device and the user 208, the service 207 and/or the sale206. The communication medium 205 may be a wire, SD card, flash memory,coaxial wire, any conductive connection, server, some kind of network onprinciple, such as RF waves, acoustic waves, optic waves, GSM, 3G, 4G,5G, HUB switch, Bluetooth, Wi-Fi and/or other medium which may includeone or more servers.

Communication data/information may be redirected to the individual partsof the treatment device and/or to individual users or services, such asthe user 208, the service 207 and/or the sale 206. Communicationdata/information may be redirected by the master unit 202, thecommunication medium 205 and/or the therapy generator 201. For example,server may filter data for the user 208 and filter other communicationinformation that will be redirecting to the service 207, control unitand/or other part of the treatment device.

The element called “user 208” of FIG. 2 may be a representation of theHMI controlled by a user. Alternatively, the element called “user 208”of FIG. 2 may a representation of the other communication device(personal computer, laptop, mobile, tablet, etc.) controlled by user,wherein the communication device may send information to at least onepart of the treatment device and/or receive information from at leastone part of the treatment device. Information provided by thiscommunication channel may be a type of a treatment protocol, informationabout treatment effect, actual value and/or predetermined value of oneor more treatment parameters, feedback information, selection of treatedbody area, recommendations of behaviour before and after the treatmentand/or other information. At least part of the information may be sentto the user controlling the treatment device and also to the patient,such as by an software application for mobile phone, tablet or laptop.

The service 207 in FIG. 2 may represent a service department that hasauthorized access to information about the treatment device. The service207 may be the service department of the company providing ormanufacturing the treatment device wherein the communication between theservice department of the company and the user may be provided throughthe HMI, a communication device and/or automatically throughpre-programmed software interface. Information provided by thiscommunication channel may include wear of individual electrical elementof the treatment device, durability of any RF electrode and/or magneticfield generating device, malfunction of an individual electricalelement, possible software optimization and/or actualization of thedevice, providing applications for connection of another additionaltreatment device and/or other. Optimization and/or actualization of thetreatment device may include e.g. a remote access to the treatmentdevice software and/or fixing errors.

The sale 206 in FIG. 2 may be a sales department with authorized accessto information about the treatment device. The sale 206 may inform theuser about a type of accessories which may be added to the treatmentdevice. Further the sale 206 may mediate sales of the plug-in modulesand/or mediate sales of accessories of the treatment device.Furthermore, the sale 206 may provide an offer linked with billing andrenting system. Information exchanged by communication to or from sale206 may be, for example, the number of treatments, time of treatments,and/or type of applied treatment, information about applicators and/orothers.

The treatment device may include a black box for storing a dataregarding the treatment history, operational history, communicationbetween individual parts of the treatment device, data from or for abilling and renting system, operational errors, and/or otherinformation. The data may be accessible to the sale 206, to the service207 and/or to the user 208 via the communication medium (e.g., a storagecloud and/or server). The treatment device may include a billing andrenting system to manage charges for using of the treatment deviceand/or respective additional treatment devices. The billing and rentingsystem may send such information to a provider in order to prepare thebilling invoice. Data from the black box may be downloaded by verifiedauthorized personnel, such as a service technician, accountant and/orother person with administrator access. Verification of the authorizedperson may be provided by specific key, password, software code ofseveral bits and/or by specific interconnecting cable.

The billing and renting system may be based on credits subtracted from auser account. Credits may be predefined by the provider of the treatmentdevice, e.g. a producer of the treatment device. Credits may berecharged during the time when the treatment device is in operationand/or may be recharged to online account linked with one or moretreatment devices of the user and/or provider. Credits may be subtractedaccording to the selected treatment protocol or body area. Credit valuefor individual one or more treatments and/or part of the treatment maybe displayed to the user before treatment starts, during the treatmentand/or after the treatment. If the credit in the user's account runsout, the treatment device may not enable any further treatment untilcredits are recharged. Credits may be used as a currency changed forindividual treatment wherein different treatment may cost a differentamount of credits based on the type of the treatment, the duration ofthe treatment, the number of used applicators, and/or other factors.Credits may be also used for renting or buying individual part of thetreatment device, whole treatment device, hardware or softwareextensions of the treatment device and/or other consumables and spareparts belonging to the treatment device. Interface where the creditsystem may be recharged may be part of the treatment device, HMI and/oronline accessible through website interface.

One or more software extension (e.g. software applications) may belinked with the treatment device and method of treatment. One or moresoftware extensions may be downloaded to any communication device, suchas a smartphone, tablet, computer and/or other electronic device. Thesoftware extension may communicate with the main unit and/or other partof the treatment device. The communication device with installedsoftware extension may be used for displaying or adjusting of one ormore treatment parameters or information associated to the treatment.Such displayable treatment parameters and information associated to thetreatment may include e.g. time progress of the treatment, measured sizeof treated body area before and/or after individual treatments,schematic illustrations of applied bursts or trains, remaining time ofthe treatment, heart rate of the patient, temperature of patient's bodye.g. temperature of the body surface, provided types of treatment, typeof the treatment protocol, comparison of patient's body parametersagainst previous treatment (e.g., body fat percentage) and/or actualtreatment effect of the treatment (e.g. muscle contraction or musclerelaxation). The software extension may be also provided to the patientin order to inform them about the schedule of treatments, mappingprogress between individual treatments, percentile of treatment resultscompared to other people and/or recommendations of behaviour beforeand/or after the treatment. Recommendations of behaviour may includee.g. recommendation what volume of water should patient drink during theday, how should patient's diet look like, what type and volume ofexercise should patient provide before and/or after treatment and/orother information that may improve results of treatment.

Communication between individual elements of the communication diagram,such as the therapy generator 201, the master unit 202, the security203, the communication interface 204, the communication medium 205, theuser 208, the service 207 and/or the sale 206 may be bidirectional ormultidirectional.

Connection between the user 208, the service 207, the sale 206,communication medium 205 and/or connection between the therapy generator201 and the master unit 202 may be secured by the security 203 toprovide safe communication and eliminate errors. The security 203 may belocated between the master unit 202 and the communication interface 204and/or between the communication medium 205 and the communicationinterface 204.

As shown on FIG. 3, another option of remote access communicationbetween the user 208, the service 207, and/or the sale 206 and thetreatment device may be provided by a server 301. The server 301 mayinclude the security 203. The security 203 may be implemented inindividual access of the user 208, the service 207, and/or the sale 206.

As shown in FIG. 4, the communication medium 205 may communicate withone or more therapy generators 201. One or more therapy generator 201may communicate with the master unit 202. The information from thecommunication medium 205 may be verified by the security 203 before thetherapy generator 201 sends information to the master unit 202.

FIG. 5 shows a schematic diagram of communication between thecommunication medium 205 and one or more therapy generators 201A-201D.The therapy generator A 201A may communicate with at least one or moretherapy generator 201B-201D. Another therapy generator B 201B may alsocommunicate with one or more therapy generators 201A, 201C, 201D.Therapy generator C 201C may not directly communicate with the therapygenerator A 201A and may communicate through therapy generator B 201B.The security 203 may be in the communication pathway between eachtherapy generator 201A-201D and/or between the therapy generator 201Aand the communication medium 205.

FIG. 6 show the main unit 11 of the treatment device. The main unit 11may include a HMI 61, a ventilator grid 62, at least one applicatorholders 63 a and 63 b, at least one device control 64, applicatorconnectors 65 a and 65 b, at least one main power supply input 66, acurved cover 67 of the main unit 11, wheels 68, a main unit coveropening 69, a main unit handle 70, and/or a logo area 71. The main powersupply input 66 may provide coupling or connection to the power grid orpower network.

The ventilator grid 62 of the treatment device may be designed as onepiece and/or may be divided into multiple ventilator grids 62 to provideheat dissipation. The ventilator grid 62 may be facing toward a personoperating the main unit 11, facing the floor and not being visibleand/or ventilator grid 62 may be on the sides of the main unit 11. Thefloor-facing location of the ventilator grid may be used to minimizedisturbing noise for the patient, because processes like cooling of themain unit 11 and/or electrical elements powered by electric energy mayproduce noise. Surface area of all ventilator grids 62 on the surface ofthe main unit 11 may be in a range from 100 cm² to 15000 cm², or from200 cm² to 1000 cm², or from 300 cm² to 800 cm².

Manipulation with the main unit 11 may be provided by rotating wheels 68on the bottom of the main unit 11 and/or by the main unit handle 70. Thelogo area 71 of the company providing the treatment device may belocated below the main unit handle 70 and/or anywhere on the curvedcover 67 and HMI 61.

As shown in FIG. 6, the front side of the main unit 11 facing thepatient may be designed as a curved cover 67 of the main unit. The frontside of the main unit 11 facing the patient may have no right anglesaccording to floor projection of the main unit 11. The front side of themain unit 11 facing the patient may be designed as one, two or morepieces covering the inside of the main unit 11. The main unit 11 withcurved facing side may improve manipulation of the main unit 11 itselfnearby patient's support wherein the risk of collision main unit 11 andvarious sensitive body parts of the patient (e.g. fingers) is minimized.Facing side of the main unit 11 may also include the main unit coveropening 69. The main unit cover opening 69 may include a thermal camerafor monitoring the temperature of the patient or treated body area, acamera for monitoring the location of one or more applicators, movementof the patient and/or other. The main unit cover opening 69 may berepresented by opening in the curved cover 67 of the main unit. The mainunit cover opening 69 may include one or more connectors for connectingadditional treatment devices. Further, the main unit cover opening 69may include one or more sensors, such as camera, infrared sensor to scanpatient's movement, heating of treated body area and/or biologicalstructure. Based on information from such sensors, actual value and/orpredetermined value of one or more treatment parameters may be optimizedwhen patient moves, skin surface reach temperature threshold limit,determine treated body area and/or other. The front side of the mainunit 11 may also include one or more applicator connectors 65 a and/or65 b.

Applicator connectors 65 a and 65 b facing the patient may be closer topatient's body than applicators connected to side facing the operator(e.g. doctor or technician). Accordingly the length of the connectingtube 814 connecting the applicator with the main unit 11 may beminimized. Manipulation with the applicator and/or plurality of theapplicators connected by shorter connecting tubes 814 may be easier thanwith the applicator connected with the longer connecting tube 814. Thefront side of the main unit 11 may have no corners and/or angles and mayinclude at least partially elliptical and/or circular curvature. Thecurvature may have a radius of curvature in a range of 20 cm to 150 cm,30 cm to 100 cm, 30 cm to 70 cm, or 40 to 60 cm, An angle of the mainunit 11 front side curvature may be in a range of 30° to 200°, or of 50°to 180°, or of 90° to 180°. The angle of the curvature may be definedwith the same principle as it is defined an angle 30 of a section 26 inFIG. 23 as discussed in further detail below.

The main unit 11 may include one or more an applicator holder e.g. 63 aand 63 b. Alternatively, one or more applicator holders may be coupledto the main unit 11. Each applicator holder 63 a and 63 b may havespecific design for different types of the applicator. The applicatorholder 63 a and 63 b may each hold a single applicator 12 a or 12 b.Each applicator holder 63 a, 63 b may have several functions. Forexample, the applicator holders 63 a and 63 b may be used forpre-heating or pre-cooling of at least part of the applicator. Further,the applicator holders 63 a and 63 b may include another HMI and be usedfor displaying information about selected treatment, actual value and/orpredetermined value of one or more treatment parameters. Also, theapplicator holder 63 a and/or 63 b may provide indication whether anapplicator is ready to use. Furthermore, the applicator holder 63 aand/or 63 b may indicate a current value temperature of at least part ofthe applicator. The indication may be provided by color flashing orvibration. The applicator holder 63 a and/or 63 b may be used to setactual value and/or predetermined value of one or more treatmentparameters and/or applicator parameters, such as a temperature ofapplicator's part contacting the patient.

The main unit 11 may include device control 64 for switching on and offthe main unit 11, manual setting of power input parameters and/or otherfunctions. The applicator connectors 65 a and 65 b may be used fortransfer of electrical and/or electromagnetic signal from the main unit11 and applicators. The applicator connectors 65 a and 65 b may be usedfor connecting of one or more applicators (via the connecting tube 814),the communication device, the additional treatment device and/or memorystorage devices such as USB, SSD disc, diagnostic devices, and/or othermemory storage devices known in the state of art. The applicatorconnectors 65 (e.g. 65 a and/or 65 b) for connecting of one, two or moreapplicators may be located in the main unit 11 or on the side of themain unit 11. The length of coaxial cables may be linked with afrequency of transmitted electrical signal. In order to provide easiermanipulation with one or more applicators 12 a and/or 12 b, the lengthof connection from the main unit 11 to e.g. applicator 12 a (andtherefore connecting tube 814) should be as long as possible. However,length of at least one coaxial cable between electrical elements in themain unit 11 may be linked with a frequency of transmitted electricalsignal (e.g. RF signal) sent to at least treatment energy source (e.g.RF electrode to provide RF energy). Therefore the length of at least onecoaxial cable inside the main unit (e.g. between a power source and theapplicator connector 65 a and/or 65 b) may be as short as possible. Thelength of coaxial cable located in the main unit 11 may be in a range of3 cm to 40 cm, or 7 cm to 30 cm, or 10 cm to 20 cm. In order to optimizemanipulation with one or more applicators 12 a or 12 b connected to themain unit 11, the applicator connectors 65 a and 65 b may be located onthe curved front side of the main unit 11.

The HMI 61 may include a touch screen display showing actual valueand/or predetermined value of one or more treatment parameters. Thetouch screen may provide option to choose the displayed treatmentparameters and/or adjust them. The HMI 61 may be divided into twodisplay sections 61 a and selection section 61 b. The display section 61a may display actual value and/or predetermined value of one or moretreatment parameters and other information for the user. The selectionsection 61 b of the HMI 61 may be used for selection of treatmentparameters and/or other adjustment of the treatment. HMI may be includedin, coupled to or be part of one or more applicators 12, main unit 11,an additional treatment device 14 and/or in other one or morecommunication devices 15.

The HMI may be included in the main unit 11. The HMI may be fixed in ahorizontal orientation on the main unit 11 or the HMI 61 may be orientedor tilted between 0° to 90° degrees with respect to a floor or otherhorizontal support surface. The angle between the HMI 61 plane and afloor may be adjusted by at least one joint or may be rotated around atleast one Cartesian coordinates. The HMI 61 may be in form of detachableHMI, e.g. a tablet. The HMI 61 may be telescopically and/or rotationallyadjusted according to one two or three Cartesian coordinates by a holderthat may adjust distance of HMI 61 from the main unit 11 and/ororientation of the HMI 61 with regard to the main unit 11 and the user.The holder may include at least one, two or three implemented jointmembers.

One HMI 61 may be used for more than one type of the treatment deviceprovided by the provider. The HMI software interface may be part of themain unit software or part of the software included in one or moreadditional treatment devices and/or communication devices. The softwareinterface may be downloaded and/or actualized by connection with thecommunication device, the additional treatment device, flash memorydevice, the remote connection with sales, the service and/or theinternet.

FIG. 26 shows exemplary layout of the interior of the main unit 11. Theinterior of the main unit 11 may include multiple electrical elements,control system, one or more control units of RF circuits, magnetcircuits and/or other elements needed for correct function of thetreatment device. Location of individual elements in the main unit 11may be described by Cartesian coordinates with the zero values at thebottom edge of the front side facing the patient. The main unit 11 mayinclude one or more struts 74. At least two struts 74 may create anX-shape that may be fixed at its ends to other vertical struts 74 tocreate construction for the main unit 11. The main unit 11 may includeat least one cooling system 78 configured to cool electrical elementsuch as one or more control units, PCBs, power sources, switches, energystorage devices and/or other electrical element of the treatment device.The cooling system 78 may be used for providing and/or cooling thecooling fluid provided to the applicator. The SYM element 79 may belocated in the upper third of Z coordinate and at the first third of theX coordinate nonmatter of Y coordinate. Function of the SYM is explainedbelow. The main unit 11 may also include one or more cases 72 formedfrom aluminium or other metal materials. The one or more cases 72 mayprovide electrical, electromagnetic and/or radiation insulation (lateronly as insulation) of one or more internal parts of the main unit 11from other part of the main unit 11. For example, at least part of a RFcircuit 73 may be located in the last third of X and Z coordinates inone of the cases. The power source 75, powering at least part of RFcircuit and/or magnet circuit, may be located in the last third of Xcoordinate and in the first third of Z coordinate. An energy storagedevice 76 may be at least partially insulated from one or more RFcircuit. When plurality of magnetic circuits is used, the plurality ofmagnet circuits may be at least partially insulated from each. In orderto ensure short length of coaxial cable leading from the energy storagedevice 76 to applicator connector 65 as mentioned earlier, both elements(energy storage device 76 and applicator connector 65, e.g. 65 a) may belocated in the same half of the X and Z coordinate, such as at the firsthalf of X and Z coordinate. Other electrical elements represented by box77 of magnet circuit may be located in the first half of X coordinateand second third of Z coordinate.

FIG. 7 shows exemplary display interface 700 of the HMI 61. The HMI 61may display one or more applicator symbols 701. One or more applicatorsymbols 701 and their colors may represent connection quality, numberand/or type of available or connected applicators, additional treatmentdevices connected to the main unit 11 and/or involved in the treatment.The list 702 may redirect to a page or different display layout where alist of treatment protocols may be recorded or adjusted. The list 702 oftreatment protocols may include one or more predetermined values of atone or more treatment parameter (e.g., intensity of magnetic field,intensity of RF field, intensity of magnetic impulses, intensity ofmagnetic pulses, pulse duration, burst duration, composition ofindividual burst, duty cycles, shape of envelope, time of treatment,composition of treatment parts, threshold temperature of the biologicalstructure during the treatment, and/or other parameters). The list oftreatment parameters may include one or more saved treatment protocolsoptimized for individual patients or body area. After choosing thetreatment protocol, treatment parameters may be additionally optimizedby user. Also, the treatment parameters may be adjusted by choosingadditional patient's parameters, such as patient body type (e.g. skinny,slim, average weight, overweight, or obese), or a patient's BMI, gender,age group (e.g., younger than 30, 30-39, 40-49, 50-59, 60 and older).Also, the treatment parameters may be additionally optimized byselecting only of a part of treatment protocol.

The HMI 61 may include one or more sliders which may have severalfunctions. For example, the slider 703 may be used as a navigator forselecting which page of the interface is being used, such as the list702, a therapy icon 704, or a records 707. Also, the slider 703 may beused to indicate how much time is remaining to the end of the treatment.

The therapy icon 704 may represent the interface illustrated in FIG. 7.A timer 705 may represent treatment duration, remaining time of thetreatment, and/or lapsed time of the treatment. The “Protocol 1” icon706 may illustrate the type of number of a protocol selected and/orcurrently applied or prepared to be applied. The “records” 707 mayredirect to another page of the interface with recorded history oftreatments, information regarding treated patients, informationregarding billing and renting system, information regarding billinginformation and/or credit cost of the treatment. The “records” 707 maydisplay how many credits are left on the credit account, how manycredits were spent, how long the treatment device was used, and/or otherbilling information. An icon illustrated by a symbol “setting” 708 mayredirect user to a setting of the treatment device including the settingof e.g. a melody and/or intensity of the sound produced by the deviceand/or brightness of the display. The sound produced by the treatmentdevice and/or brightness of the display may be different before and/orduring the treatment. The “settings 708” interface may also enable tochange date, time, language, type and/or parameters of connectionbetween the main unit and the applicator, the additional treatmentdevice, and/or the communication device. The “setting” 708 interface mayinclude icons for starting a calibration and functionality scan of thetreatment device and its connected parts. The “setting” 708 interfacemay provide software information, software history and/or softwareactualization, a button for contacting service and/or sending errorprotocol, type of operation mode (e.g. “basic” or “expert” with allowedadditional setting of the treatment device), possibility to rechargecredits for treatments, restoring to factory setting, and/or othersettings.

Intensity signs 709 may be as illustrated in the form of percentile,number, power and/or in another format. The intensity signs 709 may belocated adjacent to an icon that may adjust intensity of the treatmentenergy source. The intensity signs 709 may be located under, over and/orin an icon (e.g. as a number in an intensity bar 710) and/or as anothervisualization that may adjust the intensity of the treatment energysource. Each intensity bar 710 representing one treatment energy sourceof provided energy (e.g. RF field or magnetic field) may have its ownintensity signs 709. The treatment device may include multipleapplicators 714, for example, a first applicator A and a secondapplicator B may be connected to the main unit of the treatment device.In this way, applicators A and B may be applied to different muscles inthe same muscle group or to pair muscles, such as a left and rightbuttock, left and right sides of an abdomen, a left and right thigh,among other paired muscles or cooperating muscles. Number of connectedapplicators and/or additional treatment devices providing the treatmentenergy may be lower or higher than two.

As shown in FIG. 7, each applicator may provide magnetic treatment 718(left HMI part marked as HIFEM A and HIFEM B for the purpose of FIG. 7and showed in exemplary interface human machine interface) and/or an RFtreatment 712 (right HMI part marked as RF A and RF B for the purpose ofFIG. 7 and showed in exemplary HMI).

The intensity of each RF field and/or magnetic field may beindependently regulated e.g. by scrolling of individual magneticintensity scroller 719 and/or RF intensity scroller 711 throughintensity bars 710. One or more scrollers or intensity bars may be movedindependently or may be moved together with another scroller orintensity bar in order to regulate plurality of magnetic fields,plurality of RF fields together and/or plurality of RF and magneticfields provided by the one applicator together. Also, one or morescrollers or intensity bars may be controlled independently or may bemoved together with another scroller or intensity bar in order toregulated plurality of magnetic fields, plurality of RF fields togetherand/or plurality of RF and magnetic fields provided by two applicatorstogether. One or more intensity bars 710 may be distinguished by a colorand may be adjusted by intensity scroller 719 or 711 and/or by anintensity buttons 720. The intensity buttons 720 may change (e.g.increase or decrease) RF field and/or magnetic field intensity by afixed increment, such as 1% or 2% or 5% or 10% or in a range from 1% to10% or in a range from 1% to 5% of maximal possible field intensity.Intensity of the magnetic field and/or the RF field may be adjustedindependently for each treatment energy source. Also, intensity of themagnetic field and/or RF field may be adjusted by selection and/orconnection of one or more applicators, additional treatment devicesand/or treatment energy sources.

The operation of one or more RF electrodes and/or magnetic fieldgenerating devices may be synchronized and may be controlled by one, twoor more intensity scrollers 719 and/or intensity buttons 720. Thetreatment may be started by a button start 713 that may be automatically(e.g. after starting the treatment) changed into a button pause. Thetreatment may be restarted and/or stopped by button stop 716 during thetreatment. The interface may also show an indicator of a discomfortbutton 717 that may be activated by patient through a remote controlwhen the treatment is uncomfortable. When the discomfort button 717 isactivated treatment may be automatically and immediately interrupted(e.g. paused or stopped). When the discomfort button 717 is activatedthe treatment device may provide an human perceptible signal includingan audible alert, including a sound signal. Further, the humanperceptible signal may include a visual alert, including e.g. a flashingcolor. Based on the discomfort of the patient, the user may adjust e.g.the treatment parameters or treatment protocol, attachment or couplingof the applicator. The interface may also include a software powerswitch 715 to switch the treatment device on or off.

As shown in FIG. 7, the HMI may include two intensity bars (e.g. 710)for RF treatment and two intensity bars for magnetic treatment. Further,the HMI may include two intensity scrollers (e.g. 711) for RF treatmentand two intensity bars (e.g. 719) for magnetic treatment. Furthermore,the HMI may include four intensity buttons for RF treatment and fourintensity buttons (e.g. 720 for magnetic treatment. One intensityscroller, one intensity bar and/or two intensity buttons may be providedfor one treatment circuit. Therefore, the FIG. 7 may show the HMI oftreatment device including two treatment circuits for RF treatment andtwo treatment circuits for magnetic treatment.

The treatment device may include one or more applicators. The treatmentdevice may include two, three, four, five or more applicators. Eachapplicator may include at least one, two or more different treatmentenergy sources, such as one or more RF electrodes providing the RFtreatment and one or more magnetic field generating devices providingthe magnetic treatment. For example, first applicator may include one RFelectrode and one magnetic field generating device, while the secondapplicator may include another RF electrode and another magnetic fieldgenerating device. One applicator may be coupled to the main unit by oneconnecting tube. The connecting tubes of different applicator may beinterconnected or separated for each applicator. Alternatively aplurality of applicators may be coupled to the main unit by one commonconnecting tube. At least one treatment parameter of at least oneapplicator may be changed independently from the other one or moreapplicators and/or additional treatment device.

One or more applicators, additional treatment devices and/orcommunication devices may be mechanically connected with the main unitby one or more wires and/or by the fluid conduits. One or more wiresand/or fluid conduits may be located and lead through the connectingtube. The one or more wires coupled between main unit and the applicatormay be used for transfer of electric signal (representing e.g. RFsignal) to RF electrode positioned in an applicator in order to generateRF energy. The one or more wires may be used for providing electriccurrent to magnetic field generating device positioned in the applicatorin order to generate impulses of the magnetic field. Same wire and/ordifferent wires coupling the applicator and the main unit 11 may be usedfor communication between the main unit 11 and the applicator 12 and/orfor collecting feedback information. Feedback application may includee.g. measured signal parameters and/or impedimetric characteristics ofthe wire before and/or during the treatment. The fluid conduit betweenthe main unit 11 and the applicator 12 may guide liquid, oil, water,vapors, gas and/or other temperature regulating cooling fluid.

One or more applicators may be coupled to patient's body and/or bodyarea by one or more straps, one or more belts, or by creating vacuumunder the applicator. Also, applicator may be coupled to the body areaby a supporting matrix or by an adhesive layer located on at least partof the applicator's surface and contacting the patient's body orclothing. The applicator may be coupled to the body area by pushing theapplicator to patient's body area or clothing by an adjustablemechanical positioning arm wherein the applicator may be detachablycoupled to positioning arm including at least one, two or more joints.The belt may be at least partially elastic and may create a closed loop,such as by hook and loop fasteners (by Velcro), buckles, studs, and/orother fastening mechanisms may be used for adjusting a length. The beltmay be coupled to body area and may include a fastening mechanism forcoupling the applicator to the belt and/or patient's skin or clothing.Such fastening mechanism may be for example, a belt with pockets for theapplicator. Coupling the applicator to the body area may includeattaching or positioning of the applicator to the proximity or to thecontact with the body area. One or more applicators may be coupled tothe body area before or during the application of one or more types oftreatment, (e.g. RF treatment or magnetic treatment). Also, theapplicator may be coupled to the body area, skin or clothing by a coverfrom soft material, which may be folded around the applicator and/or thepart of the body area. Furthermore, the applicator may be covered insoft material cover providing other coupling points for attachment ofbelt, folding soft material or any other coupling option mentionedherein.

The belt may be a length adjustable belt which may be at least partiallyflexible. One or more belts may couple or fix and/or attach one, two ormore applicators to the patient's body or body area. The belt may becoupled to one applicator 800 or one belt may couple two or moreapplicators to the patient's body. When the plurality of applicators(e.g. two, three or more) are used, one applicator may be coupled to thebody area of the patient by one belt while another applicator may becoupled to the body area by different belt. Alternatively, a pluralityof applicators (e.g. two, three or more) may be coupled to the body areaof the patient by one same belt. At least one applicator coupled by thebelt may be fixed statically with regard to patient's body for at leastpart of the treatment. The at least one applicator that is coupled bythe belt to patient's body may be repositioned once or more times duringthe treatment either manually by the operator or automatically to ensureoptimal treatment effect and treatment comfort for the patient.

Coupling the applicator and/or additional treatment device to apatient's body may include placing the applicator in proximity of thepatient's body and/or body area. In case of proximate coupling, theshortest distance between the applicator and the patient's skin may bein a range of 0.01 cm to 10 cm, or 0.01 cm to 5 cm, or 0.01 to 2 cm, or0.01 to 1 cm, or 0.01 to 5 mm, or 0.01 to 2 mm. However, the applicatormay be also placed in direct contact with the patient's skin. In case ofdirect contact, there may be no meaningful distance between theapplication and the patient's skin. In case of proximate or directcontact, the intervening material may be positioned between theapplicator and patient's skin or clothing or body area. The interveningmaterial may be an air gap, bolus, supporting matrix, part of the belt,textile, other clothing, gel, liquid absorbing material or metal.

FIG. 22 depicts an exemplary attachment of the applicator and/oradditionally treatment device 21 to a patient's body with use of asupporting matrix 22. The supporting matrix 22, as illustrated in FIG.22, may be shaped as a grid and/or scaffold. The grid and/or scaffold isat least partially flexible and attached to patient's body. Thesupporting matrix may be used for coupling the applicator and/oradditional treatment device 21 in proximity to the patient's body indefined location referred as an applicator's spot 24 by a fasteningmember 23. The supporting matrix may be polymeric scaffold-like in FIG.22, substrate like a textile/polymeric sheet and or other. The fasteningmember may be one or more elements such a locking mechanism, hinge,bayonet like system, Velcro for fastening the applicator and/oradditional treatment device 21.

As shown in FIG. 25, the applicator 800 may include one or more partsdefining casing of the applicator, which can be connected to the mainunit by connecting tube 814. Also, the applicator may include one ormore parts hidden in the applicator further defining function andfunctionality of the applicator. Casing of the applicator may includedifferent parts e.g. a handle cover 512, a handle 514, a top cover 516,a second side portion 802 creating bottom cover of the applicator.Handle cover 512 may include a marker 813 and/or HMI 508 for e.g.displaying and/or adjusting actual value and/or predetermined value ofone or more treatment parameters. The handle 514 may be used formanipulation with the applicator 800 and/or for coupling the applicator800 to patient's body area. The top cover 516 may define interior of theapplicator. The top cover 516 may include an air opening 504 enablingair flowing to or from the interior of the applicator to cool electricalelements located in the interior of the applicator. The electricalelements located inside the interior of the applicator may include e.g.RF electrode, magnetic field generating device and/or temperature sensor510. The second side portion 802 creates a bottom cover of theapplicator. The second side portion 802 may include one or moreprotruding shapes, grooves and/or other. Power, energy, one or moreelectromagnetic signal and/or cooling fluid may be delivered toapplicator via connecting tube 814. In addition, cooling of one or moreelectrically powered element in the applicator (e.g. a magnetic fieldgenerating device 900 and/or substrate 113 a with at least one RFelectrode) may be provided by a fan 524 fixed to the top cover 516and/or to the second side portion 802. The RF electrode substrate 113 amay include a temperature sensor 510 configured to determine atemperature in the applicator, of at least part of bottom cover 517, ofa body area and/or of a biological structure of a patient. The RFelectrode located on the substrate may be connected to pairing element136 reconnecting coaxial cables. The pairing element 136 is furtherdescribed with regard to the FIG. 24. FIG. 25 also illustrates a frame506 that may be used to fix the magnetic field generating device to thetop cover 516 and/or to the second side portion 802. The frame 506 maybe configured to eliminate noises and vibrations during magnettreatment.

The applicator may be designed as shown in exemplary FIGS. 8a-8d . Theapplicator 800 as illustrated in FIGS. 8a-8d may be used for treatmentof body area.

One or more RF electrodes may be located in the applicator 800 betweenthe magnetic field generating device and patient's body area. The RFelectrode may be shaped to at least partially match a curvature of thefirst side portion 801, a second side portion 802, and/or a curvature ofthe patient's body area. The magnetic field generating device may atleast partially match a curvature of the first side portion 801, thesecond side portion 802 and/or a curvature of the patient's body area.The RF electrode and/or the magnetic field generating device may becurved in order to focus and/or provide better targeting of the RFtreatment and/or magnetic treatment. The first side portion 801 may beconfigured to maintain the position of the limb within the first sideportion 801 during the treatment. The first side portion 801 may providea stable position and/or equilibrium for the treated body area. Theposition of the limb of the patient may be maintained in the first sideportion 801 even though the limb may move by the muscle contractions.The lateral movement and/or rotation of a limb may be limited due to thefirst side portion 801 and/or belt 817 in such way that the limb may bein stable position. The rotational movement with respect to theapplicator 800 may be limited by coupling the applicator 800 to the bodyarea, at least part the treated body limb by a belt. In addition, whenpart of the arm is treated by magnetic and/or RF treatment, at leastpart of the limb may be also attached to patient's trunk to minimizemovement of the limb.

The second side portion 802 may be located on the opposite side of theapplicator 800 with respect to the first side portion 801. The secondside portion 802 may be substantially planar, or the second side portion802 may be at least partially concave and/or convex. The applicator 800may be coupled to the patient by a positioning mechanism, such as a belt817, as it is illustrated in the FIGS. 8a and 8 b.

FIG. 8a describes an applicator including the positioning mechanismwhich may be fixed in a recess 803 at a first end 804 of the first sideportion 801 and a recess 806 at a second end 805 of the first sideportion 801. The positioning mechanism, such as a belt or strap, may befastened or its length may be adjusted by a clip 807. The clip 807 maymove around the pin 808 in a clockwise or counter-clockwise direction.The clip 807 may be biased by a spring. Alternatively, the clip 807 maybe locked by a suitable locking mechanism, or by any other movementrestraining manner. The clip 807 may include a fastener 809 on lowerside of the clip 807 for fixing a correct length of the positioningmechanism. The fastener 809 may be a hook-and-loop fastener, Velcrofastener, pin type fastener, among other mechanical fasteners. Couplingthe applicator 800 to the patient's body as described above may bemostly used when the patient's body area is attached to the first sideportion 801 of the applicator 800. The RF electrode and/or magneticfield generating device may be shaped to at least partially match acurvature of the first side portion 801. The RF electrode and/or themagnetic field generating device may be curved in order to focus and/orprovide better targeting of the RF treatment and/or magnetic treatment.

FIGS. 8b and 8c show an applicator including the positioning mechanismwhich may be guided perpendicularly to a curvature of the first sideportion 801 and/or perpendicularly to an axis 810 of the applicator. Thepositioning mechanism may be positioned or guided through a concavity815 of the handle and/or below, through or on a handle 812. Belt 817 mayalso be guided in any direction through and/or on the applicator 800 tohold the applicator 800 to the patient's skin. Coupling the applicator800 to the patient's body as described above may be mostly used when thepatient's body area is attached to the second side portion 802 of theapplicator 800. The RF electrode and/or magnetic field generating devicemay be shaped to at least partially match the first side portion 801.The RF electrode and/or the magnetic field generating device may be flator curved in order to focus and/or provide better targeting of the RFtreatment and/or magnetic treatment.

FIG. 8b illustrates a top view of an applicator 800. Applicator 800 mayinclude a marker 813 corresponding with the location of magnetic fieldgenerating device within the applicator 800. The marker 813 may belocated above the centre of the magnetic field generating device. Themarker 813 may enable easy and comfortable positioning of the applicator800 by the user. A recess in a surface of the applicator 800 may be usedas the marker 813. Alternatively, the marker 813 may be a differentsurface modification of a part of the applicator's cover, such as adifferent color, different roughness, presence of one or one lightsource (e.g. light emitting diode LED), a specific curvature of thecasing of the applicator, logo of the manufacturing or distributingcompany and/or other. The casing of the applicator may include at leasttwo colors. A first color may be on applicator's casing over themagnetic field generating device to enable correct positioning of theapplicator, and the rest of the applicator may have a second color thatdiffers from the first color. The color may be interpreted as a paintreflecting and/or absorbing specific wavelengths of light. Similar tomarker 813, applicator may include a second marker to show a location ofthe at least one RF electrode.

As shown in in FIGS. 8b and 8c , applicator may include an outlet 811.The outlet 811 may enable circulation of the air in the applicator 800and heat dissipation of heat generated by at one or more magnetic fieldgenerating devices and/or RF electrodes positioned in applicator andsupplied by energy through one or more wire inside of a connecting tube814. The connecting tube 814 may also include the fluid conduit that mayprovide or guide cooling fluid from the main unit 11 to the applicator800.

The applicator 800 may further include one or more temperature sensors816 as shown for example in FIG. 8c . The temperature sensor 816 mayprotrude from the casing of the applicator 800 e.g. such as from thesurface of the second side portion 802 and/or from the first sideportion 801. The temperature sensor 816 may protrude from the casing ofthe applicator 800 in order to create higher pressure to part of thetreated body area by the applicator 800 and to provide bettermeasurement of the temperature in the biological structure, of the bodyarea and/or on the patient's body.

The second side portion 802 and/or the first side portion 801 may beheated and/or cooled. Heating of the second side portion 802 and/or thefirst side portion 801 may be used e.g. at the beginning of thetreatment to reach treatment temperature sooner. Treatment temperaturemay include temperature of body area and/or biological structureincreased by application of RF waves which may be appropriate forapplication of magnetic field. Cooling or heating by portions of theapplicator may be used for maintaining constant temperature on thepatient's skin. Also, cooling or heating by portions of the applicatormay be used to achieve higher treatment temperatures in the patient'sbiological structure deeper than 0.5 cm under the patient's skin.Cooling a part of an applicator that is in contact with the patient(e.g., the second side portion 802 and/or the first side portion 801 ofthe applicator) may be used for minimizing a patient's sweating. Thepatient's skin may be cooled by cooling fluid (e.g. air) flowing and/orblowing from the applicator and/or other part of the treatment device.Cooling of the patient's skin may be provided by thermal diffusionbetween a cooled part of the applicator contacting patient's skin andthe patient's skin. The cooled part of the applicator may be cooled bycooling fluid flowing in the applicator and/or by Peltier element usingPeltier's effect.

Patient's sweating may be uncomfortable for the patient and mayadversely affect feedback information collection, contact with theapplicator and patient's skin, and/or lead to lower adhesion of theapplicator to the patient's skin. To prevent sweating of the patient'sskin, cooling of contact applicator's area (e.g. first side portion 801and/or second side portion 802) may be used. The second side portion 802and/or the first side portion 801 may include grooves 819 that may besupplied by cooling fluid through applicator's apertures 820 whereliquid and/or gas, (e.g. air, oil or water) may flow as illustrated inFIG. 8d . The first side portion or second side portion of theapplicator may include applicator's holes or applicator's apertures 820where air from the applicator 800 may be guided to remove heat, moistureand/or sweat from the patient's skin. The holes or apertures may bepresented in the grooves 819. The holes may be used for providing anactive substance on the patient. The contacting part of the applicatorbeing in contact with the body area may include a fluid absorbingmaterial, such as sponge, hydrophilic material, non-woven organic and/orpolymeric textile, which may at least partially remove sweat from thepatient's skin and/or improve conductivity between the patient andapplicator 800. Reduction of patient's sweating in at least part oftreated body area may be provided by reduction of sweat gland activity.Reduction of activity of sweat gland may be provided by application of apulsed magnetic field, intensive light, heat shock provided by periodichypothermia of patient's skin by applied active substance on and/or tothe patient, such as glycopyrronium tosylate, and/or by othermechanisms.

FIG. 23 illustrates an exemplary applicator including a concavity. Theapplicator may be designed with the first side portion 801 being atleast partially convex. The first side portion 801 may alternatively beV-shaped or U-shaped. The curvature radius may correspond with a size ofthe patient's limb. The second side portion 802 may alternatively oradditionally be at least partially convex.

The patient may lay in a supine position or sit on a patient supportsuch as a bed, a couch or a chair. An arm of the patient may be set onthe first side portion 801 of the applicator 800. The first side portion801 may be in direct contact with the patient and RF treatment incombination with magnetic treatment may be applied. Also, a strap orbelt may be guided through the concavity 815 to attach the applicator tothe patient's body.

The first side portion 801 may have at least partial elliptical orcircular shape according to a vertical cross section, wherein the totalcurvature 25 according to FIG. 23 may be defined as part of an ellipseor circle fitted to a curvature of at least part of the first sideportion 801. A section where curvature of the first side portion 801matches the fitted ellipse or circle may be called the section 26. Thesection 26 is defined as an angle 30 between two the line 28 and line29. The line 28 and the line 29 cross a centre of symmetry 27 and points31 and 33 located in the section 26 with the longest distance accordingto fitted part of an ellipse or circle copying curvature of theapplicator 800. The centre of symmetry 27 is a centre of fitted ellipseand/or fitted circle. The angle 30 defining section 26 of the first sideportion 801 may be at least 5° or in a range from 10° to 270°, 30° to235°, 45° to 180°, or 60° to 135°. A curvature radius of at least partof fitted circle to the first side portion 801 may be in a range of 50mm to 1250 mm, or in the range of 10 mm to 750 mm, or in the range of 50mm to 500 mm, or in the range of 60 mm to 250 mm. The second sideportion 802 may be curved on at least part of its surface wherein thesection 26 of the second side portion 802 may be at least 5° or in arange from 10° to 270°, 30° to 235°, 45° to 180°, or 60° to 135°.Further a curvature radius of at least part of fitted circle to thesecond side portion 802 may be in a range of 50 mm to 1250 mm, 10 mm to750 mm, 50 mm to 500 mm, or 60 mm to 250 mm.

One or more applicators and/or additional treatment devices may includea bolus 32, as shown for example in FIG. 23. The bolus 32 may refer to alayer of material located between the applicator or RF electrodepositioned on the surface of the applicator and the patient's body areaor skin (including epidermis of patient's skin or clothing). The bolus32 may refer to a layer of material located between the RF electrodepositioned on the surface of the applicator and the patient's body areaor skin. Also, the bolus 32 may be an independent part from theapplicator 800. The bolus 32 may be attached to the first side portion801 and/or to the second side portion 802 of the applicator 800. Thebolus 32 may be removable and detachable from the applicator 800. Thebolus 32 may be mechanically coupled to the first side portion 801and/or to the second side portion 802 of the applicator 800. The bolus32 may be made of a solid, flexible material and/or a composition ofsolid and flexible materials may be used as a bolus. The bolus 32 mayinclude a fluid material, such as water, gel, or fluid solutionincluding ceramic, metal, polymeric and/or other particles enclosed in aflexible sac made of biocompatible material. The bolus 32 may beprofiled, wherein a thickness of the bolus 32 as a layer between RFelectrode and patient's skin may have a different thickness. Thicknessof the bolus 32 may be higher in a location where an energy flux densityof the RF treatment (including RF field) would be high enough to createuncomfortable hot spots and/or non-homogeneous temperature distribution.The bolus 32 allows for more homogenous biological structure heating andminimizes edge effects. Edge effects may also be minimized by differentdielectric properties of the bolus across the bolus volume and/or bolusarea. The bolus 32 may have higher thickness under the at least part ofthe edge of the RF electrode. The thickness of the bolus under the atleast part of the edge of the RF electrode may be at least 5%, 10%, 15%,or 20% greater than a thickness of the bolus 32 under the at least partof a centre of the RF electrode wherein no apertures, cutout and/orprotrusions are taken into account. The bolus 32 may have a higherthickness under at least part of the bipolar RF electrode and/or underat least part of a distance between at least two bipolar RF electrodes.The bolus 32 may be in such locations thicker by about at least 5%, 10%,15%, or 20% than a thickness of the bolus 32 where the distance betweentwo nearest points of two different bipolar RF electrodes is at least5%, 10%, 15%, or 20% more. The bolus 32 may also improve transfer oftreatment energy (e.g. magnetic field and/or RF field) to at least onebiological structure and minimize energy reflection by providing gradualtransition of dielectric properties between two different interfaces ofthe applicator and the biological structure. The bolus 32 may profile orfocus the RF field and/or magnetic field to enhance the effect of thetreatment, and/or provide deeper tissue penetration of the treatment.

The bolus 32 may also be a fluid absorbing material, such as a foammaterial, textile material, or gel material to provide betterconductivity of the environment between the applicator and a patient'sbody. Better conductivity of the contact part of the applicator may beuseful for better adjusting of the RF signal of the applied RF treatmentto the patient's body and/or for better collecting of feedbackinformation. The bolus 32 may mediate conductive contact between the RFelectrode and the patient's skin or body area. Also, the bolus 32 mayserve as a non-conductive or dielectric material modifying energytransfer to the patient's body, providing cooling of the patient's skin,removing sweat from the patient's skin and/or providing heating, such ascapacitive heating of the patient's body. Fluid absorbing materialserving as a bolus 32 may also provide better heat conductivitytherefore temperature of the biological structure and/or the applicatormay be faster, easier and more precisely regulated. The bolus 32 mayalso include additional RF electrode to provide the RF treatment.

As mentioned previously, the treatment device may include one, two,three, four, six or more applicators and/or additional treatment devicesproviding the magnetic treatment and/or the RF treatment. Eachapplicator, additional treatment device and/or treatment energy source(e.g. magnetic field generating device and/or the RF electrode) may haveits own treatment circuit for energy transfer, wherein each treatmentcircuit may be independently regulated in each parameter of providedtreatment energy by control system. Each applicator, treatment device,or treatment energy source may be adjusted and provide treatmentindependently and/or two or more applicators, treatment energy sources,and/or additional treatment devices may be adjusted as a group, and maybe adjusted simultaneously, synchronously and/or may cooperate betweeneach other.

When the treatment device includes two or more applicators, they may becoupled to contact or to be proximate to different parts of the body. Inone example the first applicator may be coupled to contact or to beproximate to left buttock while the second applicator may be coupled tocontact or to be proximate to right buttock. In another example, thefirst applicator may be coupled to contact or to be proximate to leftside of abdominal area while the second applicator may be coupled tocontact or to be proximate to right side of abdominal area. In stillanother example the first applicator may be coupled to contact or to beproximate to left thigh while the second applicator may be coupled tocontact or to be proximate to right thigh. In still another example thefirst applicator may be coupled to contact or to be proximate to leftcalf while the second applicator may be coupled to contact or to beproximate to right calf. The plurality of applicators may be beneficialfor treatment of cooperating muscles and/or pair muscles.

One or more applicators and/or the additional treatment devices mayinclude the magnetic field generating device (e.g. a magnetic coil)generating magnetic field for a magnetic treatment. The magnetic fieldgenerating device may generate the RF field for the RF treatment. Theessence is that the produced frequencies of the electromagnetic fieldhas far different values. The magnetic field generating device mayproduce a dominant magnetic field vector for the magnetic treatmentduring lower frequencies of produced electromagnetic field. However, themagnetic field generating device may produce a dominant electromagneticfield vector for the magnetic treatment during higher frequencies ofelectromagnetic field which may be used for the RF treatment. Themagnetic field generating device in the high frequency electromagneticfield domain may provide RF field similar to the RF field provided bythe RF electrode. When one magnetic field generating device may be usedfor providing both the RF treatment and the magnetic treatment, thedifference between frequencies for the RF treatment and the magnetictreatment production may be in a range from 500 kHz to 5 GHz, or from500 kHz to 2.5 GHz or from 400 kHz to 800 kHz or from 2 GHz to 2.5 GHz.Also, when one magnetic field generating device is used for providingboth the RF treatment and the magnetic treatment, the frequencies forthe RF treatment may correspond with frequencies in the range of 100 kHzto 3 GHz, 400 kHz to 900 MHz, or 500 kHz to 3 GHz.

One or more applicators and/or additional treatment devices may includeone or more RF electrodes and one or more magnetic field generatingdevices, wherein the RF electrodes have different characteristics,structure and/or design than the magnetic field generating device. TheRF electrode may operate as a unipolar electrode, monopolar electrode,bipolar electrode, and/or as a multipolar electrode. One or more RFelectrodes may be used for capacitive and/or inductive heating ofbiological structure or body area.

The applicator may include two bipolar RF electrodes. The bipolarelectrodes may transfer the RF field between two bipolar RF electrodeslocated in at least one applicator. Bipolar electrodes may increasesafety and targeting of provided RF treatment, as compared to electrodesof monopolar type. Bipolar electrodes may provide electromagnetic fieldpassing through a patient's tissue located around and between RFelectrodes, wherein due to impedance matching, it is possible to preventcreation of standing electromagnetic waves in the patient's tissue andprevent unwanted thermal injury of non-targeted tissue. Also, thedistance between bipolar electrodes influences the depth of RF wavepenetration allowing for enhanced targeting of the RF treatment.

The applicator may include a monopolar RF electrode or more monopolarelectrodes. Monopolar electrodes may transfer radiofrequency energybetween an active electrode and a passive electrode, wherein the activeelectrode may be part of the applicator and the passive electrode havinglarger surface area may be located at least 5 cm, 10 cm, or 20 cm fromthe applicator. A grounded electrode may be used as the passiveelectrode. The grounded electrode may be on the opposite side of thepatient's body than the applicator is attached.

The magnetic treatment may be provided by the magnetic field generatingdevice may be made from a conductive material, such as a metal,including for example copper. The magnetic field generating device maybe formed as a coil of different size and shape. The magnetic fieldgenerating device may be a coil of multiple windings wherein one loop ofthe coil may include one or multiple wires. An individual loop of one ormore wires may be insulated from the other turns or loops of one or morewires. Regarding the magnetic coil, each loop of wiring may be calledturn. Further, individual wires in one turn or loop may be insulatedfrom each other. The shape of the magnetic field generating device maybe optimized with regard to the applicator size and design. The coil maybe wound in order to match at least part of the applicator's shapeaccording to the applicator's floor projection. The coil winding may beat least partially circular, oval and/or may have any other shapes thatmatch to a shape of the applicator or a portion thereof. The loops ofwinding may be stacked on top of each other, may be arranged side byside, or stacking of the winding may be combined side by side and on topof other windings. The coil may be flat.

FIG. 9 illustrates a floor projection of an exemplary circular planarmagnetic field generating device 900. The magnetic field generatingdevice 900 may be characterized by dimensions including an outerdiameter D, an inner diameter d, an inner radius r and an outer radiusR. The magnetic field generating device 900 may be further characterizedby areas A1 and A2. Area A2 may represent a winding area of the coilwhile A1 may represent a magnetic core or area without any magnetic coreor windings.

The area A1 is associated with dimensions r and d. The area A1 mayinclude no windings of the coil, and may be filled by air, oil,polymeric material. The area A1 may represent a magnetic core whereinthe magnetic core may be an air core. Alternatively, the magnetic coremay be a permeable material having high field saturation, such as asolid core from soft iron, iron alloys, laminated silicon steel, siliconalloys, vitreous metal, permendur, permalloy, powdered metals orceramics and/or other materials.

The area A2 is associated with dimensions of outer radius R and outerdiameter D.

The dimension of inner radius r may be in the range from 1% to 90% ofthe dimension of outer radius R, or in the range from 2% to 80% or from3% to 60% or from 4% to 50%, from 8% to 30%, or from 20% to 40% or from30% to 50% of the dimension of outer radius R. The dimensions of innerradius r and outer radius R may be used for achieving a convenient shapeof the generated magnetic field.

The outer diameter D of the magnetic device may be in a range of 30 mmto 250 mm, or of 40 mm to 150 mm, or of 50 mm to 135 mm or of 90 mm to125 mm, and the dimension of inner radius r may be in a range of 1% to70% or 1% to 50% or 30% to 50%, 5% to 25%, or 8% to 16% of the dimensionof outer radius R. For example, the dimension of outer radius R may be50 mm and the dimension r may be 5 mm. The area A1 may be omitted andthe magnetic field generating device may include only area A2 with thecoil winding.

As discussed, the area A2 may include a plurality of windings. Onewinding may include one or more wires. The windings may be tightlyarranged, and one winding may be touching the adjacent winding toprovide magnetic field with high magnetic flux density. The winding areaA2 may be in the range from 4 cm² to 790 cm², from 15 cm² to 600 cm²,from 45 cm² to 450 cm² or from 80 cm² to 300 cm² or from 80 cm² to 150cm² or from 80 cm² to 130 cm².

Alternatively, the windings may include a gap between each winding. Thegap may be between 0.01% to 50%, or 0.1% to 25%, or 0.1% to 10%, or 0.1%to 5%, or 0.001% to 1% of the dimension R-r. Such construction mayfacilitate cooling and insulation of individual winding of the magneticfield generating device. Further, the shape of the generated magneticfield may be modified by such construction of the magnetic fieldgenerating device.

The wire of the coil winding may have a different cross-section area.The cross-sectional area of the winding wire may be larger at the centreof the winding where the coil winding radius is smaller. Suchcross-section area of the wire may be from 2% to 50%, from 5% to 30%, orfrom 10% to 20% larger than the cross-sectional area of the same wiremeasured on the outer winding turn of the magnetic field generatingdevice, wherein the coil winding radius is larger. The cross-sectionalarea of the winding wire of the magnetic field generating device may belarger on the outer coil winding turn of the magnetic field generatingdevice where the coil winding radius is larger. Such cross-sectionalarea of the wire may be from 2% to 50%, from 5% to 30%, or from 10% to20% larger than the cross-section area of the same wire measured on theinner turn of the magnetic field generating device wherein the coilwinding radius is smaller.

The principles and parameters described above may be used in order tomodify the shape of the provided magnetic field to the patient's body,provide a more homogenous and/or targeted muscle stimulation (e.g.muscle contraction), reduce expansion of the magnetic field generatingdevice during the treatment and/or increase durability of the magneticfield generating device. The magnetic field generating device may expandand shrink during generation of time-varying magnetic field and thiscould cause damage of the magnetic field generating device. Differentcross-sectional areas of used conductive material (e.g. wire, metallicstripe or creating winding of the magnetic field generating device) mayminimize the destructive effect of expanding and shrinking the magneticfield generating device.

As discussed above, the cross-sectional area of the used conductivematerial, (e.g. wire, metallic stripe and/or creating winding of themagnetic field generating device) may vary between individual loops ofwiring in a range of 2% to 50%, or of 5% to 30%, or of 10% to 20% inorder to improve focusation of the provided magnetic treatment, toincrease durability of the magnetic field generating device, to minimizeheating of the magnetic field generating device, and/or for otherreasons.

Further, stacking of the wiring and/or isolating and/or dilatation layerbetween individual conductive windings of the magnetic field generatingdevice may not be constant and may be different based on the wirecross-sectional area, radius of the winding, required shape of providedmagnetic field and/or other parameters.

A thickness 901 of the magnetic field generating device 900 shown onFIG. 9b may be in a range of 0.3 cm to 6 cm, or of 0.5 cm to 5 cm, or of1 cm to 3 cm from the applicator's side view.

A total surface of the magnetic field generating device surfaceaccording to the applicator's floor projection, i.e. area A1+A2, may bein a range from 5 cm² to 800 cm², 10 cm² to 400 cm², 20 cm² to 300 cm²or 50 cm² to 150 cm².

The ratio of the area A1 and winding area A2 may be in a range of 0.01to 0.8, or 0.02 to 0.5 or 0.1 to 0.3 according to the applicator's floorprojection. The ratio between the winding area A2 of the magnetic fieldgenerating device and the area of RF electrodes located in sameapplicator according to the applicator's floor projection may be in arange of 0.01 to 4, or 0.5 to 3, or 0.5 to 2, 0.3 to 1, or 0.2 to 0.5,or 0.6 to 1.7, or 0.8 to 1.5, or 0.9 to 1.2.

FIGS. 10a-10g show the location of one or more RF electrodes 101 withregard to at least one magnetic field generating device 900 in anapplicator 800. The location of the RF electrodes 101, 102 and/or themagnetic field generating device 900 may crucially influence theeffectiveness and targeting of the treatment energy sources. The RFelectrodes and magnetic field generating device may be located withinthe applicator.

One or more RF electrodes 101, 102 may be located inside of theapplicator 800, as illustrated in the FIGS. 10a, 10b, 10d, 10e, 10f, 10gand/or outside of the applicator 800, as illustrated in the FIG. 10 c.

As shown in FIGS. 10a-10e and 10g , at least one RF electrode may be inat least partial overlay with the area A2 or A1 of at least one magneticfield generating device according to applicator's floor projection. Sucharrangement may enable the best synergic effect of the magnetic and RFtreatments, improve homogeneity of tissue heating by the RF treatment,improve targeting of the magnetic and RF treatment, and also minimizethe health risk.

FIG. 10a illustrates a side view of the applicator including at leastone RF electrode and magnetic field generating device. Shown applicatormay include the at least one RF electrode 101 which may be located underthe magnetic field generating device 900 in the applicator 800. FIG. 10billustrates an upper view of the same type of applicator including RFelectrode and magnetic field generating device. As shown in FIGS. 10aand 10b , the at least one RF electrode 101 may be very thin in order toreduce unwanted physical effects caused by the time-varying magneticfield. FIG. 10b illustrates that the at least one RF electrode 101 maybe almost completely in overlay with the magnetic field generatingdevice 900.

FIG. 10c illustrates another exemplary applicator including at least oneRF electrode and magnetic field generating device. According to FIG. 10c, the at least one RF electrode 101 may be located outside of theapplicator 800, such as on or adjacent to an exterior surface of theapplicator 800. RF electrode outside of the applicator may have betterinsulation from the magnetic field generating device and/or from otherconductive elements radiating electromagnetic field from the applicator.Better insulation may decrease the influence of unwanted physicaleffects induced in the at least one RF electrode 101 by radiatingelectromagnetic field and/or time-varying magnetic field. One or more RFelectrodes 101 located outside of the applicator as illustrated in FIG.10c may also have better contact with the patient's body and sooperation of tuning electrical element of an RF circuit may be improved.Further, transferring of the RF treatment to at least one patient'starget biological structure may be enhanced.

FIG. 10d illustrates another exemplary applicator including at least oneRF electrode and magnetic field generating device. The at least one RFelectrode 101 may be positioned below the magnetic field generatingdevice 900. Applicator 800 may also include another at least one RFelectrode 102 located above the magnetic field generating device 900,wherein both RF electrode and magnetic field generating device may bepositioned in one applicator 800. The first side portion 801 havingcurved at least one RF electrode 102 in proximity or on its surface maybe used for treating a curved body area (e.g. at least part of thighs,hips, neck and/or arms). The second side portion 802 with a flat atleast one RF electrode 101 in proximity or on its surface may be usedfor treating body area where flat or nearly flat side of the applicatorwill be more suitable, such as an abdomen area or buttock.

FIG. 10e shows a front side view of a similar applicator 800 as in FIG.10d . FIG. 10e illustrates that the RF electrode 101 may be in fact twoelectrodes 101 a and 101 b. The electrodes 101 a and 101 b may bebipolar electrodes. Therefore, the applicator may include two bipolarelectrodes 101 a and 101 b below the magnetic field generating device900.

FIG. 10f illustrates another exemplary applicator 800 including RFelectrode and magnetic field generating device. The applicator mayinclude one or more RF electrodes 101 which may have minimal or nooverlay with at least one magnetic field generating device 900 accordingto applicator's floor projection. The applicator may include two RFelectrodes 101 having no or minimal overlay with magnetic fieldgenerating device.

FIG. 10g illustrates another exemplary applicator 800 including RFelectrode and magnetic field generating device. The applicator may atleast one RF electrode 101 which may be located above the magnetic fieldgenerating device 900. The heating provided by RF electrode positionedabove the magnetic field generating device may be provided also tomagnetic field generating device itself.

One or more RF electrodes positioned on the one applicator and/or morethe applicators 800 may be placed in contact with the patient. Also, oneor more RF electrodes and/or applicators may be separated from thepatient by an air gap, bolus, dielectric material, insulating material,gel, and/or other material.

One or more RF electrodes 101, 102 and/or magnetic field generatingdevices 900 within one applicator may be spaced from each other by anair gap, by material of a printed circuit board, insulator, coolingfluid, and/or other material. The distance between a conductive part ofthe magnetic field generating device and the nearest RF electrode may bein a range of 0.1 mm to 100 mm or 0.5 mm to 50 mm or 1 mm to 50 mm or 2mm to 30 mm or 0.5 mm to 15 mm or 0.5 mm to 5 mm. Spacing between themagnetic field generating device and the RF electrode may be alsoprovided in the form of an insulating barrier that separate a RF circuitfrom a magnetic circuit and prevents affecting one treatment circuit ortreatment energy source by other treatment circuit or other treatmentenergy source. The magnetic field generating device positioned closer topatient's body may be able to stimulate and provide the treatment effectto at least part of at least one target biological structure moreeffectively and deeply than the magnetic field generating device that isin a larger distance from the patient's body.

The magnetic field generating device and/or one or more RF electrodesincluded in or on the applicator may be cooled during the treatment.Cooling of the magnetic field generating device and/or one or more RFelectrodes may be provided by an element based on the Peltier effectand/or by flowing of a cooling fluid, such as air, water, oil and/or afluid within the applicator or in proximity of the applicator. Thecooling fluid may be flowed or guided around one or more magnetic fieldgenerating devices, one or more RF electrodes, between the magneticfield generating device and at least part of at least one RF electrode.Cooling fluid may flow only on the top and/or bottom of the magneticfield generating device. Cooling fluid may be a fluid, such as gas, oil,water and/or liquid. The cooling fluid may be delivered to theapplicator from the main unit where the cooling fluid may be tempered.The cooling fluid may be delivered to applicator and to the proximity ofmagnetic field generating device and/or RF electrode. The cooling fluidmay be delivered to the applicator by connecting tube coupled to themain unit. The connecting tube may include the fluid conduit, which mayserve as path for the cooling fluid between applicator and the mainunit.

The main unit may include one or more cooling tanks where the coolingfluid may be stored and/or cooled. Each cooling tank may include one ormore pumps, wherein one pump may provide flow of the cooling fluid toone applicator. Alternatively, one pump may provide flow of the coolingfluid to plurality of applicators (e.g. two applicators). Further, themain unit may include one cooling tank storing and/or cooling thecooling fluid for one respective applicator or plurality of applicators.For example, when the treatment device includes two applicators, themain unit may include one cooling tank providing the cooling fluid forboth applicators. In another example, when the treatment device includestwo applicators, the main unit may include two cooling tanks providingcooling of the cooling fluid. Each cooling tank may provide cooling ofthe cooling fluid to one particular applicator either synchronously orindependently. Cooling tank or fluid conduit may include a temperaturesensor for measuring temperature of cooling fluid.

The fluid conduit may be a plastic tube. The plastic tube may lead fromcooling tank to the applicator and then back to cooling tank. When thetreatment device includes e.g. two applicators, the fluid conduit maylead from the cooling tank to one applicator and then back to coolingtank while the second fluid conduit may lead from the same or differentcooling tank to second applicator and then back to the cooling tank.However, fluid conduit may lead from cooling tank to first applicator,then lead to second applicator and finally to cooling tank.

When the RF electrode is positioned in the proximity of magnetic fieldgenerating device, the time-varying magnetic field generated by themagnetic field generating device may induce unwanted physical effects inthe RF electrode. Unwanted physical effects induced by time-varyingmagnetic field may include e.g. induction of eddy currents, overheatingof RF electrode, skin effect, and/or causing other electric and/orelectromagnetic effects like a phase shift in the RF electrode. Suchunwanted physical effects may lead to treatment device malfunction,energy loss, decreased treatment effect, increased energy consumption,overheating of at least applicator's part, e.g., RF electrode,collecting false feedback information, malfunctioning of signaladjustment provided to the RF electrode and/or other unwanted effects.

The described invention provides options, methods or designs how toprevent and/or minimize one or more unwanted physical effects induced inthe RF electrode by the magnetic field. The same options methods ordesigns may help to minimize shielding of magnetic field by RFelectrode. One option may include arrangement of the RF electrode inminimal or no overlay with the magnetic field generating deviceaccording to the floor projection of the applicator. Another option mayinclude an RF electrode of special design as described below. Stillanother option may include reducing of thickness of the RF electrode.Still another option may include providing the RF electrode from aconductive material that reduces induction of unwanted physical effectsand heating of the RF electrode. One or more RF electrode providing RFenergy during the treatment by described treatment device may use atleast one of these options, at least two options and or combination ofthese options and their characterization as described below.

One option of minimizing or eliminating unwanted physical effectsinduced in the RF electrode by a magnetic field may include arrangementof the RF electrode in minimal or no overlay with the magnetic fieldgenerating device according to the floor projection of the applicator.

FIG. 11 illustrates an example in which the RF electrode 101 a may belocated under, next to and/or above the magnetic field generating device900 and have no or minimal overlay with the magnetic field generatingdevice 900 according to the applicator's floor projection. As shown onFIG. 11 the electrode 101 a may be located outside of area A2.

FIG. 12 illustrates another exemplary applicator including a magneticfield generating device and one or more RF electrode. The applicator 800may include two RF electrodes 101 a and 101 b spaced by gap 113. Two RFelectrodes 101 a and/or 101 b may be in at least partial overlay 112with the winding area A2 and or area A1 of the magnetic field generatingdevice 900 according to the applicator's floor projection. The partialoverlay 112 is represented by hatched area in the FIG. 12. The floorprojection may be represented by a picture of the applicator 800 takenfrom the bottom of the applicator by X-ray. Such partial overlay 112 maybe in a range from 1% to 100%, or from 1% to 99%, or from 1% to 70%, orfrom 5% to 50%, or from 5% to 40%, or from 10% to 30%, or from 25% to100%, or from 10% to 100%, or from 30% to 95%, or from 40% to 100%, orfrom 70% to 100%, or from 80% to 95% or from 30 to 70% of the area ofone RF electrode area according to the floor projection of theapplicator. Overlay of two areas may refer to a ratio between these twodifferent areas.

One or more temperature sensors 816 a may be located between bipolar RFelectrodes 101 a, 101 b as illustrated in FIG. 12. One or moretemperature sensor 816 a may be at least partially encircled by at leastone RF electrode 101 a and 101 b according to the applicator's floorprojection as illustrated by temperature sensors 816 a in FIG. 12. Thehighest amount of RF energy may flow between bipolar electrodes 101 aand 101 b. Therefore a volume of the body area or the treated tissuebetween or directly below bipolar electrodes may have the highesttemperature and should be measured as an actual temperature ortemperature reference to predetermined temperature. However, thetemperature sensor may be placed inside applicator or on the surface ofthe applicator.

A characteristic shape of the RF electrode may create inhomogeneoustemperature distribution of the heat during the treatment. It may beuseful to place the temperature sensor 816 b such that it is not locatedbetween RF bipolar electrodes 101 a, 101 b in such way that thetemperature sensor is not encircled by bipolar electrodes 101 a, 101 b.The temperature sensor may be placed inside applicator or on the surfaceof the applicator. Also, the temperature sensor 816 c may be locatedunder the RF electrode. The material of the first side portion 801and/or the second side portion 802 covering at least part of thetemperature sensor 816 (e.g. 816 a, 816 b or 816 c) and contacting thepatient's body may be manufactured from the same material as the firstside portion 801 and/or the second side portion 802. However, thematerial of the first side portion 801 or second side portion 802covering the temperature sensor 816 may be from a different materialthan the remainder of the first side portion 801 or second side portion802, such as a material with a higher thermal conductivity, e.g.ceramic, titanium, aluminum, or other metallic material or alloy. Thetemperature sensor 816 may be a thermistor. The temperature sensor 816(e.g. 816 a, 816 b or 816 c) may be fixed or coupled to the first sideportion 801 and/or second side portion 802 by thermal conductivematerial, such as a thermal epoxy layer, with good thermal conductivity.Wire connection between the temperature sensor 816 and rest of thetreatment device may be represented by one, two or more conductive wireswith diameter in a range of 0.05 mm to 3 mm, or of 0.01 mm to 1 mm, orof 0.1 mm to 0.5 mm. The wire connection including a conductive wirewith described diameter may be advantageous because of minimizing ofthermal transfer between the wire and the temperature sensor 816. Thewire connection to the temperature sensor 816 may have thermalconductivity in a range of 5 W·m⁻¹·K⁻¹ to 320 W·m⁻¹·K⁻¹, or 6 W·m⁻¹·K⁻¹to 230 W·m⁻¹·K⁻¹, or 6 W·m⁻¹·K⁻¹ to 160 W·m⁻¹·K⁻¹, or 20 W·m⁻¹·K⁻¹ to110 W·m⁻¹·K⁻¹, or 45 W·m⁻¹·K⁻¹ to 100 W·m⁻¹·K⁻¹, or 50 W·m⁻¹·K⁻¹ to 95W·m⁻¹·K⁻¹. A material of wire connection may be e.g.: nickel, monel,platinum, osmium, niobium, potassium, steel, germanium, aluminium,cobalt, magnesium copper and/or their alloys. At least part of the wireconnection connected to the temperature sensor 816 may be thermallyinsulated by sheathing or shielding, such as by rubber tubing. Thetemperature sensor 816 may be an optical temperature sensor, such as aninfrared IR thermosensor, which may be part of the applicator and/or inthe main unit. During treatment, the optical temperature sensor may belocated in contact with the patient's skin or in a range of 0.1 cm to 3cm, or 0.2 cm to 2 cm from the patient's skin. The optical temperaturesensor may collect information from the patient's skin through theoptical cable.

One or more RF electrodes located with at least partial overlay underthe magnetic field generating device may provide synergic effect of themagnetic treatment and the RF treatment. Stronger or more intensivetreatment result may be provided with RF electrodes located with atleast partial overlay under the magnetic field generating device. Thegenerated RF field and the magnetic field from treatment energy sourcesin such configuration may be targeted to the same body area and/ortarget biological structures. This may result in better heating ofstimulated muscles and adjacent tissues, better suppressing ofuncomfortable feeling caused by muscle stimulation (e.g. musclecontraction), better regeneration after treatment and/or betterprevention of panniculitis and other tissue injury.

Another option of minimizing or elimination of unwanted physical effectsinduced in the RF electrode by magnetic field may include special designof the RF electrode.

It is a part of the invention, that the unwanted physical effectsinduced by magnetic field in RF electrode positioned in proximity or atleast partial overlay with the magnetic field generating device may befurther minimized or eliminated by using a segmented RF electrode. Thesegmented RF electrode may comprise apertures, cutouts and/orprotrusions. The areas of apertures and/or cutouts may be created byair, dielectric and/or other electrically insulating material. Theelectrode may comprise various protrusions. The plurality of aperturesand/or cutouts may be visible from the floor projection of suchelectrode. Another parameter minimizing or eliminating the presence ofthe unwanted physical effects may be the thickness of the RF electrode.If a conductive material of the RF electrode is thin and an area of theRF electrode is at least partially separated by an insulator, loops ofeddy currents induced by magnetic field may be very small and soinduction in such areas is minimized.

The RF electrode may include one or more apertures or cutouts which maysegment the conductive area of the RF electrode and/or perimeter of theRF electrode. The RF electrode is therefore segmented in comparison toregular electrode by disruption of the surface area (i.e., an electrodewith no apertures or cutouts). The two or more apertures or cutouts ofthe one RF electrode may be asymmetrical. The one or more aperture andcutout may have e.g. rectangular or circular shape. An aperture may beany hole and/or opening in the electrode area of the RF electrodeaccording to applicator's floor projection. The apertures and/or cutoutsmay have regular, irregular, symmetrical and/or asymmetrical shape. Theapertures and/or cutouts may be filled by e.g. air, dielectric and/orother electrically insulating material (e.g. dielectric material ofprinted circuit board). When the RF electrode includes two or moreapertures or cutouts, the apertures or cutouts may have the same pointof symmetry and/or line of symmetry. The distance between two closestpoints located on the borders of two different apertures and cutouts ofRF electrode may be in a range from 0.1 mm to 50 mm or 0.1 mm to 15 mmor from 0.1 mm to 10 mm or from 0.1 mm to 8 mm. When the RF electrode isin at least partial overlay with magnetic field generating device, theRF electrode may include larger apertures and cutouts in part of theconductive surface, which is closer to the center of the magnetic fieldgenerating device.

FIG. 13a illustrates an exemplary RF electrode wherein the RF electrode101 includes an electrode area 119 a and defines one or more apertures117 in the conductive area of the RF electrode. The apertures 117 may beelongated slots having a rectangular shape. One aperture 117 may beparallel to another apertures.

FIG. 13b illustrates another exemplary of RF electrode wherein the RFelectrode 101 includes an electrode area 119 a and one or more apertures117 a and 117 b in the conductive area of the RF electrode. Apertures117 a are not parallel to apertures 117 b.

FIG. 13c illustrates another exemplary RF electrode wherein the RFelectrode 101 includes an electrode area 119 a and combination of one ormore apertures 117 in the conductive area, cutout 115 in the conductivearea and protrusion 114 of the RF electrode.

FIG. 13d illustrates another exemplary RF electrode wherein the RFelectrode 101 includes a combination of one or more apertures 117 at theconductive area and the cutouts 115 in the electrode area. The linesrepresent thin line (e.g. single wire) of electrode area 119 a of RFelectrode. The RF electrode may be a grid of conductive wires or mesh ofconductive wires. The protrusion 114 may define one or more cutouts 115at a perimeter of the electrode.

FIG. 13e illustrates another exemplary RF electrode includingprotrusions and cutouts. The RF electrode 101 has an electrode area 119a, a border length 119 b, and a plurality of protrusions illustrated asN_(#). The protrusions may define protrusion cutouts (e.g. cutout 115wherein the cutout may be an opening or gap). The RF electrode 101 mayinclude at least two, three or five protrusions 114 (e.g. 114 a, 114 b)or more. The protrusions 114 may be separated from one another by cutout115. Similarly, the RF electrode 101 may include one, two, three or moreprotrusion cutouts. A first protrusion 114 a and a second protrusion 114b of the plurality of protrusions may be arranged generally parallel toone another. The protrusions 114 may be spaced at a fixed interval andmay be regularly arranged. Protrusions 114 a, 114 b may be shaped asrods or pins having a generally linear shape. Protrusions 114 a and 114b may be made of a conductive material. Cutout 115 may be filled by air,dielectric, or other electrically insulating material. The distancebetween protrusions is such distance, that at least one circle 118 awhich may be hypothetically inscribed into cutout 115 and between twoprotrusions 114 a and 114 b. The at least one circle 118 a may have adiameter in a range from 0.001 to 30 mmm or 0.005 mm to 15 mm, or from0.01 mm to 10 mm or 0.01 mm to 8 mm or from 0.01 mm to 7 mm, or from0.01 mm to 5 mm or from 0.01 mm to 3 mm or from 0.01 mm to 2 mm, whereineach circle may have at least one tangential point located on the firstprotrusion 114 a and at least one tangential point located on the secondprotrusion 114 b. Each circle 118 a may have different tangentialpoints. The cutout 115 may be symmetrical and/or asymmetrical along itslength. The cutout 115 may create a constant distance betweenprotrusions 114 a and 114 b. The distance between protrusions 114 a and114 b may not be constant along the length of the protrusions. Thesmallest distance between two nearest protrusions 114 a, 114 b may bewith increasing length of the protrusions increasing and/or decreasing.

The protrusions 114 or cutouts 115 may have symmetrical, asymmetrical,irregular and/or regular shape. The size, shape and/or symmetry ofindividual protrusions 114 may be the same and/or different across theRF electrode 101. For example, each protrusion 114 may have the sameshape, the same dimensions, and/or symmetry.

The protrusions 114 may be characterized by the hypothetically inscribedcircle 118 b directly into protrusion. The hypothetically inscribedcircle 118 b to the protrusion 114 may have diameter in a range of 0.001mm to 30 mm, or of 0.01 mm to 15 mm, or of 0.2 mm to 10 mm, or of 0.2 mmto 7 mm or of 0.1 to 3 mm. The hypothetically inscribed circle may notcross the border of the protrusion in which it is inscribed. Themagnetic flux density B measured on at least part of the RF electrodesurface area may be in a range of 0.1 T to 5 T, or in range of 0.2 T to4 T, or in range of 0.3 T to 3 T, or of 0.5 T to 5 T, or in range of 0.7T to 4 T, or in range of 1 T to 3 T. The magnetic flux density Bmeasured on at least part of the RF electrode surface area may bemeasured during the treatment. The RF electrode surface area may includesurface area of conductive surface of the RF electrode.

The number of protrusions N_(#)included in one RF electrode means thehighest possible number of conductive areas electrically insulated fromeach other that may be created between and/or by two parallel cuts 111across the surface of the RF electrode. The distance between twoparallel cuts 111 may be in a range of 1 mm to 50 mm or 2 mm to 35 or 5mm to 20 mm. The number of protrusions N_(#)may be in range of 5 to1000, or of 10 to 600, or of 20 to 400, or of 50 to 400, or of 100 to400 or of 15 to 200, or of 30 to 100, or of 40 to 150, or of 25 to 75.

The total number of protrusions in one RF electrode regardless of theparallel cuts 111 may be in the range of 5 to 1000, or of 10 to 600, orof 20 to 400, or of 50 to 400, or of 100 to 400 or of 15 to 200, or of30 to 100, or of 40 to 150, or of 25 to 140.

The total number of apertures or cutouts in one RF electrode regardlessof the parallel cuts 111 may be in the range of 5 to 1000, or of 10 to600, or of 20 to 400, or of 50 to 400, or of 100 to 400 or of 15 to 200,or of 30 to 100, or of 40 to 150, or of 25 to 140.

The number of apertures, cutouts and/or protrusions in one RF electrodelocated below the coil including its core may be in a range 5 to 1000,or of 10 to 600, or of 20 to 400, or of 50 to 400, or of 100 to 400 orof 15 to 200, or of 30 to 100, or of 40 to 150, or of 25 to 140.

Number of an individual protrusions included in one RF electrode may bein range of 1 to 8000 or of 2 to 8000 or of 5 to 8000 or of 3 to 5000 orof 5 to 1000 or of 5 to 500 or of 10 to 500 or of 5 to 220 or of 10 to100 in the area of size 2 cm multiplied 1 cm.

The magnetic flux density B and/or amplitude of magnetic flux density asmeasured on at least part of the RF electrode 101 may be in a range of0.1 T to 5 T, 0.2 T to 4 T, 0.3 T to 3 T, 0.7 T to 5 T, 1 T to 4 T, or1.5 T to 3 T during the treatment. The electrode may be defined by aprotrusion density ρ_(p) according to Equation 1,

$\begin{matrix}{\rho_{p} = \frac{n}{lB}} & {{Equation}\mspace{14mu} 1}\end{matrix}$wherein n symbolize a number of a protrusions intersecting a magneticfield line of force of magnetic flux density

and

symbolizes a length of intersected the magnetic field line of force bythese protrusions. The length l may be at least 1 cm long and magneticfield line of force may have a magnetic flux density

of at least 0.3 T or 0.7 T. The protrusion density according to thetreatment device may be in at least part of the RF electrode in a rangeof 0.3 cm⁻¹·T⁻¹ to 72 cm⁻¹·T⁻¹, or of 0.4 cm⁻¹·T⁻¹ to 10 cm⁻¹·T⁻¹, or of0.4 cm⁻¹·T⁻¹ to 7 cm⁻¹·T⁻¹, or of 0.5 cm⁻¹·T⁻¹ to 6 cm⁻¹·T⁻¹, or of 0.8cm⁻¹·T⁻¹ to 5.2 cm⁻¹·T⁻¹.

Protrusions may be wider (i.e. they may have a greater thickness) wherethe magnetic flux density is lower and thinner where magnetic fluxdensity is higher. Further, protrusion density ρ_(p) may be higher wherethe magnetic flux density is higher.

An electrode area of one or more RF electrodes in one applicator or oneadditional treatment device may be in a range from 1 cm² to 2500 cm², or25 cm² to 800 cm², or 30 cm² to 600 cm², or 30 cm² to 400 cm², or from50 cm² to 300 cm², or from 40 cm² to 200 cm² according to theapplicator's floor projection.

The RF electrode may have a border ratio. Border ratio may be defined asthe ratio between circumference and area of the electrode. An example ofborder ratio is shown in FIG. 13e , where the circumference may bedepicted as the border length 119 b and area of the RF electrode isdepicted by the electrode area 119 a of the RF electrode according tothe applicator's floor projection. The electrode area 119 a is the areaof the RF electrode without wires supplying the RF electrodes andwithout sum of the circumference of all apertures and/or cutouts. Theborder length 119 b is the sum of electrode's circumference and allcircumferences of apertures inscribed inside the electrode, if thereexist any. The border ratio of the RF electrode may be in a range of 150m⁻¹ to 20 000 m⁻¹ or of 200 m⁻¹ to 10 000 m⁻¹ or of 200 m⁻¹ to 4000 m⁻¹or of 300 m⁻¹ to 10 000 m⁻¹ or of 300 m⁻¹ to 4000 m⁻¹ or of 500 m⁻¹ to4000 m⁻¹ or 10 m⁻¹ to 20 000 m⁻¹ or 20 m⁻¹ to 10 000 m⁻¹ or 30 m⁻¹ to 5000 m⁻¹.

According to the applicator's floor projection, at least one RFelectrode may have a border ratio in a range of 150 m⁻¹ to 20000 m⁻¹ orof 250 m⁻¹ to 10000 m⁻¹ or of 200 m⁻¹ to 4000 m⁻¹ or of 300 m⁻¹ to 1000m⁻¹ or of 400 m⁻¹ to 4000 m⁻¹ or of 400 m⁻¹ to 1200 m⁻¹ or of 500 m⁻¹ to2000 m⁻¹ or 10 m⁻¹ to 20 000 m⁻¹ or 20 m⁻¹ to 10 000 m⁻¹ or 30 m⁻¹ to 5000 m⁻¹ in a locations where a magnetic flux density B on at least partof the RF electrode's surface may be in a range of 0.1 T to 7 T, or of0.3 T to 5 T, or of 0.5 to 3 T, or of 0.5 T to 7 T, or in a range of 0.7T to 5 T, or in range of 1 T to 4 T. With increasing magnetic fluxdensity B across the RF electrode area may be an increased border ratio.

The ratio between the border ratio and the magnetic flux density B on RFelectrode surface area may be called a charging ratio. The chargingratio may be related to square surface area of RF electrode of at least1.5 cm² and magnetic flux density in a range of 0.1 T to 7 T, or of 0.3T to 5 T, or of 0.5 to 3 T, or of 1 T to 5 T, or of 1.2 T to 5 T. Thecharging ratio of at least part of the RF electrode may be in a rangefrom 70 m⁻¹·T⁻¹ to 30000 m⁻¹·T⁻¹, or from 100 m⁻¹·T⁻¹ to 5000 m⁻¹·T⁻¹,or from 100 m⁻¹·T⁻¹ to 2000 m⁻¹·T⁻¹, or from 120 m⁻¹·T⁻¹ to 1200m⁻¹·T⁻¹, or from 120 m⁻¹·T⁻¹ to 600 m⁻¹·T⁻¹ or from 230 m⁻¹·T⁻¹ to 600m⁻¹·T⁻¹. Square surface area of RF electrode may include a surface areahaving square shape.

With higher border ratio and/or charging ratio, induced unwantedphysical effects in the RF electrode may be lower because the RFelectrode may include partially insulated protrusions from each other.With higher border ratio and/or charging ratio, possible hypotheticallyinscribed circles into protrusions has to be also smaller and so loopsof induced eddy current has to be smaller. Therefore, induced eddycurrents are smaller and induced unwanted physical effect induced in theRF electrode is lower or minimized.

The ratio between an area of one side of all RF electrodes (floorprojection) and one side of all winding areas of all magnetic fieldgenerating devices (area A2 as shown in FIG. 9a ) in one applicator andaccording to its floor projection may be in a range of 0.1 to 15, or of0.5 to 8, or of 0.5 to 4, or of 0.5 to 2.

As illustrated in FIG. 16, if one protrusion 114 is intersected bymagnetic field lines B₁ and B₂ where absolute value of |B₁| is higherthan absolute value of |B₂| and |B₁|−|B₂0.05<1 T, then the protrusionmay be divided into three areas by lines of forces B₁ and B₂. In otherwords, the protrusion 114, as is illustrated in FIG. 16, may be dividedinto thirds S₁, S₂, S₃ that have the same length according to directionof magnetic field gradient and S₁ is exposed to higher magnetic fluxdensity than S₃. Area S₁ may be placed in the highest magnetic fluxdensity, S₂ may be placed in middle magnetic flux density and S₃ may beplaced in the lowest magnetic flux density. The maximal hypotheticallyinscribed circle k₁ with diameter d₁ inscribed in the area S₁ may havesmaller diameter than the maximal inscribed circle k₂ with diameter d₂inscribed in the area S₃. The diameter d₂ may be greater than diameterd₁ of 2% to 1500%, or of 5% to 500%, or of 10% to 300%, or of 10% to200%, or of 10% to 100%, or of 5% to 90%, or of 20% to 70%, or 5% to 20%of the diameter d₁. In such case, protrusions may be thinner where themagnetic flux density is higher, such as at least partially pyramidalshape of the protrusion may be created. In addition, protrusions may bethinner where magnetic flux density is higher.

The RF electrode may have different sizes and shapes. According to theinvention, bipolar electrodes may be parallel electrodes, such as shownin FIGS. 14a-14e , or concentric electrodes it is shown in FIGS. 15a-15c. The same type of RF electrodes 101 illustrated in FIGS. 14a-14e andFIGS. 15a-15c that may be located close to the second side portion ofthe applicator may be used as RF electrodes 102 located close to thefirst side portion and/or for any other one or more RF electrodes.

Shape and arrangement of RF electrodes of at least one applicator may bebased on size shape and symmetry of body location (anatomy) where atleast one applicator will be attached. Positioning and different shapesof the RF electrode may be beneficial in order to avoid creating of hotspots, provide homogeneous heating of as large treated body area, aspossibility to avoid needs of moving with one or more applicators.

FIG. 14a illustrates an example of symmetrical positioning of RFelectrodes. FIG. 14b illustrates another example of symmetricalpositioning of RF electrodes. FIG. 14c illustrates still another exampleof symmetrical positioning of RF electrodes. FIG. 14d illustrates viewof an applicator including symmetrical positioning of RF electrodes.FIG. 14e illustrates a side view of an applicator including example ofsymmetrical positioning of RF electrodes.

According to examples of RF electrodes shown in FIGS. 14a-14e , theapplicator may include at least one pair of parallel bipolar RFelectrodes 101 a and 101 b spaced by a gap 113. The RF electrodes arepowered by wiring 100 a and 100 b. As illustrated in FIGS. 14a, 14b and14d , RF electrodes 101 a, 101 b may be symmetrical, and may be mirrorimages. The shape of individual RF electrodes 101 a and 101 b may beirregular or asymmetrical wherein the length and/or area of at least40%, 50%, 70%, 90%, or 99% of all protrusions in one RF electrode may bedifferent. Body anatomy and testing may prove that such kind of RFelectrodes could provide the most comfortable and efficient treatment ofbody areas, such as abdomen area, buttock, arms and/or thighs.

As illustrated in FIG. 14c , RF electrodes 101 a, 101 b may be at leastpartially symmetrical according to at least one axis or point ofsymmetry, such as according to linear symmetry, point symmetry, androtational symmetry. For example, each electrode may be semi-circular orC-shaped. Further, the gap 113 between RF electrodes 101 a and 101 b maybe irregular and/or may be designed according to at least one axis ofsymmetry, such as linear axis of symmetry with mirror symmetry. Thus, incase when electrodes 101 a and 101 b may be semi-circular, gap 113 maybe circular. Use of such symmetrical electrode may be beneficial fortreating body area where such symmetry may be required to highlightsymmetry of body area (e.g. buttocks or hips).

The gap 113 between RF electrodes 101 a and 101 b may include air,cooling fluid, oil, water, dielectric material, fluid, and/or any otherelectric insulator, such as a substrate from composite material used inprinted board circuits. The RF electrode 101 a and 101 b may be formedfrom copper foil and/or layer deposited on such substrate. The gap 113may influence a shape of the electromagnetic field (e.g. RF field)produced by RF electrodes and the depth of electromagnetic fieldpenetration into a patient's body tissue. Also, the distance between theat least two RF electrodes 101 a and 101 b may create the gap 113 whichmay have at least partially circular, elliptic and/or parabolic shape,as illustrated in FIGS. 14a . The gap 113 may have regular shape forspacing RF electrodes with constant distance as illustrated in FIG. 14b.

The gap 113 between the RF electrodes 101 a and 101 b may be designed toprovide a passage of amount in the range of 2% to 70% or 5% to 50% or15% to 40% of the magnetic field generated by the magnetic fieldgenerating device. The distance between the nearest parts of at leasttwo different RF electrodes in one applicator may be in a range of 0.1cm to 25 cm, or of 0.2 cm to 15 cm, or of 2 cm to 10 cm, or of 2 cm to 5cm.

The gap 113 between two RF electrodes may be designed in a plane of theRF bipolar electrodes wherein the gap 113 may at least partially overlaya location where the magnetic flux density generated by the magneticfield generating device has the highest absolute value. The gap 113 maybe located in such location in order to optimize treatment efficiencyand minimize energy loss.

It should be noted that strong magnetic field having high derivative ofthe magnetic flux density dB/dt may induce unwanted physical effectseven in the RF electrode with protrusions, apertures and/or cutouts. Thegap 113 may be positioned or located in the location where the absolutevalue of magnetic flux density is highest. As a result, the plurality ofRF electrodes positioned around the gap 113 may be then affected bylower amount of magnetic flux density.

Plurality of RF electrodes (e.g. two RF electrodes 101 a and 101 b) maybe located on a substrate 113 a as shown in the FIG. 14d . Substrate 113a may be used as filler of the gap 113 between RF electrodes and of oneor more cutouts 115. As shown in FIGS. 14d and 25, the substrate 113 aand one or more RF electrodes may be curved into required shape and/orradius to fit to patient's body area. RF electrodes 101 a or 101 b maybe curved along a lower cover 125 of applicator 800, particularly alonga curved portion 126 of lower cover 125. As shown in FIG. 14d , thesubstrate 113 a may define a substrate gap 113 b for at least onesensor, such as temperature sensor. Substrate gap 113 b may furtherenable passage of one or more wires, cooling fluid, and/or forimplementing another treatment energy source, such as a light treatmentenergy source (e.g. LED, laser diode) providing illumination oradditional heating of the biological structure and/or body area.

FIGS. 15a, 15b and 15c illustrate two RF electrodes 101 a and 101 b,wherein at least one RF electrode 101 a may at least partially surroundanother RF electrode 101 b. The RF electrodes 101 a and 101 b may bespaced by gap 113 including e.g. substrate 113 a with the sameinsulating properties as described above with respect to FIGS. 14a-14e .RF electrode 101 b may include a hole 116 in order to minimize shieldingof magnetic field and inducing of unwanted physical effects induced inthe RF electrode 101 b. The hole 116 may be located in the RF electrodeplane where the magnetic flux density of the magnetic field generated bymagnetic field generating device reaches highest values during thetreatment. The hole 116 may be circular, or may have other shapes, suchas oval, square, triangle, or rectangle, among others. The hole 116 mayhave an area of 0.05 cm² to 1000 cm², or 0.05 cm² to 100 cm², or of 3cm² to 71 cm², or of 3 cm² to 40 cm², or of 3 cm² to 20 cm², or of 3 cm²to 15 cm², or of 0.5 cm² to 2.5 cm². The RF electrodes may be fully orpartially concentric.

FIG. 15a illustrates two RF electrodes 101 a and 101 b may which benoncircular with at least one linear and/or point symmetry. Shownelectrodes 101 a and 101 b may have no centre of symmetry. Shown RFelectrode 101 a may include a hole 116 in its centre where the magneticflux density is the highest in order to minimize induction of unwantedphysical effect in the RF electrode by magnetic field.

FIG. 15b illustrates two RF electrodes 101 a and 101 b may have acircular shape with rotational symmetry. The RF electrodes 101 a and 101b may have the same centre of symmetry. Shown RF electrode 101 a mayinclude a hole 116 in its centre where the magnetic flux density is thehighest in order to minimize induction of unwanted physical effects inthe RF electrode by magnetic field.

FIG. 15c illustrates two RF electrodes 101 a and 101 b may have nosymmetry and no centre of symmetry.

Another option of minimizing or elimination of unwanted physical effectsinduced in the RF electrode by magnetic field may include reducing thethickness of the RF electrode.

Thickness of the conductive layer of RF electrode of the invention maybe in a range of 0.01 mm to 10 mm, or of 0.01 mm to 5 mm, or of 0.01 mmto 3 mm, or of 0.01 mm to 1 mm, or 0.1 mm to 1 mm, or of 0.005 mm to 0.1mm, or of 0.01 mm to 0.2 mm. One type of the RF electrode may bedesigned by a similar method as printed circuit boards (PCB) areprepared, wherein a thin, conductive layer may be deposited into and/oronto a substrate with insulating properties. The substrate may includeone, two or more conductive layers from a material such as copper,silver, aluminum, alloys of nickel and zinc, austenitic stainless steeland/or other materials, creating the RF electrode. The thickness ofsubstrate material may be in a range of 0.01 mm to 10 mm, or of 0.01 mmto 5 mm, or of 0.01 mm to 3 mm, or of 0.01 mm to 2 mm, or of 0.1 mm to 2mm, or of 0.5 mm, to 1.5 mm or of 0.05 mm to 1 mm. The substratematerial may be polymeric, ceramic, copolymeric sheet, phenol resinlayer, epoxy resin layer, fiberglass fabric other textile fabric,polymeric fabric and/or other. The substrate may be at least partiallyflexible and/or rigid.

The RF electrode may be system of thin, conductive wires, flat stripes,sheets or the like.

Still another option of minimizing or elimination of unwanted physicaleffects induced in the RF electrode by magnetic field may includeforming the RF electrode from a conductive material that reducesinduction of unwanted physical effects and heating of the RF electrode.

The RF electrodes may be made of specific conductive materials reducinginduction of unwanted physical effects in the RF electrode. Suchmaterials may have relative permeability in a range of 4 to 1,000,000,or of 20 to 300,000, or of 200 to 250,000, or of 300 to 100,000, or of300 to 18,000, or of 1,000 to 8,000. Material of the RF electrode mayinclude carbon, aluminum, copper, nickel, cobalt, manganese, zinc, iron,titanium, silver, brass, platinum, palladium and/or others from whichmay create alloys, such as Mu-metal, permalloy, electrical steel,ferritic steel, ferrite, stainless steel of the same. In addition, theRF electrode may be made from mixed metal oxides and/or fixed powderfrom metal oxides, metal from m-metal elements to minimize induction ofeddy currents and heating of the RF electrode and also in order tominimize energy loss of time-varying magnetic field.

One or more RF electrodes providing RF energy during the treatment bydescribed treatment device may use at least one options, at least twooptions and or combination of options how to minimize or eliminateunwanted physical effects induced by magnetic field as described above.Also one or more characterization of the option may be used formanufacture, design and operation of the treatment device of invention.

The treatment device combining RF treatment with magnetic treatment mayinclude one or more treatment circuits. The treatment circuit for RFtreatment may include power source, RF electrode and/or all electricalelements described herein for RF cluster. The treatment circuit formagnetic treatment may include power source, magnetic field generatingdevice, all electrical elements described herein for magnetic clusterHIFEM. Plurality of treatment circuits providing same or differenttreatment may include common power source. Alternatively, each treatmentcircuit may include its own power source. Operation of all treatmentcircuits may be regulated by one master unit or one or more controlunits. The HMI, master unit and/or one or more control unit may be usedfor selection, control and/or adjustment of one or more treatmentparameters for each applicator and/or each treatment energy source (e.g.RF electrode or magnetic field generating device. Treatment parametersmay be selected, controlled and/or adjusted by HMI, master unit and/orone or more control unit independently for each applicator.

FIG. 17 illustrates exemplary electrical elements of a magnetic circuit400. The electrical signal passing through the magnetic circuit 400 maybe transformed into a form of one or more pulses of electrical signal.The electric pulses may be provided to magnetic field generating devicein order to generate impulses of time-varying magnetic field. Individualelectrical elements of the magnetic circuit may be a power source (PS),an energy storage device (ESD), a switch (SW), magnetic field generatingdevice (MFGD) and control unit of magnetic circuit (CUM). The magneticcircuit may include treatment cluster for magnetic treatment called asHIFEM cluster. The HIFEM cluster may include e.g. ESD, SW and/or CUM.Control unit of magnetic circuit CUM may be part of the control system.Control unit of magnetic cluster CUM and/or other electrical element ofmagnetic circuit may be slave of the master unit. The HIFEM cluster,control system and/or CUM may provide or control storage of electricenergy in ESD by controlling the amount of stored electrical energy.HIFEM cluster, control system and/or CUM may provide modification ofelectrical signal, adjustment of parameters of electric signaltransferred through HIFEM cluster, safe operation of the circuit and/orcharging or recharging of the ESD. For example, the HIFEM cluster orcontrol system may provide adjustment of magnetic flux density ofmagnetic field provided by MFGD by adjustment of voltage and/or currentof electrical pulses transferred to MFGD. Modification of the electricalsignal may include a distortion of signal transmitted in magneticcircuit, envelope distortion in shape, amplitude and/or frequencydomain, adding noise to the transferred electrical signal and/or otherdegradation of transmitted original signal entering the magneticcircuit.

The energy storage device ESD, may accumulate electrical energy, whichmay be provided to magnetic field generating device in the form ofelectric signal (e.g. in form of high power impulses) of energy. The ESDmay include one, two, three or more capacitors. The ESD may also includeone or more other electrical elements such as a safety element, such asa voltage sensor, a high voltage indicator, and/or dischargingresistors, as shown in FIG. 18a . The voltage sensor and the highvoltage indicator may provide feedback information to the switch SW andor to control unit CUM. The discharging resistor being a part of the mayprovide discharging of at least one capacitor in case of hazardoussituation. Discharging of one or more ESD may be controlled by thecontrol unit CUM. Released electrical energy from the ESD may bedelivered as high power impulse and/or pulse to at least part of themagnetic circuit e.g. to the magnetic field generating device MFGD.

A capacitance of energy storage device may be in the range of 5 nF to100 mF, or in the range of 25 nF to 50 mF, or in the range of 100 nF to10 mF, or in the range of 1 μF to 1 mF, or in the range of 5 μF to 500μF or in the range of 10 μF to 180 μF, or in the range of 20 μF to 80μF.

The energy storage device may be charged on a voltage in a range from250 V to 50 kV, 700 V to 5 kV, 700 V to 3 kV, or 1 kV to 1.8 kV.

The energy storage device may provide a current pulse discharge in arange from 100 A to 5 kA, 200 A to 3 kA, 400 A to 3 kA, or 700 A to 2.5kA. The current may correspond with a value of the peak magnetic fluxdensity generated by the magnetic field generating device.

By discharging of the energy storage device, a high power current pulsemay be produced with an energy in a range of 5 J to 300 J, 10 J to 200J, or 30 J to 150 J.

The switch SW may include any switching device, such as a diode, pindiode, MOSFET, JFET, IGBT, BJT, thyristor and/or a combination thereof.The switch may include a pulse filter providing modification of theelectrical signal. The pulse filter may suppress switching voltageripples created by the switch during discharging of the ESD.

The magnetic circuit may be commanded to repetitively switch on/off theswitch SW and discharge the energy storage device ESD to the magneticfield generating device, e.g. the coil in order to generate thetime-varying magnetic field.

An inductance of the magnetic field generating device may be up to 1 H,or in the range of 1 nH to 500 mH, 1 nH to 50 mH, 50 nH to 10 mH, 500 nHto 1 mH, or in the range of 1 μH to 500 μH or in the range of 10 μH to60 μH.

The magnetic field generating device may emit no radiation (e.g. gammaradiation).

The magnet circuit may include a series connection of the switch SW andthe magnetic field generating device. The switch SW and the magneticfield generating device together may be connected in parallel with theenergy storage device ESD. The energy storage device ESD may be chargedby the power source PS. After that, the energy storage device ESD may bedischarged through the switch SW to the magnetic field generating deviceMFGD. During a second half-period of LC resonance, the polarity on theenergy storage device ESD may be reversed in comparison with the powersource PS. As a result, there may be twice the voltage of the powersource. Hence, the power source and all parts connected in the magneticcircuit may be designed for a high voltage load and protective resistorsmay be placed between the power source and the energy storage device.

The magnetic field generating device MFGD and an energy storage deviceESD may be connected in series. The magnetic field generating deviceMFGD may be disposed in parallel to the switch SW. The energy storagedevice ESD may be charged through the magnetic field generating device.To provide an energy impulse to generate a magnetic impulse (or pulse togenerate a magnetic pulse), controlled shorting of the power sourcetakes place through the switch SW. In this way the high voltage load atthe terminals of the power source PS during the second half-period of LCresonance associated with known devices is avoided. The voltage on theterminals of the power source PS during second half-period of LCresonance may have a voltage equal to the voltage drop on the switch SW.

The switch may be any kind of switching device. Depending on the type ofthe switch, the load of the power source may be reduced to a few Volts,e.g., 1-10 volts. Consequently, it is not necessary to protect the powersource from a high voltage load, e.g., thousands of Volts. Accordingly,the use of protective resistors and/or protection circuits may bereduced or eliminated.

FIG. 18b illustrates exemplary electrical elements of an RF circuit 480.The RF circuit may provide an adjusted and/or modified electromagneticsignal (electrical signal) to an RF electrode (RFE). The RF circuit mayinclude power source (PS), treatment cluster for RF treatment (areamarked as RF), control unit of RF cluster (CURF), power amplifier (PA),filter, standing wave ratio combined with power meter (SWR+Power meter),tuning element (tuning), splitter, insulator, symmetrisation element(SYM), pre-match and RF electrode (RFE). Treatment cluster for RFtreatment may include e.g. control unit of RF cluster (CURF), poweramplifier (PA), filter, standing wave ratio combined with power meter(SWR+Power meter) and/or tuning element (tuning). Control unit of RFcircuit CURF may be part of the control system. Control unit of RFcircuit CURF and/or other electrical element of RF circuit may be slaveof the master unit. One or more electrical elements described as a partof RF circuit may be dismissed, some of the electrical elements may bemerged to one with similar function and/or some of the electricalelements may be added to improve functionality of the circuit.

The power source of the RF circuit may provide electric signal ofvoltage in a range of 1 V to 5 kV, or 5 V to 140 V, or 10 V to 120 V, or15 V to 50 V, or 20 V to 50 V.

The CURF may control operation of any electrical element of RF circuit.The CURF may regulate or modify parameters of the electrical signaltransferred through the RF circuit. Parameters of the signal, e.g.,voltage, phase, frequency, envelope, value of the current, amplitude ofthe signal and/or other may be influenced by individual electricalelements of the RF circuit that may be controlled by CURF, controlsystem and/or electrical properties of individual electrical elements ofRF circuit. Electrical elements influencing signal in the RF circuit maybe, for example, a power source (PS), a power amplifier (PA), a filter,a SWR+Power meter, a tuning, a splitter, an insulator, symmetrisationelement changing unbalanced signal to balanced signal (SYM), pre-matchand/or RF electrode generating RF waves. Modification of the electricalsignal may include a distortion of signal transmitted in RF circuit,envelope distortion in shape, amplitude and/or frequency domain, addingnoise to the transferred electrical signal and/or other degradation oftransmitted original signal entering the RF circuit.

The power amplifier PA may produce RF signal of respective frequency forgeneration of RF waves by RF electrode. The power amplifier may beMOSFET, LDMOS transistor or vacuum tube. The PA may be able to increasean amplitude of provided signal and/or modified signal to electricsignal (e.g. RF signal).

The filter may include one or more filters which may suppress unwantedfrequency of signal transmitted from the power amplifier. One or morefilters may filter and provide treatment with defined band offrequencies. One or more filters may be used to filter the electricalsignal such as electric signal in the RF circuit, according to signalfrequency domain to let pass only band of wanted frequencies. The filtermay be able to filter out unsuitable signal frequencies based oninternal software and/or hardware setting of the filter. The filter mayoperate according to communication with other one or more electricalelements e.g. the CURF. The one or more filters may be located between apower source of RF signal PSRF and the RFE.

The SWR+Power meter may measure output power of RF energy and evaluatethe quality of impedance matching between the power amplifier andapplicator. The SWR+Power meter may include a SWR meter that may measurethe standing wave ratio in a direction of a wave transmission. TheSWR+Power meter may include a power meter that may measure amplitude ofsuch standing waves. The SWR+Power meter may communicate with the CURFand/or with the tuning element. The SWR+Power meter may provide afeedback information in order to prevent creation of the standing wavein the patient's body, provide better signal adjustment by the tuningelement and to provide safer treatment and energy transfer to biologicalstructure more effectively in more targeted manner.

Tuning element may provide improvement of the impedance matching. Thetuning element may include, e.g. capacitor, LC and/or RLC circuit. Thetuning element may provide controlled tuning of the RF circuit systemcapacity, wherein the RF circuit system includes individual electricalelements of the RF circuit and also currently treated tissue of thepatient under the influence of the provided RF waves. Tuning of the RFcircuit may be provided before and/or during the treatment. The tuningelement may also be called a transmatch.

The symmetrisation element SYM may convert the signal from unbalancedinput to balanced output. The SYM may be a balun and/or a baluntransformer including wound coaxial cable to balance signal between RFelectrodes. The SYM element may provide signal symmetrisation betweenthe first and the second bipolar RF electrode e.g. by creating λ/2 phaseshift of the RF signal guided through the coaxial cables to the firstand the second bipolar RF electrode.

The splitter may split the RF signal transferred/delivered in the RFcircuit by a coaxial cable. Divided signal may have the same phase ofeach divided signal part and/or the divided signals may have constantphase shift from each other. For example, the splitter may provide onepart of the RF signal to a first RF electrode and second part of the RFsignal to a second RF electrode of a bipolar electrode. The splitter maybe shared for one two or more independent RF circuits or each RF circuitmay have its own splitter.

An insulator may be combined with the splitter and/or may be locatedbefore and/or after splitter with regard of transporting RF signal tothe RF electrode. The insulator may be electrical insulation of at leastpart of the RF circuit from the magnetic circuit. The insulator may beused to minimize influence of the magnetic circuit to the RF circuit.

The pre-match may be used in the devices using coaxial cables. Thepre-match may include a small coil, condenser and/or resistor.

The RF electrode (RFE), acting as a treatment energy source, may includeone or more unipolar RF electrodes, one or more monopolar RF electrodesand/or one or more pairs of bipolar RF electrodes.

The power source PS of the RF circuit, power amplifier PA, filter,SWR+Power meter, tuning, SYM, splitter, insulator and/or pre-match maybe at least partially and/or completely replaced by an HF generatorsupplying the rest of the circuit, including the RF electrode, with ahigh frequency electric signal.

FIG. 24 illustrates one of examples of the symmetrisation element SYM.Input coaxial cable 130 provides electrical signal (e.g. RF signal) tothe splitter 131 that may split RF signal into two branches. Thesplitter 131 may also include an insulating element, such as at leastone, two, three or more serial connected capacitors creating insulatinglength in a range of 4 mm to 100 mm, or 20 mm to 50 mm. The SYM may beestablished or represented by the different length of the coaxial cablesguided or leading to pair of bipolar RF electrodes. The difference inlength between coaxial cables 132 and 133 in location l₁ may be in arange of 0.4 to 0.6, or 0.46 to 0.55 of the λ, where λ may be wavelengthof the guided RF signal in the coaxial cable 132 and/or coaxial cable133. The length of the coaxial cable 132 may be in a range of 1 cm to 5m, 5 cm to 90 cm or 10 cm to 50 cm. The length of the coaxial cables132+135 b may be in a range of k/4 10%, or ±5%, or their multiples bypositive integer. The length of the coaxial cable 133 may be in a rangeof 2 m to 12 m, or 2.2 m to 8 m. The length of the coaxial cable 133 maybe in a range of λ/2±10%, or ±5%, plus the length of cable 132. Thelength of the coaxial cables 133+135 a may be in a range of 3λ/4±10%, or±5%. In a summary the coaxial cables 132+135 b are shifted in relationto the coaxial cables 133+135 a of λ/2 10%, or ±5%. This part of the SYMmay cause phase shift 180° of the RF signal delivered to one RFelectrodes 101 a and 101 b. The RF electrodes 101 a and 101 b may bepart of one applicator or the RF electrode 101 a may be part of firstapplicator and RF electrode 101 b may be part of second applicator. Aconnector 134 may be used for connecting one or more applicators to themain unit. The part 12 may represent a connecting tube of theapplicator. The length of the coaxial cables 135 a and 135 b in thisconnecting tube may be in a range of 1 m to 6 m, or of 1.1 m to 4 m orof λ/4±10% or ±5%. A pairing element 136 may be conductive connection ofthe conductive shielding part of the coaxial cables 135 a and 135 b. Thepairing element 136 may have a surface area in a range of 0.5 cm² to 100cm², 1 cm² to 80 cm² or 1.5 cm² to 50 cm². The pairing element 136 mayinclude material of height electric conductivity, such as copper,silver, gold, nickel, or aluminum, wherein the impedance of the pairingelement 136 may be near to zero. The pairing element 136 or betweenpairing element and electrode may be placed a capacitor, resistor and/orinductor.

The RF circuit and/or the magnetic circuit may be at least partiallylocated in one or more applicators. The wire connection between theapplicator, an additional treatment device and/or the main unit may bealso considered as a part of the RF circuit and/or magnetic circuitelement because of the impedance, resistivity and/or length of the wireconnection. One or more electrical elements of the magnetic circuitshown in FIG. 17, RF circuit shown in FIGS. 18b and 18a may bedismissed, may be sorted in different order and/or two or moreelectrical elements may create one individual combined electricalelement. Adjusting of the signal provided to the RF circuit may be atleast partially provided by or inside another different circuit of thetreatment device e.g.: magnetic circuit and/or other.

FIG. 18a illustrates an exemplary schema 180 of electrical elements oftreatment device. The exemplary schema include two independent powersources including power source for RF treatment (PSRF) and power sourcefor magnetic treatment (PSM) connected to one power network (PN). ThePSRF may provide electromagnetic signal to two independent treatmentclusters for RF treatment RF A and/or RF B. The PSM may provideelectromagnetic signal to one or more clusters of magnetic treatmentHIFEM A and/or HIFEM B. One or more the power sources may be alsopowering other parts of the treatment device, such as a human machineinterface (HMI), or the master unit, among others. Each magnetic circuitand/or RF circuit may have its own control units (CUM A, CUM B and CURFA and CURF B). CURF A and CURF B may be control units of RF treatmentcluster for RF treatment A (RF A) and treatment cluster for RF treatmentB (RF B) respectively.

Control units may include one or more PCBs or microprocessors. One ormore control units may communicate between each other and/or with themaster unit that may be selected as a master unit for other controlunits in master-slave communication. The master unit may be the first oronly control unit that communicates with the HMI. The master unit maycontrol units CUM A and CUM B. The master unit may be a control unitincluding one or more PCBs and/or microprocessors. Master unit orcontrol unit A (CUM A) or control unit B (CUM B) may be coupled to humanmachine interface. Also, the master unit may be human machine interfaceHMI or be coupled to the human machine interface HMI.

FIG. 18a illustrates two parts of the treatment device, wherein thefirst part may provide the RF treatment and the second part may providethe magnetic treatment. Two parts of the treatment device may beinsulated from each other. The treatment device may include one or moreinsulated electrical elements and/or parts of the treatment device andindividual circuits from each other in a manner of shielding voltagebarrier, distance barrier and/or radiation barrier. Examples ofinsulated parts may be represented by a dashed line in FIG. 18a . It isalso possible that individual electrical elements of the treatmentdevice may be insulated from at least one part of the treatment device.Insulation of such parts and/or electrical elements may be provided bymaterial of high dielectric constant, by distance of individual partsand/or electrical elements, by system of capacitors or resistors. Also,any shielding known from electronic, physics, by aluminium boxes and/orby other manner may be used.

The RF treatment and/or magnetic treatment may be provided by at leastone, two, three, four or more treatment circuit (which may be located inthe main unit) and/or applicators wherein one treatment circuit mayinclude RF cluster or magnetic cluster. Each applicator A and B (AP Aand AP B) may include at least one electrical element of one, two ormore treatment circuits. Each applicator may include at least one, twoor more different treatment energy sources, such as one or more RFelectrodes providing the RF treatment and one or more magnetic fieldgenerating devices providing the magnetic treatment. As shown in FIG.18a , the treatment device may include first applicator (AP A) andsecond applicator (AP B). The first applicator (AP A) may include firstRF electrode (RFE A) from first RF circuit and first magnetic fieldgenerating device (MFGD A) from first magnetic circuit. The secondapplicator (AP B) may include second RF electrode (RFE B) from second RFcircuit and second magnetic field generating device (MFGD B) from secondmagnetic circuit. In different example, first applicator may includefirst magnetic field generating device and first pair of bipolar RFelectrodes, while second applicator may include second magnetic fieldgenerating device and second pair of bipolar RF electrodes. Twoapplicators may be connected to main unit separately and may beindividually positioned to proximity of the body area before or duringthe treatment, when they are coupled to the body area in contact withthe body area.

FIG. 18a also illustrates other individual parts of the treatmentdevice, such as treatment cluster for RF treatment (RF A), treatmentcluster for RF treatment (RF B), treatment cluster for magnetictreatment HIFEM A, treatment cluster for magnetic treatment HIFEM B inthe magnetic circuit, power source for RF treatment (PSRF), power sourcefor magnetic treatment (PSM), applicator A (AP A), applicator B (AP B).All parts, except the applicators, may be located in the main unit.Shown splitter, symmetrisation element (SYM A), and symmetrisationelement (SYM B) are parts of two RF circuits. The splitter shown on FIG.18a may be common for the RF circuits. The power source for RF treatment(PSRF) may include steady power source of RF circuit (SPSRF), auxiliarypower source of RF circuit (APS RF), power network filter PNFLT and/orpower unit (PU). Individual electrical elements may not be included withother electrical elements in PSRF. The power source for magnetictreatment (PSM) may include auxiliary power source A (APS A), auxiliarypower source B (APS B), steady power source of magnetic circuit (SPSM),power pump (PP), board power source A (BPS A) and/or board power sourceB (BPS B). Individual electrical elements may not be included with otherelectrical elements in PSM. Treatment cluster for magnetic treatmentHIFEM A of the magnetic circuit may include control unit A (CUM A),energy storage device A (ESD A), switch A (SW A), safety element (SE)and/or pulse filter (PF). Treatment cluster for magnetic treatment HIFEMB of the magnetic circuit may include control unit B (CUM B), energystorage device B (ESD B) and/or switch B (SW B). Although not shown onFIG. 18a , the treatment cluster for magnetic treatment HIFEM B may alsoinclude pulse filter (PF) and/or safety element (SE). Individualelectrical elements may be insulated from each other. However,individual electrical elements and/or circuit parts may be merged and/orshared with other circuit parts. As an example, one control unit may beat least partially shared with two or more RF circuits and/or magneticcircuits, and one control unit may regulate power or power network orpower source providing power for the RF circuit and also for themagnetic circuit. Another example may be at least one auxiliary powersource and/or steady power source shared with at least two RF and/ormagnetic circuits.

Treatment cluster for magnetic treatment HIFEM A may provide magnetictreatment independently on treatment cluster for magnetic treatmentHIFEM B. Alternatively, the treatment device may include just onetreatment cluster for magnetic treatment HIFEM or the treatment devicemay include two or more individual treatment clusters for magnetictreatment HIFEM, wherein some of the treatment cluster for magnetictreatment HIFEM may share individual electrical elements such as acontrol unit, energy storage device, pulse filter and/or other.

As shown in FIG. 18a , the treatment cluster for magnetic treatmentHIFEM, e.g. HIFEM A, may include the control unit, e.g. CUM A. Thecontrol unit, e.g. CUM A, may control a charging and/or discharging ofthe energy storage device, e.g. ESD A, processing feedback informationand/or adjusting parameters of individual electrical elements and/ortreatment clusters for magnetic treatment HIFEM. In addition, thecontrol unit (e.g. CUM A) may control adjusting parameters or operationof electrical elements, e.g. BPS A from circuit part PSM, switch, PF,ESD A from the treatment cluster for magnetic treatment HIFEM A and/orprocessing information from the sensors in the applicator AP A and/or APB. The control unit (e.g. CUM A) may also communicate with another oneor more magnetic and/or RF circuits and/or including master unit. Thepower source PSM, the energy storage device ESD and/or the switch SW maybe at least partially regulated by the control unit of the magneticcircuit, e.g. CUM A. The control unit (e.g. CUM A) or master unit and/orone or more individual electrical elements of the circuit may beregulated by any other electrical element based on mutual communicationbetween them. The master unit may be able to adjust treatment parametersof the magnetic treatment and/or the RF treatment based on feedbackinformation provided from the sensors and/or based on communication withother control units, e.g. the master unit. One control unit CUM or CURFmay regulate independently one or more circuits providing magneticand/or RF treatment. At least one control unit may use peer-to-peercommunication and/or master-slave communication with other control units(e.g. CUM A may be slave control unit of the master unit).

The treatment device may include one, two, three or more ESD, whereineach ESD may include one, two, three or more capacitors. One ESD mayprovide energy to one, two, three or more treatment energy sources, suchas magnetic field generating devices providing magnetic treatment. Eachcoil may be coupled to its own respective ESD or more than one ESD. TheESD may include one or more other electrical elements such as a safetyelement SE, such as a voltage sensor, a high voltage indicator, and/ordischarging resistors, as shown in FIG. 18a . The voltage sensor and thehigh voltage indicator may provide feedback information to the switch SWand/or to control unit, e.g., CUM A. The discharging resistor as part ofthe SE may provide discharging of at least one capacitor in case ofhazardous situation. Discharging of one or more ESD may be controlled bythe control unit e.g. CUM A or CUM B. The signal provided from theenergy storage device ESD through the switch SW to the magnetic fieldgenerating device may be modified by a pulse filter (PF). The PF may bepart of the switch SW and/or may be positioned between the switch SW andthe magnetic field generating device, e.g., MFGD A. The PF may suppressswitching voltage ripples created by the switch during discharging ofthe ESD. The proposed circuit may repetitively switch on/off the switchSW and discharge the energy storage device ESD to the magnetic fieldgenerating device, e.g. the MGFD A in order to generate the time-varyingmagnetic field. As shown in FIG. 18a , one or more electrical elementsof the magnetic circuit and/or RF circuit may be omitted and/or combinedto another. For example, one or more individual electrical elements ofPSRF and/or PSM may be combined to one, but independency of individualcircuits may be decreased. Also electrical elements the PF, the SEand/or other may be independent electrical element. Also individualtreatment circuits, e.g. RF circuits, may be different from each otheras can be seen in FIGS. 18a and 18b , wherein electrical elements, suchas a filter, a SWR+Power meter, a tuning, a splitter, an insulator, aSYM and/or a pre-match may be dismissed and/or combined to one.Dismissing and/or combining of individual electrical elements mayresults in decreased efficiency of energy transfer to patients bodywithout tuning, higher energy loss because of absence the SYM, pre-matchand/or tuning, malfunctioning of signal adjusting in the circuit andincorrect feedback information without the SWR+Power meter, the splitterand the insulator and/or the treatment device may be dangerous topatient without the filter, the SWR+Power meter, the SYM and/or thetuning element.

Control units CUM A and CUM B may serve as slaves of the master unitwhich may command both control units CUM A and CUM B to discharge theelectrical current to respective magnetic field generating devices (e.g.MFGD A and MFGD B). Therefore, the control of each control unit CUM Aand CUM B is independent. Alternatively, CUM B may be slave of the CUMA, while CUM A itself may be slave of master unit. Therefore, whenmaster unit commands the CUM A to discharge electrical current into themagnetic field generating device (e.g. MFGD A), the CUM A may commandthe CUM B to discharge electrical current to another magnetic fieldgenerating device (e.g. MFGD B) positioned in different applicator. Inanother alternative, additional control unit may be positioned betweenmaster unit and control units CUM A and CUM B, wherein such additionalcontrol unit may provide e.g. timing of discharges. By both theseapproaches, the pulses of magnetic field may be applied synchronously orsimultaneously.

When the treatment device includes more than one magnetic fieldgenerating device and method of treatment include using more than onemagnetic field generating device (e.g., a coil), each coil may beconnected to respective magnetic circuit. However, one coil may beconnected to plurality of magnetic circuits. Also, the power source PSMmay be used for at least two magnetic field generating devices.

The power source, e.g. PSM and/or PSRF may provide an electric energy toat least one or at least one individual electrical element of RFcircuit, magnetic circuit, and/or to other part of the treatment devicee.g. to the master unit, HMI, energy storage device (e.g. ESD A and/orESD B), to control unit (e.g. CUM A and/or CUM B) and/or to the switch(eg. SW A or SW B). The power source may include one or more elementstransforming electric energy from the power network connection PN asillustrated in FIG. 18a . Several individual electrical elements of thepower source, of the RF circuit and/or magnetic circuit may beconstructed as one common electrical element and do not have to beconstructed as individual electrical elements as illustrated in FIG. 18a. Each RF and/or magnetic circuit may have its own power source and/orat least one electrical element of the power source powering just one ofthe RF and/or the magnetic circuit. Also, at least part of one powersource may be powering at least two different circuits before and/orduring at least part of the treatment. The power source may include oneor more parts shared with individual electrical circuits that may be atleast partially electrically isolated from each other.

One or more electrical elements of the power source for RF treatment(e.g. a steady power source of magnetic circuit (SPSM), an auxiliarypower sources APS A and/or APS B, a power pump PP, board power sourceBPS A and/or BPS B) may provide electric energy to individual electricalelements of the RF circuit and/or magnetic circuit directly and/orindirectly. Directly provided electric energy is provided throughconductive connection between two electrical elements wherein no otherelectrical element of the circuit is in serial connection betweendirectly powered electrical elements. Insulating and/or other electricalelements of the circuits such as resistors, insulating capacitors andthe like may be not considered to be an electrical element. Indirectlypowered electrical elements may be powered by one or more other elementsproviding electric energy through any other element that may changeparameters of provide electric energy, such as current value, frequency,phase, amplitude and/or other.

The power source PSM illustrated in FIG. 18a in more detail may includeconnection to a power network PN. The PN may provide filtering and/orother adjustment of an input electric signal from the power network,such as the frequency and current value. The PN may also be used as aninsulating element creating a barrier between the treatment device andthe power network. The PN may include a one or more of capacitors,resistors and/or filters filtering signal returning from the treatmentdevice The PN may include a plug or connection to a plug. The PN may becoupled to a plug or power grid. The PSM may include one or more steadypower source (e.g. steady power source of magnetic circuit SPSM),auxiliary power sources (e.g. APS A and/or APS B), one or more powerpumps PP; and/or one or more board power sources (e.g. BPS A and/or BPSB). As illustrated in FIG. 18a , the treatment device may include atleast two electrically insulated magnetic and/or RF circuits that may becontrolled at least partially independently, e.g. intensity of generatedmagnetic field by the magnetic field generating devices MFGD A and theMFGD B connected to treatment clusters for magnetic treatment HIFEM Aand HIFEM B may be different. Steady power source (SPSM) may providesteady output voltage under different power network conditions. Steadypower source SPSM may be connected to the auxiliary power source (e.g.APS A and/or APS B). Two auxiliary power sources may be combined andcreate one electrical element. Steady output voltage produced by steadypower source and/or by auxiliary power source may be in a range of 1 Vto 1000 V, or 20 V to 140 V, or 50 V to 700 V, or 120 V to 500 V, or 240V to 450 V.

One or more auxiliary power sources may be powering one or more controlunits of the individual circuits. APS may be also powering one or moreboard power source BPS, e.g. BPS A and/or BPS B. APS may be alsopowering master unit HMI and/or other elements of the treatment device.Because of APS, at least one control unit and/or master unit may provideprocessing/adjusting of the electric signal in RF and/or magnet circuitprecisely, independently and/or also individual electrical element ofthe treatment device may be protected from the overload. The board powersource (e.g. element BPS A and/or BPS B) may be used as a source ofelectric energy for at least one element of magnetic circuit (e.g.energy storage device ESD A and/or B). Alternatively, one or moreelements of the power source PSM may be combined and/or dismissed.

The power source may serve as high voltage generator providing voltageto a magnetic circuit and/or RF circuit. The voltage provided by powersource may be in a range from 500 V to 50 kV, or from 700 V to 5 kV, orfrom 700 V to 3 kV, or from 1 kV to 1.8 kV. The power source is able todeliver a sufficient amount of electrical energy to each circuit, suchas to any electrical element (e.g. the energy storage device ESD A) andto the magnetic field generating device (e.g. MFGD A). The magneticfield generating device may repeatedly generate a time-varying magneticfield with parameters sufficient to cause muscle contraction.

According to FIG. 18a , RF circuits have their own power source PSRFthat may be at least partially different from the PSM. The PSRF mayinclude element electrical PNFLT suppressing electromagnetic emissionfrom the internal parts of the PN and/or from the any part of the RFcircuit. Electrical element PNFLT may represent power network filter.However, PNFLT may be also part of the PN. The PSRF may include SPSRFproviding steady output voltage under different power network conditionsto auxiliary power source of a RF circuit APS RF, control unit of the RFcircuit, a power unit PU and/or other electrical elements using directcurrent supply. As further illustrated in FIG. 18a , APS RF may includeits own mechanism transforming alternating current to direct currentindependently to SPSRF. The APS RF may be able to power control unit ofthe treatment cluster for RF treatment RF A and/or master unit whileSPSRF may independently power control unit of the treatment cluster forRF treatment RF B. The power unit PU of the RF circuit may be poweringone or more RF circuits or at least one electrical element of the RFcircuit, such as power amplifiers and/or other electrical elements ofthe treatment cluster for RF treatment RF A and/or treatment cluster forRF treatment RF B creating and/or adjusting high frequency signal.

At least one electrical element described as PSM, PSRF, APS, SPSM and/orSPSRF may be shared by at least one RF circuit and magnetic circuit.

Control units CURF may work as slave of the master unit, which maycommand CURF to provide RF signal through RF circuit to RF electrode. Incase of two control units CURF both control units work as slaves of themaster unit which may command both control units CURF to provide RFsignal to respective RF electrodes. Therefore, the control of eachcontrol unit from possible plurality of CURF is independent.Alternatively, first CURF may be slave of second CURF, while first CURFitself may be slave of master unit. Therefore, when master unit commandsthe first CURF to discharge electrical current into the first RFelectrode, the first CURF may command the second CURF to dischargeelectrical current to second RF electrode positioned in differentapplicator. In another alternative, additional control unit may bepositioned between master unit and plurality of control units CURF,wherein such additional control unit may provide e.g. timing ofdischarges. By both these principles, the pulses of RF field may beapplied continuously or in pulsed manned.

Treatment clusters for magnetic HIFEM A and HIFEM B shown in FIGS. 17,18 a and 18 b may be controlled through one or more sliders or scrollersrelated to HMI parts marked as HIFEM A and HIFEM B 718 shown on FIG. 7.Through related intensity scrollers, intensity bars and/or intensitysliders shown on human machine interface HMI, the user may control oradjust speed of operation of one or more electrical elements oftreatment clusters for magnetic energy HIFEM A and/or HIFEM B.

Also, treatment cluster for RF treatment RF A and treatment cluster forRF treatment RF B shown in FIGS. 17, 18 a and 18 b may be controlledthrough sliders, bars or intensity scrollers related to HMI parts markedas RF A and RF B 712 shown on FIG. 7. Through related intensityscrollers, intensity bars and/or intensity sliders shown on humanmachine interface HMI, the user may control or adjust speed of operationof one or more electrical elements of treatment clusters for RFtreatment RF A and/or RF B. Also, by using the related intensityscrollers, intensity bars and/or intensity sliders the user may controlor adjust speed of electrical signal transmission through or between oneor more electrical elements of treatment clusters for RF treatment RF Aor RF B.

The treatment device may include two or more applicator, each applicatormay include one magnetic field generating device and one or two RFelectrodes. Inductance of first magnetic field generating devicepositioned in first applicator may be identical as inductance of secondmagnetic field generating device positioned in the second applicator.Also, number of turns, winding area and/or area without winding of thefirst magnetic field generating device in the first applicator may beidentical as number of turns, winding area and/or area without windingof the second magnetic field generating device in the second applicator.The first magnetic field generating device in the first applicator mayprovide identical magnetic field as the second magnetic field generatingdevice in the second applicator. The identical magnetic fields providedby plurality of magnetic field generating devices during same or anothertreatment sessions may have same treatment parameters e.g. number ofpulses in train, number of pulses in burst, same amplitude of magneticflux density of impulses, same shape of envelope or other. However,reasonable deviation e.g. from amplitude of magnetic flux density may betolerated in the identical magnetic field. The deviation of amplitudesof magnetic flux density or average magnetic flux density as measured byfluxmeter or oscilloscope may be in the range of 0.1% to 10% or 0.1% to5%.

Alternatively, the inductance of magnetic field generating devices inboth applicator may be different. Also, magnetic fields provided byplurality of magnetic field magnetic devices during the same or anothertreatment sessions may have different treatment parameters.

When the treatment device has two or more applicators, each applicatormay include one magnetic field generating device and one or two RFelectrodes. The size or area of one RF electrode positioned in firstapplicator may be identical to another RF electrode positioned in thesecond applicator. First applicator and second applicator may provideidentical RF fields provided during same or another treatment sessions,wherein identical RF fields may have same treatment parameters e.g.wavelength, phase, time duration and intensity of RF field.

Alternatively, the size of area of RF electrodes in both applicators maybe different. Also, magnetic fields provided by plurality of magneticfield generating devices during the same or another treatment sessionsmay have different treatment parameters.

FIG. 19 shows exemplary composition of magnetic field (e.g. time-varyingmagnetic field) provided by the magnetic field generating device. Also,the FIG. 19 may show also composition of RF field. Therefore, especiallyin description of FIG. 19, the term “impulse” may refer to “magneticimpulse” or “RF impulse”. Similarly, the term “pulse” may refer to“magnetic pulse” or “RF pulse”. Also, term “train” may refer to“magnetic train”. Term “magnetic train” may include train of magneticpulses wherein the train of magnetic pulses may be understood asplurality of magnetic subsequent pulses wherein one pulse followsanother. As the magnetic pulse may include one magnetic impulse, theterm “magnetic train” may include also train of magnetic impulses. Theterm “burst” may refer to “magnetic burst”.

As shown in FIG. 19, an impulse may refer to a time period of appliedtreatment energy (e.g. magnetic field) with sufficient intensity tocause at least partial treatment effect, such as an at least partialmuscle contraction, muscle contraction, change of temperature of thebiological structure and/or nerve stimulation. The magnetic impulse mayinclude one biphasic shape as shown on FIG. 19. The magnetic impulse mayinclude amplitude of magnetic flux density.

A magnetic pulse may refer to a time period including impulse andpassive time period of the pulse. The magnetic pulse may refer to a timeperiod of one magnetic impulse and passive time period, i.e. timeduration between two impulses from rise/fall edge to subsequent offollowing rise/fall edge. The passive time duration of a pulse mayinclude either applying no treatment energy to the patient's body and/orapplication of the treatment energy insufficient to cause at least apartial treatment effect due to insufficient treatment energy intensity(e.g. magnetic flux density) and/or frequency of delivered treatmentenergy. Such time period may be called pulse duration. As shown on FIG.19, each pulse may include one biphasic shape lasting for a time periodcalled an impulse duration. Alternatively, the impulses or pulses may bemonophasic.

As further shown on FIG. 19, the plurality of pulses may form the train.The train may refer to a plurality of pulses, wherein one train maycomprise at least two pulses wherein pulses follow one by another. Trainmay last time period lasting T₁ shown in FIG. 19.

The magnetic train may include plurality of magnetic pulses in the rangeof 2 magnetic pulses to 200 000 magnetic pulses or 2 magnetic pulses to150 000 magnetic pulses or 2 magnetic pulses to 100 000 magnetic pulses.Magnetic train may cause multiple at least partial muscle contractionsor muscle contractions followed one by one, at least one incompletetetanus muscle contraction, at least one supramaximal contraction or atleast one complete tetanus muscle contraction. During application of onetrain, magnetic field may provide one muscle contraction followed bymuscle relaxation. The muscle relaxation may be followed by anothermuscle contraction during the application of one train. During onetrain, the muscle work cycle (which may include muscle contractionfollowed by muscle relaxation) may be repeated at least twice, three,four or more times.

The burst may refer to one train provided during time period T₁ and atime period T₂ which may represent a time period when no treatmenteffect is caused. The time period T₂ may be a time period providingpassive treatment where no treatment energy is applied to a patient'sbody and/or applied treatment energy is insufficient to cause thetreatment effect. The time period T₃ shown in FIG. 19 may represent thetime duration of the burst.

The magnetic train of a time-varying magnetic field may be followed by astatic magnetic field and/or the magnetic train may be followed by atime-varying magnetic field of frequency and/or magnetic flux densityinsufficient to cause at least a partial muscle contraction or musclecontraction. For example, the burst may provide at least one at leastpartial muscle contraction followed by no muscle contraction. In anotherexample, the burst may provide at least one muscle contraction followedby no muscle contraction. The treatment may include a number of magneticbursts in a range of 15 to 25,000, or in a range of 40 to 10,000, or ina range of 75 to 2,500, or in a range of 150 to 1,500, or in a range of300 to 750 or up 100,000. The repetition rate in the subsequent burstsmay incrementally increase/decrease with an increment of 1 to 200 Hz, orof 2 to 20 Hz, or of 5 Hz to 15 Hz, or more than 5 Hz. Alternatively,the amplitude of magnetic flux density may vary in the subsequentbursts, such as incrementally increase/decrease with an increment of atleast 1%, 2%, or 5% or more of the previous pulse frequency. Duringapplication of one burst, magnetic field may provide one musclecontraction followed by muscle relaxation. The muscle relaxation may befollowed by another muscle contraction during the application of sameburst. During one burst, the muscle work cycle (which may include musclecontraction followed by muscle relaxation) may be repeated at leasttwice, three, four or more times.

Also, a treatment duty cycle may be associated with an application of apulsed treatment energy of the magnetic field as illustrated in FIG. 19.The treatment duty cycle may refer to a ratio between time of activetreatment T₁ and sum of time of an active and a passive treatment duringone cycle T₃.

An exemplary treatment duty cycle is illustrated in FIG. 19. Duty cycleof 10% means that T₁ of active treatment last 2 s and passive treatmentT₂ last 18 s. In this exemplary treatment the period including activeand passive treatment period T₃ lasts 20 seconds. The treatment dutycycle may be defined as a ratio between T₁ and T₃. The treatment dutycycle may be in a range from 1:100 (which means 1%) to 24:25 (whichmeans 96%) or 1:50 (which means 2%) to 4:6 (which means 67%) or 1:50(which means 2%) to 1:2 (which means 50%) or 1:50 to 1:3 (which means33%) or 1:50 (which means 2%) to 1:4 (which means 25%) or 1:20 (whichmeans 5%) to 1:8 (which means 12.5%) or 1:100 (which means 1%) to 1:8(which means 12.5%) or at least 1:4 (which means at least 25%).

An exemplary application of a burst repetition rate of 4 Hz may be thetime-varying magnetic field applied to the patient with a repetitionrate of 200 Hz and with a treatment duty cycle of 50% in trains lasting125 ms, i.e. each train includes 25 pulses. An alternative exemplaryapplication of a burst repetition rate of 6 bursts per minute may be thetime-varying magnetic field applied to the patient with a repetitionrate of 1 Hz and with a treatment duty cycle of 30% in trains lasting 3s; i.e., each train includes 3 pulses.

The FIG. 19 may also show exemplary composition of magnetic componentprovided by the RF electrode.

When the treatment device uses plurality of applicators (e.g. two), eachapplicator may include one magnetic field generating device. As eachmagnetic field generating device may provide one respective magneticfield, the plurality of applicators may provide different magneticfields. In that case the amplitude of magnetic flux density of magneticimpulses or pulses may be same or different, as specified by userthrough HMI and/or by one or more control units.

The impulses of one magnetic field provided by one magnetic fieldgenerating device (e.g. magnetic coil) may be generated and appliedsynchronously as the impulses of another magnetic field provided byanother magnetic field generating device. During treatment session withthe treatment device including two magnetic field generating device, theimpulses of one magnetic field provided by one magnetic field generatingdevice may be generated synchronously with the impulses of secondmagnetic field provided by second magnetic field generating device.Synchronous generation may include simultaneous generation.

The synchronous generation of magnetic impulses may be provided bysynchronous operation of switches, energy storage devices, magneticfield generating devices and/or other electrical elements of theplurality of magnetic treatment circuit. However, the synchronousoperation of electrical elements of magnetic treatment circuit may becommanded, adjusted or controlled by user through HMI, master unitand/or more control unit.

The FIG. 27a shows simultaneous type of synchronous generation ofmagnetic impulses on two exemplary magnetic field generating devices.The magnetic field generating device A (MFGD A) may generate firstmagnetic field including plurality of biphasic magnetic impulses 271 a.The magnetic field generating device B (MFGD B) may generate secondmagnetic field including plurality of magnetic impulses 271 b. Themagnetic impulses of both magnetic fields are generated during theimpulse duration 272 of the magnetic impulses 271 a of the firstmagnetic field. Also, the impulse of both magnetic fields are generatedwithin the pulse duration 273 of the first magnetic field. Simultaneousgeneration of magnetic field means that the magnetic impulse 271 a ofthe first time-varying magnetic field is generated at the same the timeas the magnetic impulse 271 b of the second time-varying magnetic field.

The synchronous generation of magnetic fields may include generating afirst pulse of the first time-varying magnetic field such that the firstpulse lasts for a time period, wherein the time period lasts from abeginning of a first impulse of the first time-varying magnetic field toa beginning of a next consecutive impulse of the first time-varyingmagnetic field and generating a second pulse of the second time-varyingmagnetic field by the second magnetic field generating device such thatthe second pulse lasts from a beginning of a first impulse of the secondtime-varying magnetic field to a beginning of a next consecutive impulseof the second time-varying magnetic field. Synchronous generation ofmagnetic field means that the first impulse of the second time-varyingmagnetic field is generated during the time period of the first pulse.

FIG. 27b shows an example of synchronous generation of magneticimpulses. The magnetic field generating device A (MFGD A) may generatefirst magnetic field including plurality of biphasic magnetic impulses271 a. The magnetic field generating device B (MFGD B) may generatesecond magnetic field including plurality of magnetic impulses 271 b.The magnetic impulses 271 b of second magnetic field may be generatedduring the pulse duration 273 of pulse of the first magnetic field, butoutside of impulse duration 272 of impulse of first magnetic field.

FIG. 27c shows another example of synchronous generation of magneticimpulses. The magnetic field generating device A (MFGD A) may generatefirst magnetic field including plurality of biphasic magnetic impulses271 a. The magnetic field generating device B (MFGD B) may generatesecond magnetic field including plurality of magnetic impulses 271 b.The magnetic impulse 271 b of second magnetic field may be generatedduring the pulse duration 273 of pulse of the first magnetic field.Also, the magnetic impulse 271 b of second magnetic field may begenerated during the impulse duration 272 of pulse of the first magneticfield. The beginning of the magnetic impulse 271 b of second magneticfield may be distanced from the beginning of the impulse 271 a of thefirst magnetic field by a time period called impulse shift 274. Theimpulse shift may be in a range of 5 l to 10 ms or 5 μs to 1000 μs or 1μs to 800 μs.

FIG. 27d shows still another example of synchronous generation ofmagnetic impulses. The magnetic field generating device A (MFGD A) maygenerate first magnetic field including plurality of biphasic magneticimpulses 271 a. The magnetic field generating device B (MFGD B) maygenerate second magnetic field including plurality of magnetic impulses271 b. The magnetic impulse 271 b of second magnetic field may begenerated within the pulse duration 273 of the pulse of the firstmagnetic field. The magnetic impulse 271 b of second magnetic field maybe generated outside of impulse duration 272 of the impulse of the firstmagnetic field. The beginning of the magnetic impulse 271 b of secondmagnetic field may be distanced from the end of the magnetic impulse 271a of the first magnetic field by a time period called impulse distanceperiod 275. The impulse distance period may last in a range of 5 l to 10ms or 5 μs to 1000 μs or 1 μs to 800 μs.

Beside synchronous generation, the magnetic impulses of plurality ofmagnetic fields may be generated separately. Separated generation ofmagnetic impulses of magnetic fields may include generation of impulsesof one magnetic field are generated outside of pulse duration of anothermagnetic field.

FIG. 27e shows example of separate generation of magnetic impulses. Themagnetic field generating device A may generate first magnetic fieldincluding train of biphasic magnetic impulses 271 a having impulseduration 272 a. Each magnetic impulse 271 a is part of a pulse havingpulse duration 273 a. The impulse duration 272 a of first magnetic fieldmay be part of pulse duration 273 a of first magnetic field. The trainof first magnetic field may have train duration 276 a. The magneticfield generating device B may generate another magnetic field includinganother train of plurality of magnetic impulses 271 b having impulseduration 272 b. Each magnetic impulse 271 b is part of a pulse havingpulse duration 273 b. The impulse duration 272 b of second magneticfield may be part of pulse duration 273 b of second magnetic field. Thetrain of second magnetic field may have train duration 276 b. The trainhaving train duration 276 a is generated by magnetic field generatingdevice A in different time than train having train duration 276 bgenerated by magnetic field generating device B. Both train may beseparated by separation period 277 may be in the range of 1 ms to 30 s.During separation period 277, no magnetic field generating device may beactive meaning that the energy storage device providing current pulsesmay not store any energy.

All examples of synchronous or separated generation of magnetic impulsesmay be applied during one treatment session. Also, the impulse shiftand/or impulse distance period may be calculated for any magneticimpulse 271 b of second or another magnetic field, which may bepositioned according to any example given by FIGS. 27B-27E. The impulseshift and/or impulse distance period may be measured and calculated fromoscilloscope measurement. The synchronous generation of magneticimpulses may lead and be extrapolated to synchronous generation ofmagnetic pulses and/or trains by two or more magnetic field generatingdevices. Similarly, the separated generation of magnetic impulses maylead and be extrapolated to synchronous generation of magnetic pulsesand/or trains by two or more magnetic field generating devices.

The adjustment or control provided by master unit and/or one or morecontrol units may be used for creation or shaping of magnetic envelopeor RF envelope. For example, the magnetic impulses or RF impulses may bemodulated in amplitude of each impulse or plurality of impulses toenable assembly of various envelopes. Similarly, the amplitude of RFenergy may be modulated in amplitude to assemble various envelopes. Themaster unit and/or one or more control units may be configured toprovide the assembly of one or more envelopes described herein.Differently shaped magnetic envelopes and/or RF envelopes (referredherein also as envelopes) may be differently perceived by the patient.The envelope or all envelopes as shown on Figures of this applicationmay be fitted curve through amplitude of magnetic flux density ofimpulses, pulses or trains and/or amplitudes of power output of RFimpulses of RF waves.

The envelope may be a magnetic envelope formed from magnetic impulses.The magnetic envelope formed from impulses may include plurality ofimpulses, e.g. at least two, three, four or more subsequent magneticimpulses. The subsequent magnetic impulses of such magnetic envelope mayfollow each other. In case of such envelope, the envelope duration maybegin by first impulse and end with the last impulse of the plurality ofimpulses. The envelope may include one train of magnetic impulses. Theenvelope may be a fitted curve through amplitudes of magnetic fluxdensity of impulses. The envelope formed by magnetic impulses maytherefore define train shape according to modulation in magnetic fluxdensity, repetition rate and/or impulse duration of magnetic impulses.Accordingly, the envelope may be an RF envelope formed by RF impulsesand their modulation of envelope, repetition rate or impulse duration ofRF impulse of RF wave.

The envelope may be a magnetic envelope formed by magnetic pulses. Themagnetic envelope formed by pulses may include plurality of pulses (e.g.at least two, three, four or more subsequent magnetic pulses), whereinpulses follow each other without any missing pulse. In such case, theenvelope duration may begin by impulse of first pulse and end with apassive time duration of last impulse of the plurality of pulses. Theenvelope formed by magnetic pulses may therefore define train shape inaccording to modulation in magnetic flux density, repetition rate and/orimpulse duration. The envelope may include one train of magnetic pulses.The train consists of magnetic pulses in a pattern that repeats at leasttwo times during the protocol. The magnetic envelope may be a fittedcurve through amplitudes of magnetic flux density of pulses.

The envelope may be a magnetic envelope formed from magnetic trains. Themagnetic envelope formed from trains may include plurality of trains(e.g. at least two, three, four or more subsequent magnetic trains),wherein trains follow each other with time duration between the train.In such case, the envelope duration may begin by impulse of first pulseof the first train and end with a passive time duration of the pluralityof pulses. The plurality of trains in one envelope may be separated bymissing pulses including impulses. The number of missing pulses may bein a range of 1 to 20 or 1 to 10.

The envelope may be modulated on various offset values of magnetic fluxdensity. The offset value may be in the range of 0.01 T to 1 Tor 0.1 to1 Tor 0.2 to 0.9 T. The offset value may correspond to non-zero value ofmagnetic flux density.

During one treatment session, treatment device may apply various numberof envelopes. Two or more envelopes of magnetic field may be combined tocreate possible resulting shape.

In examples mentioned above, the envelope may begin by first impulse.Further, the envelope continue through duration of first respectivepulse including first impulse. Further, the envelope may end with apassive time duration of last pulse, wherein the last pulse may followthe first pulse. This option is shown on following figures showingexemplary shapes of envelope of magnetic pulses. As shown on followingfigures, the shape of envelope may be provided by modulation of magneticflux density. The shape of RF envelope may be provided by modulation ofamplitude of power or impulses of RF waves.

FIG. 28 is an exemplary illustration of an increasing envelope 281formed from magnetic impulses 282, wherein one magnetic impulse 282 isfollowed by one passive time period of the magnetic pulse. Amplitude ofmagnetic flux density of subsequent impulses in the increasing envelopeis increasing. The amplitude of magnetic flux density of one impulse ishigher than amplitude of magnetic flux density of preceding impulse.Similarly, the amplitude of magnetic flux density of second impulse ishigher than amplitude of magnetic flux density of the first impulse. Theincreasing amplitude may be used for muscle preparation. The envelopeduration 283 of the increasing envelope 281 begins from first impulse ofthe first pulse to end of the passive time duration of last pulse.Similarly, the amplitude of RF waves may be modulated in amplitude toassemble increasing envelope 281.

FIG. 29 is an exemplary illustration of a decreasing envelope 291 formedfrom magnetic impulses 292. Amplitude of magnetic flux density ofsubsequent impulses in the decreasing envelope is decreasing. Theamplitude of magnetic flux density of one impulse is lower thanamplitude of magnetic flux density of preceding impulse. Similarly, theamplitude of magnetic flux density of second impulse is lower thanamplitude of magnetic flux density of the first impulse. The envelopeduration 293 of the decreasing envelope 291 begins from first impulse ofthe first pulse to end of the passive time duration of last pulse.Similarly, the amplitude of RF waves may be modulated in amplitude toassemble decreasing envelope 291.

FIG. 30 is an exemplary illustration of a rectangular envelope 302formed from magnetic impulses 303. Amplitude of magnetic flux density ofimpulses in the rectangular envelope may be constant. However, theamplitude of magnetic flux density of subsequent impulses may oscillatearound predetermined value of amplitude of magnetic flux density inrange of 0.01% to 5%. The amplitude of magnetic flux density of firstimpulse may be identical as the amplitude of magnetic flux density ofthe second impulse, wherein the second impulse follows the firstimpulse. The envelope duration 304 of the rectangular envelope 302begins from first impulse of the first pulse to end of the passive timeduration of last pulse. The rectangular envelope may be used forinducing of muscle contraction or muscle twitches. Similarly, theamplitude of RF waves may be modulated in amplitude to assemblerectangular envelope 302.

FIG. 31 is an exemplary illustration of a combined envelope 311, whichmay be hypothetically seen as combination of increasing envelope andrectangular envelope. Combined envelope 311 includes magnetic impulses312. Amplitude of magnetic flux density of impulses in the combinedenvelope may be increasing for in a range of 1% to 95% or 5% to 90% or10% to 80% of the time duration of the whole combined envelope. Theamplitude of magnetic flux density of subsequent impulses in therectangular part of the combined envelope may oscillate aroundpredetermined value of amplitude of magnetic flux density in range of0.01% to 5%. The envelope duration 313 of the combined envelope 311begins from first impulse of the first pulse to end of the passive timeduration of last pulse. The combined envelope as shown on FIG. 31 may beused for preparation of muscle and inducing of muscle contraction ormuscle twitches. Similarly, the amplitude of RF waves may be modulatedin amplitude to assemble envelope 311.

FIG. 32 is an exemplary illustration of a combined envelope 321, whichmay be hypothetically seen as combination of rectangular envelope anddecreasing envelope. Combined envelope 321 includes magnetic impulses322. Amplitude of magnetic flux density of impulses in the combinedenvelope may be decreasing for in a range of 1% to 95% or 5% to 90% or10% to 80% of the time duration of the whole combined envelope. Theamplitude of magnetic flux density of subsequent impulses in therectangular part of the combined envelope may oscillate aroundpredetermined value of amplitude of magnetic flux density in range of0.01% to 5%. The envelope duration 323 of the combined envelope 321begins from first impulse of the first pulse to end of the passive timeduration of last pulse. The combined envelope as shown on FIG. 32 may beused for inducing of muscle contraction or muscle twitches andsubsequent end of the muscle stimulation. Similarly, the amplitude of RFwaves may be modulated in amplitude to assemble combined envelope 321.

FIG. 33 is an exemplary illustration of triangular envelope 331, whichcan be understood as a combination of the increasing envelopeimmediately followed by the decreasing envelope. Triangular envelope 331may include magnetic impulses 332. The triangular shape of the envelopemay not be symmetrical. Also, the straightness of one or more lines ofthe triangular shape may be interrupted by another type of envelopementioned herein, e.g. rectangular envelope. One triangular envelope mayclosely follow another triangular envelope or be joined to anothertriangular envelope. By joining two triangular envelopes, the resultingenvelope may have the saw-tooth shape. The envelope duration 333 of thetriangular envelope 331 begins from first impulse of the first pulse toend of the passive time duration of last pulse. Similarly, the amplitudeof RF waves may be modulated in amplitude to assemble triangularenvelope 331.

FIG. 34 is an exemplary illustration of a trapezoidal envelope 341. Thetrapezoidal envelope 341 may include magnetic impulses 342. Thetrapezoidal envelope may include increasing (rising) time period T_(R),hold time period T_(H) and decreasing (fall) time period T_(F). Duringincreasing time period, the amplitude of magnetic flux density ofsubsequent impulses is increasing. Further, during increasing timeperiod the amplitude of magnetic flux density of one impulse is higherthan amplitude of magnetic flux density of preceding impulse. Duringhold time period, the amplitude of magnetic flux density of subsequentimpulses may oscillate around predetermined value of amplitude ofmagnetic flux density in range of 0.01% to 5%. During decreasing timeperiod, the amplitude of magnetic flux density of subsequent impulses isdecreasing. Further, during decreasing time period the amplitude ofmagnetic flux density of one impulse is lower than amplitude of magneticflux density of preceding impulse. Hold period may be interrupted byanother hold time period of having different predetermined value of themagnetic flux density. The envelope duration 343 of the trapezoidalenvelope 341 begins from first impulse of the first pulse to end of thepassive time duration of last pulse. Similarly, the amplitude of RFwaves may be modulated in amplitude to assemble trapezoidal envelope341.

A trapezoidal envelope may be perceived by the patient as the mostcomfortable for muscle tissue stimulation. Trapezoidal envelope respectsnatural course of muscle contraction, i.e. the muscle contraction may betime-varying. Strength of natural muscle contraction increases, holds atthe highest strength and decreases. The trapezoidal envelope correspondswith natural muscle contraction, i.e. the strength of the musclecontraction may correspond with the magnetic flux density. The magneticflux density during the duration of the trapezoidal envelope increases,holds and decreases. Same shape of envelope may have RF electrode formedfrom RF impulses having appropriate amplitude.

The trapezoidal envelope may be at least once interrupted by one or moreimpulses, pulses, bursts and/or trains that do not fit to thetrapezoidal envelope shape, but after this interruption the trapezoidalenvelope may continue.

Also, the trapezoidal envelope may include plurality of trains, e.g.two, three four or more trains. In case of trapezoidal shape, theenvelope may include three trains. The first train may include impulseswith increasing magnetic flux density. Magnetic flux density of oneimpulse may be higher than magnetic flux density of the second impulsefollowing the first impulse. The second train may include impulses withconstant magnetic flux density. However, the operation of the treatmentdevice may not provide strictly constant magnetic flux density for eachimpulse, therefore the magnetic flux density may oscillate in range of0.1 to 5%. The third train may include impulses with decreasing magneticflux density. Magnetic flux density of one impulse may be lower thanmagnetic flux density of the second impulse following the first impulse.

Furthermore. trapezoidal envelope may include plurality of bursts, e.g.two, three four or more bursts. In case of trapezoidal shape, theenvelope may include three bursts. The first burst may include impulseswith increasing magnetic flux density. Magnetic flux density of oneimpulse may be higher than magnetic flux density of the second impulsefollowing the first impulse. The second bursts may include impulses withconstant magnetic flux density. However, the operation of the treatmentdevice may not provide strictly constant magnetic flux density for eachimpulse, therefore the magnetic flux density may oscillate in range of0.1 to 5%. The third bursts may include impulses with decreasingmagnetic flux density. Magnetic flux density of one impulse may be lowerthan magnetic flux density of the second impulse following the firstimpulse.

FIG. 20 illustrates another exemplary trapezoidal envelope. The verticalaxis may represent magnetic flux density, and the horizontal axis mayrepresent time. A trapezoidal envelope may be a fitted curve throughamplitudes of magnetic flux density of impulses applied during a train,where T_(R) is time period with increasing magnetic flux density calledincreasing transient time, i.e. the amplitude of the magnetic fluxdensity may increase. T_(H) is time period with maximal magnetic fluxdensity, i.e. the amplitude of the magnetic flux density may beconstant. T_(F) is time period with decreasing magnetic flux density,i.e. the amplitude of the magnetic flux density may decrease. A sum ofT_(R), T_(H) and T_(F) may be trapezoidal envelope duration that maycorresponds with muscle contraction.

The trapezoidal envelope may decrease energy consumption. Due to lowerenergy consumption, the trapezoidal shape may enable improved cooling ofthe magnetic field generating device. Further, the resistive losses maybe reduced due to lower temperature of the magnetic field generatingdevice. Different repetition rates may cause different types of musclecontractions. Each type of muscle contraction may consume differentamounts of energy.

FIG. 35 is an exemplary illustration of a trapezoidal envelope 351including an increasing time period T₁, a first decreasing time periodT₂ and a second decreasing time period T₃. The trapezoidal envelope 351includes magnetic impulses 352. Increasing time period includes impulseswith increasing amplitude of magnetic flux density. First decreasingtime period and second decreasing time period includes impulses withdecreasing amplitude of the magnetic flux density. On the shown example,first decreasing time period follows the increasing time period andprecedes the second decreasing time period. The amplitude of magneticflux density of subsequent impulses is shown to decrease more steeplyduring the second decreasing time period. Alternatively, the amplitudeof magnetic flux density of subsequent impulses may decrease moresteeply during the first decreasing time period. The envelope duration353 of the trapezoidal envelope 351 begins from first impulse of thefirst pulse to end of the passive time duration of last pulse.Accordingly, the envelope may be a magnetic envelopes formed from RFimpulses. Similarly, the amplitude of RF waves may be modulated inamplitude to assemble trapezoidal envelope 351.

FIG. 36 is an exemplary illustration of a trapezoidal envelope 361including a first increasing time period, a second increasing timeperiod and a decreasing time period. The trapezoidal envelope 361includes magnetic impulses 362. First increasing time period and secondincreasing time period include impulses with increasing amplitude ofmagnetic flux density. First increasing time period and secondincreasing time period include impulses with increasing amplitude of themagnetic flux density. On the shown example, second increasing timeperiod follows the first increasing time period and precedes thedecreasing time period. The amplitude of magnetic flux density ofsubsequent impulses is shown to increase more steeply during the firstincreasing time period. Alternatively, the amplitude of magnetic fluxdensity of subsequent impulses may increase more steeply during thesecond increasing time period. The envelope duration 363 of thetrapezoidal envelope 361 begins from first impulse of the first pulse toend of the passive time duration of last pulse. Similarly, the amplitudeof RF waves may be modulated in amplitude to assemble trapezoidalenvelope 361.

FIG. 37 is an exemplary illustration of a step envelope 371 including afirst increasing time period T₁, first hold time period T₂, secondincreasing time period, second hold time period and a decreasing timeperiod. The step envelope 371 includes magnetic impulses 372. Duringfirst and second increasing time periods the amplitude of magnetic fluxdensity of subsequent impulses may increase. During decreasing timeperiod the amplitude of magnetic flux density of subsequent impulses maydecrease. During hold time period the amplitude of magnetic flux densityof subsequent impulses may be constant or may oscillate aroundpredetermined value of amplitude of magnetic flux density in range of0.01% to 5%. The envelope duration 373 of the step envelope 371 beginsfrom first impulse of the first pulse to end of the passive timeduration of last pulse. Similarly, the amplitude of RF waves may bemodulated in amplitude to assemble step envelope 371.

FIG. 38 is an exemplary illustration of a step envelope 381 including afirst increasing time period T₁, first hold time period T₂, firstdecreasing time period T₃, second hold time period T₄ and a seconddecreasing time period T₅. The step envelope 381 includes magneticimpulses 382. During increasing time period the amplitude of magneticflux density of subsequent impulses may increase. During first andsecond decreasing time periods the amplitude of magnetic flux density ofsubsequent impulses may decrease. During hold time period the amplitudeof magnetic flux density of subsequent impulses may be constant or mayoscillate around predetermined value of amplitude of magnetic fluxdensity in range of 0.01% to 5%. The envelope duration 383 of the stepenvelope 381 begins from first impulse of the first pulse to end of thepassive time duration of last pulse. Similarly, the amplitude of RFwaves may be modulated in amplitude to assemble envelope 381.

FIG. 39 is an exemplary illustration of another type of trapezoidalenvelope 391 including magnetic impulses 392. The trapezoidal envelopemay include increasing time period T₁, hold time period T₂ anddecreasing time period T₃. During increasing time period, the amplitudeof magnetic flux density of subsequent impulses is increasing. Further,during increasing time period the amplitude of magnetic flux density ofone impulse is higher than amplitude of magnetic flux density ofpreceding impulse. During hold time period, the amplitude of magneticflux density of subsequent impulses may oscillate around predeterminedvalue of amplitude of magnetic flux density in range of 0.01% to 5%.During decreasing time period, the amplitude of magnetic flux density ofsubsequent impulses is decreasing. Further, during decreasing timeperiod the amplitude of magnetic flux density of one impulse is lowerthan amplitude of magnetic flux density of preceding impulse. Holdperiod may include another hold time period T₄ of having differentpredetermined value of the magnetic flux density. The envelope duration393 of the envelope 391 begins from first impulse of the first pulse toend of the passive time duration of last pulse. Similarly, the amplitudeof RF waves and/or RF impulses may be modulated in amplitude to assembleenvelope 391.

The envelope may include combined modulation of magnetic flux densityand repetition rate. FIG. 40 shows exemplary illustration of rectangularenvelope 401 with constant amplitude of magnetic flux density. Therectangular envelope 401 may include magnetic impulses 402. Time periodsT_(RR2) and T_(RR3) shows impulses having higher repetition frequencythan rest of the magnetic impulses during T_(RR1) of shown rectangularenvelope. Shown time periods T_(RR2) and T_(RR3) may provide strongermuscle contraction than the rest of the shown rectangular envelope.However, all shown envelopes may include modulation in repetition ratedomain. The envelope duration 403 of the rectangular envelope 401 beginsfrom first impulse of the first pulse to end of the passive timeduration of last pulse. Accordingly, the envelope may be a magneticenvelopes formed from RF impulses. Their amplitude may also form anamplitude, called RF envelope. Similarly, the amplitude and/orrepetition rate of RF impulses may be modulated in amplitude to assembleenvelopes 401.

As mentioned, the envelope may be formed from magnetic trains separatedby one or more missing pulses. FIG. 41 shows the envelope formed frommagnetic trains including magnetic impulses 412. As shown, first trainincluding train of impulses with increasing magnetic flux density hasduration T₁. Second train of including impulses with constant oroscillating magnetic flux density has duration T₂. Third train ofincluding impulses with decreasing magnetic flux density has durationT₃. The envelope 411 including plurality of trains has trapezoidalshape. The time durations between durations T₁ and T₂ or durations T₂and T₃ may represent time gaps where the missing pulses includingmissing impulses would be positioned. The envelope duration 413 of theenvelope 411 begins from first impulse of the first pulse to end of thepassive time duration of last pulse. Similarly, the amplitude of RFwaves or RF impulses may be modulated in amplitude to assemble envelopes411.

During treatment, the magnetic envelopes may be combined. FIG. 42 showsan example of combination of magnetic envelopes. The increasing envelope422 having increasing shape includes train of magnetic impulses 421. Theincreasing envelope 422 may have duration TEL The rectangular envelope423 includes train of magnetic impulses 421. The rectangular envelopemay have duration T_(E2). The decreasing envelope 424 includes train ofmagnetic impulses 421. The decreasing envelope 424 may have durationT_(E3). A resulting subperiod of treatment protocol formed bycombination of the first, second and third envelope, may provide same orsimilar treatment effect as trapezoidal envelope shown e.g. on FIG. 34and FIG. 20. A resulting subperiod of treatment protocol has duration425 from first impulse of the first pulse to end of the passive timeduration of last pulse of the treatment subperiod. Similarly, theamplitude of RF waves and/or RF impulses may be modulated in amplitudeto assemble combination of envelopes.

FIG. 43 illustrates another example of combination of magneticenvelopes, wherein the decreasing period has different magnetic fluxdensity than rectangular envelope. This example may illustrate, thatcombination of magnetic envelopes may include envelopes with differentmagnetic flux density. The increasing envelope 432 having increasingshape includes train of magnetic impulses 431. The increasing envelopemay have duration TEL The rectangular envelope 433 includes train ofmagnetic impulses 431. The rectangular envelope may have durationT_(E2). The decreasing envelope includes train of magnetic impulses 431.The decreasing envelope 434 may have duration T_(E3). A resultingsubperiod of treatment protocol formed by combination of the first,second and third envelope, may provide same or similar treatment effectas trapezoidal envelope shown e.g. on FIGS. 34 and 20. A resultingsubperiod of treatment protocol has duration 435 from first impulse ofthe first pulse to end of the passive time duration of last pulse of thetreatment subperiod. Similarly, the amplitude of RF waves or RF impulsesmay be modulated in amplitude to assemble combination of envelopes.

FIG. 44 two exemplary envelopes of magnetic field with an example ofinter-envelope period i.e. time period between envelopes. Time periodbetween envelopes may include time of no magnetic stimulation. However,the time period between envelopes may include magnetic impulsesproviding insufficient or unrecognizable muscle stimulation (includinge.g. muscle contraction and muscle relaxation). The magnetic impulsesgenerated during time period between envelopes may also form envelope.The magnetic impulses providing insufficient or unrecognizable musclestimulation may be generated by discharging of energy storage device tomagnetic field generating coil in order to discharge the restingcapacity. The energy storage device may be then charged by power sourceto higher amount of electrical current and/or voltage in order toprovide high power current impulses to magnetic field generating device.Rectangular envelope 442 having duration T₁ may include magneticimpulses 441. Trapezoidal envelope 444 having duration T₂ may includemagnetic impulses 441. The inter-envelope time period having durationT_(EP) may include envelope 443 (e.g. having decreasing shape) given bymagnetic flux density of magnetic impulses 441 within the inter-envelopetime period. Alternatively, the inter-envelope time period may includesingle impulses providing muscle twitches. Accordingly, the envelope maybe a magnetic envelopes formed from RF impulses. Their amplitude mayalso form an amplitude, called RF envelope. The time period between RFenvelopes may include time of no heating.

The RF treatment (RF field) may be generated by treatment energy source(e.g. RF electrode) in continual operation, pulsed operation oroperation including cycles. The continual operation is provided duringcontinual RF treatment. The pulsed operation is provided during pulsedRF treatment.

During the continual operation, RF electrode may generate RF field forthe whole treatment or in one time duration during the treatment, ascommanded by master unit one or more control units. The RF electrode maygenerate RF wave having a sine shape. In other words, the RF electrodemay generate radio frequency waveform having sine shape. Other shapesare possible, e.g. sawtooth, triangle or square according to amplitudesof RF wave.

The continual RF treatment may have one of the highest synergic effectswith provided magnetic treatment due to continual heating of thepatient's target biological structures, highest effect to polarizationof the patient's target biological structures and to ensure deepmagnetic field penetration and high effect of generated magnetic fieldto a patient's tissue, such as to promote muscle contraction.

During the pulsed generation the RF electrode may generate RF field fortwo or more active time periods of the treatment, wherein the timeperiods may be separated by passive time periods. Active time period ofpulsed RF treatment may represent the time period during which the RFelectrode is active and generates RF field. The active time period maybe in the range of 1 s to 15 minutes or 30 s to 10 minutes or 5 s to 900s or 30 s to 300 s or 60 s to 360 s. The passive time period of RFpulsed treatment may represent the time period during which the RFelectrode is inactive and does not generate RF field. The passive timeperiod of RF pulsed treatment may be in the range of 1 s to 15 minutesor 10 s to 10 minutes or 5 s to 600 s or 5 s to 300 s or from 10 s to180 s. Pulsed generation and its parameters may vary during thetreatment.

The user may select, control or adjust various treatment protocols ofthe treatment device through the control unit or the master unit of thetreatment device. Also, the master unit and/or control unit may select,control or adjust treatment protocols body area or another optionselected by the user. In addition, the master unit and/or control unitmay select, control or adjust treatment various treatment parametersaccording to feedback provided by any sensor mentioned above.

The treatment protocol may include a selection of one or more treatmentparameters and their predetermined values as assigned to respectiveprotocol. Further, the treatment protocol may include various types ofcombined treatment by magnetic treatment and RF treatment.

Regarding the treatment parameters, the user may control or adjustvarious treatment parameters of the treatment device through the controlsystem including master unit or one or more control units of thetreatment device. The master unit and/or control unit may control oradjust treatment parameters according to treatment protocol, body areaor another option selected by the user. In addition, the master unitand/or control unit may control or adjust treatment various treatmentparameters according to feedback provided by any sensor mentioned above.The master unit or one or more control unit may provide adjustment oftreatment parameters of magnetic field including magnetic flux density,amplitude of magnetic flux density, impulse duration, pulse duration,repetition rate of impulses, repetition rate of pulses, train duration,number of impulses and/or pulses in train, burst duration, compositionof magnetic burst, composition of magnetic train, number of envelopes,duty cycle, shape of envelopes and/or maximal of the magnetic fluxdensity derivative. The master unit or one or more control unit mayprovide adjustment of treatment parameters of RF field includingfrequency of RF field, duty cycle of RF field, intensity of RF field,energy flux provided by RF field, power of RF field, amplitude of powerof RF field and/or amplitude of power of RF waves, wherein the RF wavesmay refer to electrical component of RF field. Treatment parameters maybe controlled or adjusted in following ranges.

In addition, treatment parameters may include, for example, thetreatment time, temperature of magnetic field generating device,temperature of RF electrode, temperature of the applicator, temperatureof the cooling tank, selection of targeted body area, number ofconnected applicator, temperature of cooling fluid (as measured in afluid conduit, connecting tube, applicator or cooling tank by anappropriate temperature sensor), selected body area and/or others.

Different magnetic flux density, pulse duration, composition of trainsand/or bursts may have different influence on muscle tissue. One part ofa magnetic treatment may cause, for example, muscle training in order toincrease muscle strength, muscle volume, muscle toning, and other partsof the magnetic treatment may cause muscle relaxation. The signalprovided to the RF electrode may be modulated with regard to capacity ofthe circuit created by two bipolar RF electrodes and the patient's body,preventing creation of standing radiofrequency waves in the applicatorand/or a patient, or other. The modulation of the radiofrequency fieldmay be provided in the frequency domain, intensity domain, impulseduration, and/or other parameters. The goal of individual radiofrequencytreatment, magnetic treatment and/or their combination is to reach themost complex and/or efficient treatment of the target biologicalstructure. The modulation in the time domain may provide active andpassive periods of stimulation. Passive period may occur when the RFtreatment and/or magnetic treatment includes a period with no musclestimulation and/or no change of temperature or other treatment effectprovided by RF field of target biological structure. During a passiveperiod, there may not be generated a magnetic field and/or RF field.Also, during a passive period, magnetic field and RF field may begenerated but the intensity of the magnetic field and/or the RF fieldmay not be sufficient to provide treatment effect of at least one of thetarget biological structure.

The magnetic flux density of the magnetic field may be in a range from0.1 T to 7 T, or in a range from 0.5 T to 7 T, or in a range from 0.5 Tto 5 T, or in range from 0.5 T to 4 T, or in range from 0.5 T to 2 T.Such definition may include the amplitude of magnetic flux density ofthe magnetic field. Shown ranges of magnetic flux density may be usedfor causing muscle contraction. The magnetic flux density and/oramplitude of the magnetic flux density may be measured by fluxmeter orby oscilloscope.

A repetition rate may refer to a frequency of firing the magneticimpulses. The repetition rate may be derived from the time duration ofthe magnetic pulse. The repetition rate of the magnetic impulses may bein the range of 0.1 Hz to 700 Hz, or from 1 Hz to 700 Hz, or from 1 Hzto 500 Hz, or in the range of 1 Hz to 300 Hz or 1 Hz to 150 Hz. As eachmagnetic pulse includes one magnetic impulse, the repetition rate ofmagnetic pulses is equal to repetition rate of magnetic impulses. Theduration of magnetic impulses may be in a range from 1 μs to 10 ms orfrom 3 μs to 3 ms or from 3 μs to 3 ms or from 3 μs to 1 ms or 10 μs to2000 μs or 50 μs to 1000 μs or from 100 μs to 800 μs. The repetitionrate of impulses may be measured from recording of the oscilloscopemeasurement.

The train duration may be in the range of 1 ms to 300 s or from 1 ms to80 s or from 2 ms to 60 s or 4 ms to 30 s, or from 8 ms to 10s, or from25 ms to 3 s. A time between two subsequent trains may be in a range of5 ms to 100 s, or of 10 ms to 50 s, or of 200 ms to 25 s, or of 500 msto 10 s, or of 750 ms to 5 s or from 300 ms to 20 s. The repetition ratemay be measured from recording of the oscilloscope measurement.

The burst duration may be in a range of 10 ms to 100 seconds, or from100 ms to 15 s, or from 500 ms to 7 s, or from 500 ms to 5 s. Therepetition rate of magnetic bursts may be in a range of 0.01 Hz to 150Hz, or of 0.02 Hz to 100 Hz, or in the range of 0.05 Hz to 50 Hz, or0.05 Hz to 10 Hz, or of 0.05 Hz to 2 Hz. The repetition rate may bemeasured from recording of the oscilloscope measurement.

Another parameter to provide effective magnetic treatment and causingmuscle contraction is a derivative of the magnetic flux density definedby dB/dt, where: dB is magnetic flux density derivative [T] and dt istime derivative [s]. The magnetic flux density derivative is related tomagnetic field. The magnetic flux density derivative may be defined asthe amount of induced electric current in the tissue and so it may serveas one of the key parameters to in providing muscle contraction. Thehigher the magnetic flux density derivative, the stronger musclecontraction is. The magnetic flux density derivative may be calculatedfrom the equation mentioned above.

The maximal value of the magnetic flux density derivative may be up to 5MT/s, or in the ranges of 0.3 to 800 kT/s, 0.5 to 400 kT/s, 1 to 300kT/s, 1.5 to 250 kT/s, 2 to 200 kT/s, or 2.5 to 150 kT/s.

The frequency of the RF field (e.g. RF waves) may be in the range ofhundreds of kHz to tens of GHz, e.g. in the range of 100 kHz to 3 GHz,or 500 kHz to 3 GHz, 400 kHz to 900 MHz or 500 kHz to 900 MHz or around13.56 MHz, 40.68 MHz, 27.12 MHz, or 2.45 GHz.

An energy flux provided by RF field (e.g. RF waves) may be in the rangeof 0.001 W/cm² to 1,500 W/cm², or 0.001 W/cm² to 15 W/cm², or 0.01 W/cm²to 1,000 W/cm², or of 0.01 W/cm² to 5 W/cm², or of 0.08 W/cm² to 1 W/cm²or of 0.1 W/cm² to 0.7 W/cm². The term “around” should be interpreted asin the range of 5% of the recited value.

The voltage of electromagnetic signal provided by power source oftreatment circuit for RF treatment may be in the range of 1 V to 5 kV,or 5 V to 140 V, or 10 V to 120 V, or 15 V to 50 V, or 20 V to 50 V.

The temperature in the biological structure, temperature on the surfaceof treated body area, temperature in the body area, temperature of theinside of the applicator, temperature of the RF electrode and/ortemperature of the magnetic field generating device may be measured e.g.by the temperature sensor 816 implemented in the applicator shown inFIG. 8c . The temperature of the RF electrode and/or magnetic fieldgenerating device may be maintained in a range from 38° C. to 150° C.,38° C. to 100° C., or from 40° C. to 80° C., 40° C. to 60° C. or 41° C.to 60° C., or 42° C. to 60° C. The temperature on the surface of treatedbody area, temperature in the treated body and/or in the biologicalstructure may be increased to the temperature in a range of 38° C. to60° C., or of 40° C. to 52° C., or of 41° C. to 50° C., or of 41° C. to48° C., or of 42° C. to 48° C., or of 42° C. to 45° C. The values oftemperature described above may be achieved during 5 s to 600 s, 10 s to300 s, or 30 s to 180 s after RF treatment and/or magnetic treatmentstarts. After that, the value temperature may be maintained constantduring the treatment with maximal temperature deviation in a range of 5°C. 3° C., or 2° C., or 1° C.

At the beginning of the treatment a starting temperature on thepatient's skin and/or in the biological structure may be increased tothe starting temperature in range from 42° C. to 60° C., or from 45° C.to 54° C., or from 48° C. to 60° C., or from 48° C. to 52° C. and/or toa temperature 3° C., or 5° C., or 8° C. above the temperature whenapoptotic process begins but not over 60° C. After 45 s to 360 s, orafter 60 s to 300 s, or after 120 s to 400 s, or after 300 s to 500 swhen the starting temperature was reached, the intensity of the RF fieldmay be decreased and a temperature on the patient's skin and/ortemperature in the biological structure may be maintained at thetemperature in a range from 41° C. to 50° C., or from 42° C. to 48° C.According to another method of the treatment, the temperature of thebiological structure may be during the treatment at least two timesdecreased and increased in a range of 2° C. to 10° C., 2° C. to 8° C.,or 3° C. to 6° C. while at least one applicator is attached to the samepatient's body area, such as an abdominal area, buttock, arm, leg and/orother body area.

Temperature in the biological structure may be calculated according tomathematic model, correlation function, in combination with at least oneor more measured characteristic. Such measured characteristic mayinclude temperature on the patient's skin, capacitance between RFelectrodes, Volt-Ampere characteristic of RF bipolar electrodes and/orVolt-Ampere characteristic of connected electrical elements to RFelectrodes.

The treatment duration may be from 5 minutes to 120 minutes, or from 5minutes to 60 minutes, or from 15 minutes to 40 minutes. During oneweek, one, two or three treatments of the same body area may beprovided. Also, one pause between two subsequent treatments may be one,two or three weeks.

The sum of energy flux density of the RF treatment and the magnetictreatment applied to the patient during the treatment, may be in a rangefrom 0.03 mW/mm² to 1.2 W/mm², or in the range from 0.05 mW/mm² to 0.9W/mm², or in the range from 0.01 mW/mm² to 0.65 W/mm². A portion of theenergy flux density of magnetic treatment during the simultaneousapplication of RF treatment and active magnetic treatment may be in arange from 1% to 70%, 3% to 50%, 5% to 30%, or 1% to 20% of treatmenttime.

The power output of RF energy (i.e. RF field) provided by one RFelectrode may be in a range of 0.005 W to 350 W or 0.1 W to 200 W or 0.1W to 150 W.

FIG. 21 illustrates different types of muscle contraction, which may beprovided by treatment device and achieved by application of magneticfield or combination of magnetic field and RF field. The musclecontraction may differ in energy consumption and muscle targeting, e.g.,muscle strengthening, muscle volume increase/decrease, muscle endurance,muscle relaxation, warming up of the muscle and/or other effects. Thevertical axis may represent a strength of the muscle contraction, andthe horizontal axis may represent time. The arrows may representmagnetic impulses and/or pulses applied to the muscle of the patient.

Low repetition rate of the time-varying magnetic field pulses, e.g. in arange of 1 Hz to 15 Hz, may cause a twitch. Low repetition rate may besufficiently low to enable the treated muscle to fully relax. The energyconsumption of the treated muscle may be low due to low repetition rate.However, the low repetition rate may cause for active relaxation ofmuscle e.g. between two contractions.

Intermediate repetition rate of the time-varying magnetic field pulsesmay cause incomplete tetanus muscle contraction, intermediate repetitionrate may be in a range of 15 Hz to 29 Hz. Incomplete tetanus musclecontraction may be defined by a repetition rate in a range of 10 Hz to30 Hz. The muscle may not fully relax. The muscle may be partiallyrelaxed. The muscle contraction strength may increase with constantmagnetic flux density applied.

Higher repetition rate of the time-varying magnetic field pulses maycause complete tetanus muscle contraction. Higher repetition rates maybe for example in a range of 30 Hz to 150 Hz, or 30 Hz to 90 Hz, or 30Hz to 60 Hz. The complete tetanus muscle contraction may cause thestrongest supramaximal muscle contraction. The supramaximal musclecontraction may be stronger than volitional muscle contraction. Theenergy consumption may be higher. The strengthening effect may beimproved. Further, it is believed that at repetition rates of at least30 Hz, the adipose cells may be reduced in volume and/or in number.

Even higher repetition rate of the time-varying magnetic field pulsesover 90 Hz may suppress and/or block pain excitement transmission atdifferent levels or neural system and/or pain receptors. The higherrepetition rate may be at least 100 Hz, at least 120 Hz, or at least 140Hz, or in a range of 100 Hz to 230 Hz, or 120 Hz to 200 Hz, or 140 Hz to180 Hz. The application of time-varying magnetic field to the muscle ofthe patient may cause a pain relieving effect.

High repetition rate of the time-varying magnetic field pulses in arange of 120 Hz to 300 Hz, or 150 Hz to 250 Hz, or 180 Hz to 350 Hz, orhigher than 200 Hz may cause a myorelaxation effect.

A quality of the muscle contraction caused by the time-varying magneticfield may be characterized by parameters such as a contractile force ofthe muscle contraction, a muscle-tendon length, a relative shortening ofthe muscle or a shortening velocity of the muscle.

The contractile force of the muscle contraction may reach a contractileforce of at least 0.1 N/cm² and up to 250 N/cm². The contractile forcemay be in a range from 0.5 N/cm² to 200 N/cm², or in the range from 1N/cm² to 150 N/cm², or in the range from 2 N/cm² to 100 N/cm².

The muscle-tendon length may reach up to 65% of a rest muscle-tendonlength. The muscle-tendon length may be in a range of 1 to 65% of therest muscle-tendon length, or in a range of 3 to 55% of the restmuscle-tendon length, or in a range of 5% to 50% of the restmuscle-tendon length.

The muscle may be shortened during the muscle contraction up to 60% of aresting muscle length. The muscle shortening may be in a range of 0.1%to 50% of the resting muscle length, or in the range of 0.5% to 40% ofthe resting muscle length, or in the range of 1% to 25% of the restingmuscle length.

The muscle may shorten at a velocity of up to 10 cm/s. The muscleshortening velocity may be in a range of 0.1 cm/s to 7.5 cm/s, or in therange of 0.2 cm/s to 5 cm/s, or in the range of 0.5 cm/s to 3 cm/s.

A time-varying magnetic field may be applied to the patient in order tocause a muscle shaping effect by muscle contraction. The muscle mayobtain increased tonus and/or volume. Strength of the muscle mayincrease as well.

Regarding the types of combined treatment by RF treatment and magnetictreatment, the treatment device may be configured to provide differenttreatment energies (e.g. RF field and magnetic field) in various timeperiods during one treatment session. The user may control or adjust thetreatment through the HMI. HMI may be coupled to master unit and/or oneor more control units. Also, the master unit and/or control unit maycontrol or adjust application of different treatment energies accordingto treatment protocol, body area or another option selected by the user.In addition, the master unit and/or control unit may control or adjustapplication of different treatment energies according to feedbackprovided by any sensor mentioned above. Therefore, master unit and/orone or more control units may control or adjust the treatment andproviding of treatment energies (e.g. RF treatment and magnetictreatment) in various time periods during one treatment session. Allshown types of applications of magnetic treatment and RF treatment maybe provided by treatment device.

One type of combined application of magnetic treatment with RF treatmentmay be simultaneous application. During simultaneous application bothmagnetic treatment and RF treatment may applied in same time duringwhole or most of treatment session. In one example, simultaneousapplication may be achieved by application of one or more sections ofmagnetic field with application of continuous RF field. In anotherexample, pulsed magnetic treatment may be applied during continual RFtreatment. In still another example, simultaneous application may beachieved by continual application of RF treatment together with e.g.one, or two long train of magnetic pulses. In such case, long train ofmagnetic pulses should include magnetic pulses having repetition rate ofvalues in range of 1 Hz to 15 Hz or 1 Hz to 10 Hz. When only one or twolong magnetic trains are used for the whole treatment session, trainduration of such trains may be in the range of 5 s to 90 minutes or 10 sto 80 minutes or 15 minutes to 45 minutes.

Muscle contraction caused by the time-varying magnetic field with orduring simultaneous RF treatment may include more affected musclefibres. Also, the targeted biological structure (e.g. muscle) may bemore contracted with applied lower magnetic flux density of magneticfield as compared to situation without simultaneous RF treatment.

Simultaneous application of the RF treatment and the magnetic treatmentinto the same body area may improve dissipation of heat created by theRF treatment. This effect is based on increased blood circulation intreated body area or vicinity of treated area. Also, induced muscle workmay improve homogeneity of heating and dissipation of heat induced andprovided by RF field.

Another type of combined application of magnetic treatment with RFtreatment may be separate application. During separate application bothmagnetic treatment and RF treatment may applied in different time duringtreatment session. RF treatment may be provided before, after, and/orbetween magnetic envelopes, bursts, trains, pulses and/or impulses odmagnetic treatment.

The ratio between a time when the magnetic treatment is applied and atime when the RF treatment is applied may be in a range of 0.2% to 80%or 2% to 60% or 5% to 50% or 20% to 60%. The time of applied magnetictreatment for this calculation is the sum of all pulse durations duringthe treatment.

Another type of combined application of magnetic treatment with RFtreatment may be dependent application. Application of one treatmentenergy may be dependent on start or one or more treatment parameter ofanother treatment energy. Dependent application may be started orregulated according to feedback from one or more sensor. For example,start of application of RF treatment may be dependent on start ofmagnetic treatment or start of train, burst and/or envelope. When thethermal dissipation provided by a muscle work (including musclecontraction and/or relaxation) is not provided, health risk of unwantedtissue damage caused by overheating may occur. In another example, startof application of magnetic treatment may be dependent on the start, timeduration or intensity of RF treatment. The magnetic treatment maypreferably start after the biological structure is sufficiently heated.The magnetic treatment providing at least partial muscle contraction ormuscle contraction may improve blood and lymph flow, provide massage ofthe adjacent tissues and provides better redistribution of the heatinduced in the patient's body by the RF treatment.

The treatment protocol may be divided into two or more treatmentsections. The number of treatment section may be in the range of 2 to 50or 2 to 30 or 2 to 15 for one protocol.

Each treatment section of the treatment protocol may include differenttreatment parameters and/or types of combined treatment of magnetictreatment and RF treatment as described above.

One treatment section may last for a section time, wherein section timemay be in a range of 10 s to 30 minutes or 15 s to 25 minutes or 20 s to20 minutes. Different sections may have different treatment effects inone or more treated biological structures, e.g., a muscle and adiposetissue. For example, one treatment section may provide high intensitymuscle exercise where muscle contractions are intensive and a highnumber of such contractions is provided, wherein a higher repetitionrate of magnetic pulses with high energy flux density may be used duringone treatment section. Another treatment section may have a musclerelaxation effect, wherein the low and/or the high repetition rate ofmagnetic pulses may be used and/or also lower magnetic flux density ofmagnetic field may be used.

Treatment protocol may include different setting of power output of RFtreatment, as commanded or controlled by control system of the treatmentdevice. One setting may be a constant power output, wherein the poweroutput during the treatment protocol may be same. Another setting may bean oscillating power output of RF treatment. The power output of RFtreatment may oscillate around predetermined value of power output in arange of 0.1% to 5% of predetermined power output. Still another settingmay be a varying power output of RF energy, wherein the power output ofRF treatment is varied during treatment protocol. The variation of poweroutput of RF treatment may be provided in one or more power outputvariation steps, wherein one power output variation step may include onechange of value of power output of RF treatment applied by one or moreRF electrodes. The change of power output of RF treatment from one valueto another value during power output variation step may be in the rangeof 0.1 W to 50 W or 0.1 W to 30 W or 0.1 W to 20 W. The power outputvariation step may have time duration in the range of 0.1 s to 10 min or0.1 s to 5 min.

Regarding the variation of power output of RF energy, the power outputof RF energy may have different values during different time period oftreatment protocol. Therefore, RF treatment may have different value ofpower output during first time period followed by power output variationstep followed by second time period having different value of poweroutput of RF treatment. The first time period having one value of poweroutput of RF treatment may be in a range of 1 s to 15 min or 10 s to 10min. The second time period having another value of power output of RFtreatment may be in a range of 1 s to 45 min or 4 s to 59 min or 5 s to35 min. For example, RF treatment may have value of power output about20 W during first time and 10 W during second time period.

First exemplary treatment protocol may include two treatment section.First treatment section may include envelopes of magnetic pulses,wherein the envelopes may include pulses having repetition rate in therange of 1 to 10 Hz. Envelopes of first treatment section may haverectangular or trapezoidal shape. Duration of first treatment sectionmay be from 3 minutes to 15 minutes. Second treatment section mayinclude envelopes of magnetic pulses, wherein the envelopes may includepulses having repetition rate in the range of 15 to 45 Hz. Envelopes ofsecond treatment section may have rectangular or trapezoidal shape.Duration of first treatment section may be from 3 minutes to 15 minutes.The treatment sections may be repeated one after another. The RFtreatment may be applied continuously during the whole treatmentprotocol. The RF treatment may include one or two power output variationsteps.

Second exemplary treatment protocol may include three treatment section.First treatment section may include envelopes of magnetic pulses,wherein the envelopes may include pulses having repetition rate in therange of 5 to 50 Hz. Envelopes of first treatment section may haverectangular or trapezoidal shape. Duration of first treatment sectionmay be from 3 minutes to 15 minutes. Second treatment section mayinclude envelopes of magnetic pulses, wherein the envelopes may includepulses having repetition rate in the range of 15 to 45 Hz. Envelopes ofsecond treatment section may have rectangular or trapezoidal shape.Duration of first treatment section may be from 3 minutes to 15 minutes.Third treatment section may include envelopes of magnetic pulses,wherein the envelopes may include pulses having repetition rate in therange of 10 to 40 Hz. Envelopes of third treatment section may haverectangular or trapezoidal shape. Duration of third treatment sectionmay be from 3 minutes to 15 minutes. The treatment sections may berepeated one after another. The RF treatment may be applied continuouslyduring the whole treatment protocol. The RF treatment may include one ortwo power output variation steps. The one power output variation stepmay be initiated in a range of 1 or 20 minutes after the start of thetreatment protocol. In one example, the one power output variation stepmay be initiated three minutes after the start of the treatmentprotocol.

All of the examples, embodiments and methods may be used separately orin any combination.

Novel systems and methods have been described. The invention should beinterpreted in the broadest sense, hence various changes andsubstitutions may be made of course without departing from the spiritand scope of the invention. The invention therefore should not belimited, except by the following claims and their equivalents.

Following patent applications are incorporated herein by reference intheir entireties:

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List of abbreviations related to FIGS. 17, 18 and 18 a. The (A/B) meansthat respective element of the list may be shown with respective letter.For example, ESD (A/B) means that ESD A and/or ESD B are shown in atleast one Figure.

PS power source

ESD (A/B) energy storage device

SW (A/B) switch

HIFEM (A/B) treatment cluster for magnetic treatment

MFGD (A/B) magnetic field generating device

CUM (A/B) control unit of magnetic circuit

APS RF auxiliary power source of RF circuit

PU power unit

SPSRF steady power source of RF circuit

PNFLT power network filter

PSRF power source for RF treatment

RF (A/B) treatment cluster for RF treatment

SYM (A/B) symmetrisation element

AP (A/B) applicator

RFE (A/B) RF electrode

APS (A/B) auxiliary power source

PSM power source for magnetic treatment

BPS (A/B) board power source

SPSM steady power source of magnetic circuit

PN power network

PF pulse filter

SE safety element

PA power amplifier

CURF control unit of RF circuit

What is claimed is:
 1. A treatment device for providing a magnetictreatment and a radiofrequency treatment to a body area of a patient,comprising: an energy storage device configured to store electricalenergy; a magnetic field generating device; a switching deviceconfigured to discharge the electrical energy from the energy storagedevice to the magnetic field generating device, such that a time-varyingmagnetic field is generated and provides muscle contraction to a musclein the body area of the patient, wherein the time-varying magnetic fieldhas a magnetic flux density in a range of 0.1 Tesla to 7 Tesla and arepetition rate in a range of 0.1 Hz to 700 Hz; and a radiofrequencyelectrode configured to generate a radiofrequency field to heat tissuein the body area of the patient, wherein a body of the radiofrequencyelectrode comprises a plurality of openings in a range of 5 to 1000openings.
 2. The device of claim 1, wherein the magnetic fieldgenerating device comprises an air core.
 3. The device of claim 2,further comprising an applicator comprising a casing, wherein themagnetic field generating device is positioned within the casing.
 4. Thedevice of claim 1, wherein a shortest distance between the magneticfield generating device and the radiofrequency electrode is in a rangeof 0.1 mm to 100 mm.
 5. The device of claim 4, wherein the magneticfield generating device and the radiofrequency electrode are separatedby an insulating material or an air gap.
 6. The device of claim 1,wherein the radiofrequency electrode comprises a conductive layerdeposited on an insulating substrate, and wherein a thickness of theconductive layer is in a range of 0.01 mm to 5 mm.
 7. The device ofclaim 6, wherein the body of the radiofrequency electrode furthercomprises a plurality of protrusions, wherein adjacent protrusions ofthe plurality of protrusions define the plurality of openings, andwherein at least one of the plurality of openings is further defined bya hypothetical circle fitting within the opening between adjacentprotrusions, such that a maximum diameter of the hypothetical circlefitting within the opening between the adjacent protrusions is in arange of 0.01 mm to 10 mm.
 8. The device of claim 1, wherein theradiofrequency electrode further comprises an electrically insulatingmaterial or a dielectric material disposed within each opening of theplurality of openings.
 9. A treatment device for providing a magnetictreatment and a radiofrequency treatment to a body area of a patient,comprising: an energy storage device configured to store electricalenergy; a magnetic field generating device; a switching deviceconfigured to discharge the electrical energy from the energy storagedevice to the magnetic field generating device, such that a time-varyingmagnetic field is generated and provides muscle contraction to a musclein the body area of the patient, wherein the time-varying magnetic fieldhas a magnetic flux density in a range of 0.5 Tesla to 7 Tesla and arepetition rate in a range of 0.1 Hz to 700 Hz; and a radiofrequencyelectrode configured to generate a radiofrequency field to heat tissuein the body area of the patient, wherein the radiofrequency electrode isa first radiofrequency electrode of a bipolar pair of radiofrequencyelectrodes, and wherein the radiofrequency electrode is configured to bepositioned between the magnetic field generating device and the bodyarea of the patient.
 10. The device of claim 9, wherein the magneticfield generating device and the radiofrequency electrode are separatedby an air gap.
 11. The device of claim 9, wherein the magnetic fieldgenerating device and the radiofrequency electrode are separated by aninsulating material.
 12. The device of claim 11, wherein the insulatingmaterial is a part of a printed circuit board.
 13. The device of claim9, wherein a distance between the magnetic field generating device andthe radiofrequency electrode is in a range of 0.5 mm to 50 mm.
 14. Thedevice of claim 13, wherein the radiofrequency electrode comprises aconductive wire.
 15. The device of claim 9, wherein the radiofrequencyelectrode comprises a conductive layer having a thickness in a range of0.01 mm to 5 mm.
 16. The device of claim 15, wherein the radiofrequencyelectrode is deposited on an insulating substrate having a thickness ina range of 0.01 mm to 10 mm.
 17. A treatment device for providing amagnetic treatment and a radiofrequency treatment to a body area of apatient, comprising: an energy storage device configured to storeelectrical energy; an applicator comprising: a casing comprising a topcover and a bottom cover; a magnetic field generating device housedwithin the casing; and a radiofrequency electrode positioned between themagnetic field generating device and the bottom cover; and a switchingdevice configured to discharge the electrical energy from the energystorage device to the magnetic field generating device, such that themagnetic field generating device generates a time-varying magnetic fieldto cause a muscle in the body area of the patient to contract, whereinthe time-varying magnetic field has a magnetic flux density in a rangeof 0.5 Tesla to 7 Tesla and a repetition rate in a range of 0.1 Hz to700 Hz, and wherein the radiofrequency electrode is configured togenerate a radiofrequency field to heat tissue in the body of thepatient.
 18. The device of claim 17, wherein the radiofrequencyelectrode is connected to a power amplifier configured to generate aradiofrequency signal having a frequency in a range of 100 kHz to 3 GHz.19. The device of claim 18, wherein the radiofrequency electrode is afirst radiofrequency electrode from a bipolar pair of radiofrequencyelectrodes positioned within the applicator.
 20. The device of claim 19,further comprising a control system comprising a microprocessor, whereinthe applicator further comprises a temperature sensor, and wherein thetemperature sensor communicates with the control system.
 21. The deviceof claim 19, wherein a distance between the pair of radiofrequencyelectrodes is in a range of 0.1 cm to 25 cm.
 22. The device of claim 17,wherein the radiofrequency electrode comprises a conductive layer havinga thickness in a range of 0.01 mm to 10 mm.
 23. The device of claim 17,wherein the radiofrequency electrode comprises a conductive layerdeposited on an insulating substrate.
 24. The device of claim 17,wherein the radiofrequency electrode comprises 5 to 1000 openings in abody of the radiofrequency electrode.
 25. A treatment device forproviding a magnetic treatment and a radiofrequency treatment to a bodyarea of a patient, comprising: an energy storage device configured tostore electrical energy; an applicator comprising: a casing of theapplicator; a magnetic field generating device housed within the casing;and a radiofrequency electrode comprising a conductive layer; aswitching device configured to discharge the electrical energy from theenergy storage device to the magnetic field generating device, such thatthe magnetic field generating device generates a time-varying magneticfield to cause a muscle in the body area of the patient to contract; anda human machine interface comprising a display interface comprising: aplurality of intensity scrollers or buttons; two intensity barsconfigured to indicate intensity of the magnetic treatment; and twointensity bars configured to represent indicate intensity of theradiofrequency treatment, wherein the time-varying magnetic field has amagnetic flux density in a range of 0.5 Tesla to 7 Tesla and arepetition rate in a range of 0.1 Hz to 700 Hz, wherein theradiofrequency electrode is configured to generate a radiofrequencyfield to heat tissue in the body of the patient, wherein a firstscroller or button of the plurality of intensity scrollers or buttons isconfigured to independently control intensity of a magnetic treatmentprovided by the magnetic field generating device, and is configured toeffect a change in one or more of the intensity bars configured toindicate the intensity of the magnetic treatment, and wherein a secondscroller or button of the plurality of intensity scrollers or buttons isconfigured to independently control intensity of a radiofrequencytreatment provided by the radiofrequency electrode, and is configured toeffect a change in one or more of the intensity bars configured toindicate the intensity of the radiofrequency treatment.
 26. The deviceof claim 25, wherein the display interface comprises two intensitybuttons configured to control the intensity of the radiofrequencytreatment and two intensity buttons configured to control the intensityof the magnetic treatment.
 27. The device of claim 26, wherein theentirety of the radiofrequency electrode is positioned within the casingof the applicator.
 28. The device of claim 25, further comprising: amain unit comprising the energy storage device, a power source for theradiofrequency treatment, and a connector to which the applicator isconnected; and a connecting tube configured to connect the applicator tothe connector, wherein the connecting tube comprises one or more wiresconfigured to provide an electrical signal to the radiofrequencyelectrode.
 29. The device of claim 28, wherein the applicator furthercomprises an outlet configured to dissipate heat generated by themagnetic field generating device.
 30. The device of claim 29, whereinthe magnetic field generating device is a planar magnetic coil.